Inventor · disambiguated record
Johannes Kaeppeler
Also filed as: KAEPPELER JOHANNES
10 granted patents·10 pending applications·196 citations·filing 2000–2025
91Inventor score
Top patents by PatentIndex Score
20 records- 0195US6983620B2Method and device for the temperature control of surface temperatures of substrates in a CVD reactorAIXTRON AG·Filed 2005·Granted Jan 10, 2006·29 cites·6 claims
- 0292US7709398B2Process and apparatus for depositing semiconductor layers using two process gases, one of which is preconditionedAIXTRON AG·Filed 2005·Granted May 4, 2010·19 cites·19 claims
- 0391US7762208B2Loading and unloading apparatus for a coating deviceAIXTRON AG·Filed 2007·Granted Jul 27, 2010·17 cites·13 claims
- 0490US7128785B2Method for depositing especially crystalline layers from the gas phase onto especially crystalline substratesAIXTRON AG·Filed 2003·Granted Oct 31, 2006·48 cites·20 claims
- 0589US7625448B2Inlet system for an MOCVD reactorAIXTRON AG·Filed 2006·Granted Dec 1, 2009·18 cites·20 claims
- 0685US7294207B2Gas-admission element for CVD processes, and deviceAIXTRON AG·Filed 2003·Granted Nov 13, 2007·32 cites·9 claims
- 0782US2024175133A1Multi-disc chemical vapor deposition system with cross flow gas injectionVEECO INSTR INC·Filed 2023·Application pending·0 cites
- 0877US7048802B2CVD reactor with graphite-foam insulated, tubular susceptorAIXTRON AG·Filed 2003·Granted May 23, 2006·17 cites·5 claims
- 0976US8152927B2CVD coating deviceKAEPPELER JOHANNES·Filed 2005·Granted Apr 10, 2012·3 cites·14 claims
- 1075US6878395B2Method and device for the temperature control of surface temperatures of substrates in a CVD reactorAIXTRON AG·Filed 2003·Granted Apr 12, 2005·12 cites·8 claims
- 1170US2025109493A1Chemical vapor deposition system with hot-wall hybrid flow reactor and removable reactor floorVEECO INSTR INC·Filed 2024·Application pending·0 cites
- 1268US8052796B2CVD reactor comprising a photodiode arrayAIXTRON AG·Filed 2006·Granted Nov 8, 2011·1 cites·8 claims
- 1364US2025313954A1Gas injectors for mocvd/cvd systemsVEECO INSTR INC·Filed 2025·Application pending·0 cites
- 1462US2010012034A1Process And Apparatus For Depositing Semiconductor Layers Using Two Process Gases, One Of Which is PreconditionedSTRAUCH GERHARD KARL·Filed 2009·Application pending·0 cites
- 1551US2009110805A1Apparatus and Method for Controlling the Surface Temperature of a Substrate in a Process ChamberAIXTRON INC·Filed 2007·Application pending·0 cites
- 1646US2005214102A1Loading and unloading apparatus for a coating deviceJUERGENSEN HOLGER·Filed 2005·Application pending·0 cites
- 1746US2010037827A1CVD Device with Substrate Holder with Differential Temperature ControlKAEPPELER JOHANNES·Filed 2009·Application pending·0 cites
- 1838US2005000441A1Process and device for depositing in particular crystalline layers on in particular crystalline substratesFiled 2004·Application pending·0 cites
- 1938US2004182310A1CVD device with substrate holder with differential temperature controlFiled 2004·Application pending·0 cites
- 2029US2001014397A1Method for producing a wafer support, used, in particular, in a high-temperature CVD reactor or in a high-temperature CVD process which involves the use of aggressive gasesFiled 2000·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →