Inventor · disambiguated record
Johannes Käppeler
Also filed as: KAEPPELER JOHANNES · KAPPELER JOHANNES · KäPPELER JOHANNES
17 granted patents·12 pending applications·176 citations·filing 1999–2016
93Inventor score
Top patents by PatentIndex Score
29 records- 0187US10919045B2Method and device for fragmenting and/or weakening pourable material by means of high-voltage dischargesSELFRAG AG·Filed 2016·Granted Feb 16, 2021·9 cites·36 claims
- 0287US7147718B2Device and method for the deposition of, in particular, crystalline layers on, in particular, crystalline substratesAIXTRON AG·Filed 2003·Granted Dec 12, 2006·30 cites·15 claims
- 0385US8152924B2CVD reactor comprising a gas inlet memberDAUELSBERG MARTIN·Filed 2006·Granted Apr 10, 2012·13 cites·11 claims
- 0478US6811614B2CVD reactor with substrate holder which is rotatably driven and mounted by a gas streamAIXTRON AG·Filed 2003·Granted Nov 2, 2004·18 cites·11 claims
- 0578US6309465B1CVD reactorAIXTRON AG·Filed 1999·Granted Oct 30, 2001·49 cites·32 claims
- 0677US9447500B2CVD reactor having a substrate holder resting on a gas cushion comprising a plurality of zonesRUDA Y WITT FRANCISCO·Filed 2010·Granted Sep 20, 2016·3 cites·7 claims
- 0776US8157915B2CVD reactor having a process-chamber ceiling which can be loweredDAUELSBERG MARTIN·Filed 2007·Granted Apr 17, 2012·4 cites·13 claims
- 0876US7201942B2Coating methodAIXTRON AG·Filed 2002·Granted Apr 10, 2007·17 cites·27 claims
- 0975US8062426B2CVD reactor with RF-heated process chamberKAEPPELER JOHANNES·Filed 2005·Granted Nov 22, 2011·4 cites·13 claims
- 1072US10730054B2Method and device for fragmenting and/or weakening pourable material by means of high-voltage dischargesSELFRAG AG·Filed 2015·Granted Aug 4, 2020·1 cites·22 claims
- 1171US8308867B2Device for the temperature control of the surface temperatures of substrates in a CVD reactorFRANKEN WALTER·Filed 2008·Granted Nov 13, 2012·3 cites·12 claims
- 1271US7067012B2CVD coating deviceAIXTRON AG·Filed 2003·Granted Jun 27, 2006·9 cites·13 claims
- 1364US6905548B2Device for the deposition of crystalline layers on crystalline substratesAIXTRON AG·Filed 2003·Granted Jun 14, 2005·5 cites·9 claims
- 1463US7332038B2Device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substratesAIXTRON AG·Filed 2003·Granted Feb 19, 2008·5 cites·8 claims
- 1558US7056388B2Reaction chamber with at least one HF feedthroughAIXTRON AG·Filed 2002·Granted Jun 6, 2006·4 cites·9 claims
- 1655US8986453B2Device for coating substrates disposed on a susceptorKäPPELER JOHANNES·Filed 2008·Granted Mar 24, 2015·2 cites·15 claims
- 1754US2006201427A1CVD coating deviceJURGENSEN HOLGER·Filed 2006·Application pending·0 cites
- 1850US2007074661A1CVD reactor with stabilized process chamber heightAIXTRON AG·Filed 2006·Application pending·0 cites
- 1950US2010003405A1Method for depositing layers in a cvd reactor and gas inlet element for a cvd reactorKAEPPELER JOHANNES·Filed 2006·Application pending·0 cites
- 2050US2010273320A1Device and method for selectively depositing crystalline layers using mocvd or hvpeKAEPPELER JOHANNES·Filed 2008·Application pending·0 cites
- 2146US2009183682A1Source container of a vpe reactorFRANKEN WALTER·Filed 2007·Application pending·0 cites
- 2245US2008251020A1Cvd-Reactor with Slidingly Mounted Susceptor HolderFRANKEN WALTER·Filed 2006·Application pending·0 cites
- 2344US2013040054A1Coating device and method for operating a coating device having a shielding plateAIXTRON SE·Filed 2011·Application pending·0 cites
- 2441US2008206464A1Method and Device for the Depositing of Gallium Nitrite Layers on a Sapphire Substrate and Associated Substrate HolderAIXTRON INC·Filed 2005·Application pending·0 cites
- 2536US8439023B2Ignition coil, in particular for an internal combustion engine of a motor vehicleLINDENTHAL KONSTANTIN·Filed 2007·Granted May 14, 2013·0 cites·6 claims
- 2636US2018006468A1Method and device for the fragmentation and/or weakening of a piece of material by means of high-voltage dischargesseIFrag AG·Filed 2015·Application pending·0 cites
- 2736US2010162957A1Device for coating a plurality of closest packed substrates arranged on a susceptorBOYD ADAM·Filed 2008·Application pending·0 cites
- 2834US2011237051A1Process and apparatus for deposition of multicomponent semiconductor layersHESS KENNETH LEE·Filed 2010·Application pending·0 cites
- 2933US2013045548A1Apparatus and method for simultaneous deposition of a plurality of semiconductor layers in a plurality of process chambersKAEPPELER JOHANNES·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →