Inventor · disambiguated record
Johan Joost Koning
Also filed as: KONING JOHAN JOOST
14 granted patents·5 pending applications·57 citations·filing 2010–2025
90Inventor score
Files withASML NETHERLANDS BV8MAPPER LITHOGRAPHY IP BV8KONING JOHAN JOOST2STEENBRINK STIJN WILLEM HERMAN KAREL1
Top patents by PatentIndex Score
19 records- 0195US10987705B2Method and system for the removal and/or avoidance of contamination in charged particle beam systemsASML NETHERLANDS BV·Filed 2020·Granted Apr 27, 2021·4 cites·20 claims
- 0294US9981293B2Method and system for the removal and/or avoidance of contamination in charged particle beam systemsMAPPER LITHOGRAPHY IP BV·Filed 2016·Granted May 29, 2018·9 cites·29 claims
- 0392US11738376B2Method and system for the removal and/or avoidance of contamination in charged particle beam systemsASML NETHERLANDS BV·Filed 2021·Granted Aug 29, 2023·2 cites·20 claims
- 0491US8198602B2Electrostatic lens structureSTEENBRINK STIJN WILLEM HERMAN KAREL·Filed 2011·Granted Jun 12, 2012·22 cites·23 claims
- 0588US10632509B2Method and system for the removal and/or avoidance of contamination in charged particle beam systemsASML NETHERLANDS BV·Filed 2018·Granted Apr 28, 2020·4 cites·31 claims
- 0683US12202019B2Method and system for the removal and/or avoidance of contamination in charged particle beam systemsASML NETHERLANDS BV·Filed 2023·Granted Jan 21, 2025·0 cites·20 claims
- 0783US8362441B2Enhanced integrity projection lens assemblyMAPPER LITHOGRAPHY IP BV·Filed 2010·Granted Jan 29, 2013·7 cites·54 claims
- 0874US9263234B2Target processing unitMAPPER LITHOGRAPHY IP BV·Filed 2014·Granted Feb 16, 2016·2 cites·21 claims
- 0971US9111657B2Charged particle optical deviceMAPPER LITHOGRAPHY IP BV·Filed 2014·Granted Aug 18, 2015·4 cites·29 claims
- 1068US8716671B2Enhanced integrity projection lens assemblyKONING JOHAN JOOST·Filed 2012·Granted May 6, 2014·2 cites·24 claims
- 1164US2025285828A1Charged particle optical device, assessment apparatus, method of assessing a sampleASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 1261USRE46452EElectrostatic lens structureMAPPER LITHOGRAPHY IP BV·Filed 2014·Granted Jun 27, 2017·1 cites·34 claims
- 1359US2025349495A1Isolating spacer for electron-optical assemblyASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1459US2025357070A1Electron-optical assemblyASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1554US2023352266A1Electron-optical deviceASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1654US2017309438A1Electrostatic lens structureMAPPER LITHOGRAPHY IP BV·Filed 2017·Application pending·0 cites
- 1749US9941093B2Target processing unitMAPPER LITHOGRAPHY IP BV·Filed 2016·Granted Apr 10, 2018·0 cites·19 claims
- 1845US8987679B2Enhanced integrity projection lens assemblyMAPPER LITHOGRAPHY IP BV·Filed 2012·Granted Mar 24, 2015·0 cites·25 claims
- 1934US8624478B2High voltage shielding arrangement of a charged particle lithography systemKONING JOHAN JOOST·Filed 2010·Granted Jan 7, 2014·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →