Inventor · disambiguated record
Joseph S. Logan
Also filed as: LOGAN JOSEPH · LOGAN JOSEPH S · LOGAN JOSEPH SKINNER
27 granted patents·1,416 citations·filing 1975–2002
98Inventor score
Top patents by PatentIndex Score
27 records- 0192US3994793AReactive ion etching of aluminumIBM·Filed 1975·Granted Nov 30, 1976·86 cites·9 claims
- 0291US5191506ACeramic electrostatic chuckIBM·Filed 1991·Granted Mar 2, 1993·144 cites·20 claims
- 0390US5463525AGuard ring electrostatic chuckIBM·Filed 1993·Granted Oct 31, 1995·101 cites·12 claims
- 0490US5155652ATemperature cycling ceramic electrostatic chuckIBM·Filed 1991·Granted Oct 13, 1992·144 cites·6 claims
- 0589US5302266AMethod and apparatus for filing high aspect patterns with metalIBM·Filed 1992·Granted Apr 12, 1994·119 cites·24 claims
- 0689US4367119APlanar multi-level metal process with built-in etch stopIBM·Filed 1980·Granted Jan 4, 1983·78 cites·12 claims
- 0788US5561585AElectrostatic chuck with reference electrodeIBM·Filed 1995·Granted Oct 1, 1996·74 cites·17 claims
- 0888US5055964AElectrostatic chuck having tapered electrodesIBM·Filed 1990·Granted Oct 8, 1991·120 cites·17 claims
- 0988US4637853AHollow cathode enhanced plasma for high rate reactive ion etching and depositionIBM·Filed 1985·Granted Jan 20, 1987·55 cites·4 claims
- 1086US4818359ALow contamination RF sputter deposition apparatusIBM·Filed 1987·Granted Apr 4, 1989·36 cites·9 claims
- 1183US6754062B2Hybrid ceramic electrostatic clampPRAXAIR TECHNOLOGY INC·Filed 2002·Granted Jun 22, 2004·28 cites·13 claims
- 1283US4362611AQuadrupole R.F. sputtering system having an anode/cathode shield and a floating target shieldIBM·Filed 1981·Granted Dec 7, 1982·29 cites·12 claims
- 1380USRE37580EGuard ring electrostatic chuckDORSEY GAGE CO INC·Filed 1999·Granted Mar 12, 2002·49 cites·22 claims
- 1479US5208512AScanned electron cyclotron resonance plasma sourceIBM·Filed 1992·Granted May 4, 1993·34 cites·15 claims
- 1576US5263776AMulti-wavelength optical thermometryIBM·Filed 1992·Granted Nov 23, 1993·40 cites·10 claims
- 1674US4447824APlanar multi-level metal process with built-in etch stopIBM·Filed 1982·Granted May 8, 1984·36 cites·5 claims
- 1771US6268994B1Electrostatic chuck and method of manufactureDORSEY GAGE INC·Filed 1999·Granted Jul 31, 2001·44 cites·6 claims
- 1869US5535507AMethod of making electrostatic chuck with oxide insulatorIBM·Filed 1993·Granted Jul 16, 1996·47 cites·8 claims
- 1969US5099571AMethod for fabricating a split-ring electrostatic chuckIBM·Filed 1991·Granted Mar 31, 1992·44 cites·12 claims
- 2064US5467249AElectrostatic chuck with reference electrodeIBM·Filed 1993·Granted Nov 14, 1995·28 cites·12 claims
- 2160US4035276AMaking coplanar layers of thin filmsIBM·Filed 1976·Granted Jul 12, 1977·15 cites·21 claims
- 2256US4333794AOmission of thick Si3 N4 layers in ISA schemesIBM·Filed 1981·Granted Jun 8, 1982·20 cites·10 claims
- 2355US5612851AGuard ring electrostatic chuckIBM·Filed 1995·Granted Mar 18, 1997·15 cites·12 claims
- 2449US5905626AElectrostatic chuck with ceramic pole protectionDORSEY GAGE INC·Filed 1998·Granted May 18, 1999·16 cites·6 claims
- 2537US5901030AElectrostatic chuck employing thermoelectric coolingDORSEY GAGE INC·Filed 1997·Granted May 4, 1999·7 cites·2 claims
- 2636US6214482B1Dielectric-layer for magneto-optic storage media structuresIBM·Filed 1994·Granted Apr 10, 2001·4 cites·39 claims
- 2733USRE37541EElectrostatic chuck with reference electrodeDORSEY GAGE CO INC·Filed 1998·Granted Feb 5, 2002·3 cites·32 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →