Inventor · disambiguated record
John Madocks
Also filed as: MADOCKS JOHN · MADOCKS JOHN E · MADOCKS JOHN ERIC
25 granted patents·13 pending applications·1,457 citations·filing 1985–2019
96Inventor score
Files withAPPLIED PROCESS TECHNOLOGIES I9GEN PLASMA INC6MADOCKS JOHN E6GENERAL PLASMA INC5MADOCKS JOHN5
Top patents by PatentIndex Score
38 records- 0198US7411352B2Dual plasma beam sources and methodAPPLIED PROCESS TECHNOLOGIES I·Filed 2006·Granted Aug 12, 2008·562 cites·30 claims
- 0297US4949927AArticulable columnMADOCKS JOHN·Filed 1989·Granted Aug 21, 1990·507 cites·8 claims
- 0394US7327089B2Beam plasma sourceAPPLIED PROCESS TECHNOLOGIES I·Filed 2003·Granted Feb 5, 2008·54 cites·27 claims
- 0494US6911779B2Magnetic mirror plasma sourceFiled 2002·Granted Jun 28, 2005·62 cites·28 claims
- 0592US4850806AControlled by-pass for a booster pumpBOC GROUP INC·Filed 1988·Granted Jul 25, 1989·85 cites·10 claims
- 0690US7259378B2Closed drift ion sourceAPPLIED PROCESS TECHNOLOGIES I·Filed 2005·Granted Aug 21, 2007·14 cites·10 claims
- 0789US6919672B2Closed drift ion sourceAPPLIED PROCESS TECHNOLOGIES I·Filed 2003·Granted Jul 19, 2005·31 cites·22 claims
- 0888US7932678B2Magnetic mirror plasma source and method using sameGEN PLASMA INC·Filed 2004·Granted Apr 26, 2011·44 cites·23 claims
- 0984US10989343B2Push-to-connect and pull-to-disconnect quick couplingGENERAL PLASMA INC·Filed 2016·Granted Apr 27, 2021·4 cites·6 claims
- 1083US10134557B2Linear anode layer slit ion sourceGENERAL PLASMA INC·Filed 2014·Granted Nov 20, 2018·5 cites·17 claims
- 1183US9388490B2Rotary magnetron magnet bar and apparatus containing the same for high target utilizationMADOCKS JOHN E·Filed 2010·Granted Jul 12, 2016·3 cites·8 claims
- 1278US7993496B2Cylindrical target with oscillating magnet for magnetron sputteringCARDINAL CG CO·Filed 2005·Granted Aug 9, 2011·7 cites·17 claims
- 1377US7023128B2Dipole ion sourceAPPLIED PROCESS TECHNOLOGIES I·Filed 2002·Granted Apr 4, 2006·12 cites·19 claims
- 1476US7294283B2Penning discharge plasma sourceAPPLIED PROCESS TECHNOLOGIES I·Filed 2002·Granted Nov 13, 2007·12 cites·34 claims
- 1576US7038389B2Magnetron plasma sourceAPPLIED PROCESS TECHNOLOGIES I·Filed 2004·Granted May 2, 2006·12 cites·5 claims
- 1675US9136086B2Closed drift magnetic field ion source apparatus containing self-cleaning anode and a process for substrate modification therewithMADOCKS JOHN E·Filed 2009·Granted Sep 15, 2015·3 cites·15 claims
- 1774US7025833B2Apparatus and method for web cooling in a vacuum coating chamberAPPLIED PROCESS TECHNOLOGIES I·Filed 2002·Granted Apr 11, 2006·13 cites·13 claims
- 1871US8304744B2Closed drift ion sourceMADOCKS JOHN ERIC·Filed 2007·Granted Nov 6, 2012·3 cites·39 claims
- 1969US8535490B2Rotatable magnetron sputtering with axially movable target electrode tubeMADOCKS JOHN·Filed 2008·Granted Sep 17, 2013·2 cites·19 claims
- 2063US10273570B2Rotary magnetron magnet bar and apparatus containing the same for high target utilizationGENERAL PLASMA INC·Filed 2016·Granted Apr 30, 2019·0 cites·4 claims
- 2163US4753417AGate valve for vacuum processing apparatusBOC GROUP INC·Filed 1985·Granted Jun 28, 1988·22 cites·19 claims
- 2251US10657932B1Tuning device for stringed musical instrumentMADOCKS JOHN ERIC·Filed 2019·Granted May 19, 2020·0 cites·4 claims
- 2350US2013029123A1Tin oxide deposited by linear plasma enhanced chemical vapor depositionMADOCKS JOHN E·Filed 2012·Application pending·0 cites
- 2448US2016027608A1Closed drift magnetic field ion source apparatus containing self-cleaning anode and a process for substrate modification therewithGEN PLASMA INC·Filed 2015·Application pending·0 cites
- 2547US2008073557A1Methods and apparatuses for directing an ion beam sourceGERMAN JOHN·Filed 2006·Application pending·0 cites
- 2646US11092245B2Chamber valveGENERAL PLASMA INC·Filed 2016·Granted Aug 17, 2021·0 cites·14 claims
- 2746US2012164353A1Plasma enhanced chemical vapor deposition apparatusMADOCKS JOHN·Filed 2010·Application pending·0 cites
- 2846US2009032393A1Mirror Magnetron Plasma SourceGEN PLASMA INC·Filed 2007·Application pending·0 cites
- 2944US9103018B2Sputtering target temperature control utilizing layers having predetermined emissivity coefficientsMADOCKS JOHN·Filed 2010·Granted Aug 11, 2015·0 cites·6 claims
- 3044US2014057453A1Deposition of thin films on energy sensitive surfacesMADOCKS JOHN·Filed 2012·Application pending·0 cites
- 3141US10811236B2Magnetic anode for sputter magnetron cathodeGENERAL PLASMA INC·Filed 2015·Granted Oct 20, 2020·0 cites·18 claims
- 3240US2015235821A1Uniform force flange clampGEN PLASMA INC·Filed 2013·Application pending·0 cites
- 3337US2002153103A1Plasma treatment apparatusAPPLIED PROCESS TECHNOLOGIES I·Filed 2001·Application pending·0 cites
- 3437US2012187843A1Closed drift ion source with symmetric magnetic fieldMADOCKS JOHN E·Filed 2010·Application pending·0 cites
- 3533US2012231246A1Process for removal of backside coating from substrateMADOCKS JOHN E·Filed 2011·Application pending·0 cites
- 3632US2011236591A1Bipolar rectifier power supplyGEN PLASMA INC·Filed 2009·Application pending·0 cites
- 3732US2015299470A1Scratch and fingerprint resistant anti-reflective films for use on display windows of electronic devices and other related technologyGEN PLASMA INC·Filed 2015·Application pending·0 cites
- 3827US2012097526A1Rotary magnetronMADOCKS JOHN E·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →