Inventor · disambiguated record
Joo-Hyeon Park
Also filed as: PARK JOO H · PARK JOO-HYEON
27 granted patents·5 pending applications·283 citations·filing 1996–2022
96Inventor score
Files withKOREA KUMHO PETROCHEM CO LTD24BAEK SE-KYUNG1DNF CO LTD1HYUNDAI MOTOR CO LTD1JOO HYUN SANG1
Top patents by PatentIndex Score
32 records- 0183US8158327B2Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist composition comprising the polymer compound, and method for patterning using the compositionJOO HYUN-SANG·Filed 2009·Granted Apr 17, 2012·8 cites·16 claims
- 0283US6111143ASulfonium salt and its manufacturing methodKOREA KUMBO PETROCHEMICAL CO L·Filed 1998·Granted Aug 29, 2000·52 cites·2 claims
- 0379US6358666B1Chemically amplified resist composition containing norbornane type low molecular additiveKOREA KUMHO PETROCHEM CO LTD·Filed 2000·Granted Mar 19, 2002·19 cites·4 claims
- 0474US7291689B1Thermally stable low dielectric norbornene polymers with improved solubility and adhesion propertySEOUL NAT UNIV IND FOUNDATION·Filed 2006·Granted Nov 6, 2007·3 cites·12 claims
- 0570US7326520B2Copolymer of alicyclic olefin having secondary hydroxyl group and acryl compound, and chemically amplified resist composition containing the sameKOREA KUMHO PETROCHEM CO LTD·Filed 2005·Granted Feb 5, 2008·3 cites·9 claims
- 0669US8021826B2Copolymer and composition for organic and antireflective layerKOREA KUMHO PETROCHEMICALS CO LTD·Filed 2008·Granted Sep 20, 2011·4 cites·11 claims
- 0769US6146810AResist polymer and chemical amplified resist composition containing the sameKOREA KUMHO PETROCHEM CO LTD·Filed 1999·Granted Nov 14, 2000·22 cites·5 claims
- 0866US6268106B1Chemically amplified positive photoresist compositionKOREA KUMHO PETROCHEM CO LTD·Filed 1999·Granted Jul 31, 2001·25 cites·4 claims
- 0964US5665841AAcetal group-containing alkoxy-styrene polymers, method of preparing the same and chemical amplified photoresist composition mainly comprising the sameKOREA KUMHO PETROCHEM CO LTD·Filed 1996·Granted Sep 9, 1997·15 cites·3 claims
- 1062US7989257B2Polysilazane, method of synthesizing polysilazane, composition for manufacturing semiconductor device, and method of manufacturing semiconductor device using the compositionKOREA KUMHO PETROCHEM CO LTD·Filed 2009·Granted Aug 2, 2011·1 cites·20 claims
- 1159US10214610B2Polymer and composition containing sameDNF CO LTD·Filed 2014·Granted Feb 26, 2019·1 cites·11 claims
- 1258US7285373B2Polymer and chemically amplified resist composition containing the sameKOREA KUMHO PETROCHEM CO LTD·Filed 2004·Granted Oct 23, 2007·6 cites·5 claims
- 1358US6641974B2Chemically amplified resist composition containing low molecular weight additivesKOREA KUMHO PETROCHEM CO LTD·Filed 2001·Granted Nov 4, 2003·5 cites·3 claims
- 1458US6369143B1Polymer for radiation-sensitive resist and resist composition containing the sameKOREA KUMHO PETROCHEM CO LTD·Filed 1999·Granted Apr 9, 2002·18 cites·3 claims
- 1556US5916995AAcetal-substituted aromatic hydroxy compounds and negative photoresist compositions comprising the sameKOREA KUMHO PETROCHEM CO LTD·Filed 1997·Granted Jun 29, 1999·6 cites·1 claims
- 1653US6313327B1Carboxylic acid derivatives and their synthesis methodKOREA KUMHO PETROCHEM CO LTD·Filed 1999·Granted Nov 6, 2001·15 cites·5 claims
- 1753US5882835APositive photoresist resin and chemical amplified positive photoresist composition containing the sameKOREA KUMHO PETROCHEM CO LTD·Filed 1997·Granted Mar 16, 1999·18 cites·4 claims
- 1851US7939245B2Light absorbent and organic antireflection coating composition containing the sameKOREA KUMHO PETROCHEM CO LTD·Filed 2008·Granted May 10, 2011·0 cites·9 claims
- 1951US5723258AAcetal group-containing alkoxy-styrene polymers, method of preparing the same and chemical amplified photoresist composition mainly comprising the sameKOREA KUMHO PETROCHEM CO LTD·Filed 1997·Granted Mar 3, 1998·8 cites·1 claims
- 2050US6210859B1Copolymer for the manufacture of chemical amplified photoresist and a positive photoresist composition using the sameKOREA KUMHO PETROCHEM CO LTD·Filed 1999·Granted Apr 3, 2001·17 cites·10 claims
- 2149US2011053081A1Positive Type Photosensitive CompositionKOREA KUMHO PETROCHEM CO LTD·Filed 2009·Application pending·0 cites
- 2247US2023019266A1Thermoelectric module and a vehicle including the sameHYUNDAI MOTOR CO LTD·Filed 2022·Application pending·0 cites
- 2345US5962186APolymer for chemical amplified positive photoresist composition containing the sameKOREA KUMHO PETROCHEM CO LTD·Filed 1997·Granted Oct 5, 1999·12 cites·4 claims
- 2445US5962185APolymer for positive photoresist and chemical amplified positive photoresist composition containing the sameKOREA KUMHO PETROCHEM CO LTD·Filed 1997·Granted Oct 5, 1999·9 cites·4 claims
- 2544US2011053080A1Positive Typed Photosensitive CompositionKOREA KUMHO PETROCHEM CO LTD·Filed 2009·Application pending·0 cites
- 2640US5677103APositive photoresist compositionKOREA KUMHO PETROCHEM CO LTD·Filed 1996·Granted Oct 14, 1997·6 cites·9 claims
- 2737US8318402B2Photosensitive compound and photosensitive composition including the samePARK JOO HYEON·Filed 2009·Granted Nov 27, 2012·0 cites·4 claims
- 2837US6987198B2Acid generator and thin film composition containing the sameKOREA KUMHO PETROCHEM CO LTD·Filed 2003·Granted Jan 17, 2006·0 cites·2 claims
- 2937US2005090605A1Acid generator and thin film composition containing the sameKOREA KUMHO PETROCHEM CO LTD·Filed 2004·Application pending·0 cites
- 3035US5851728AThree-component chemical amplified photoresist compositionKOREA KUMHO PETROCHEM CO LTD·Filed 1996·Granted Dec 22, 1998·6 cites·3 claims
- 3134US5989775ACopolymer useful for positive photoresist and chemical amplification positive photoresist composition comprising the sameKOREA KUMHO PETROCHEM CO LTD·Filed 1997·Granted Nov 23, 1999·4 cites·2 claims
- 3234US2011201528A1Methods Of Forming An Oligomer ArrayBAEK SE-KYUNG·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →