Inventor · disambiguated record
Joseph D. Rose
Also filed as: ROSE JOSEPH · ROSE JOSEPH D
17 granted patents·7 pending applications·29 citations·filing 2001–2022
88Inventor score
Top patents by PatentIndex Score
24 records- 0187US9978609B2Low dishing copper chemical mechanical planarizationAIR PROD & CHEM·Filed 2016·Granted May 22, 2018·6 cites·12 claims
- 0280US11078417B2Low oxide trench dishing chemical mechanical polishingVERSUM MAT US LLC·Filed 2019·Granted Aug 3, 2021·2 cites·5 claims
- 0369US11718767B2Chemical mechanical planarization composition for polishing oxide materials and method of use thereofVERSUM MAT US LLC·Filed 2019·Granted Aug 8, 2023·1 cites·15 claims
- 0465US6513964B1Mass balance proportionerDYLON IND INC·Filed 2001·Granted Feb 4, 2003·20 cites·17 claims
- 0563US11692110B2Low oxide trench dishing chemical mechanical polishingVERSUM MAT US LLC·Filed 2021·Granted Jul 4, 2023·0 cites·5 claims
- 0663US11667839B2Low oxide trench dishing chemical mechanical polishingVERSUM MAT US LLC·Filed 2021·Granted Jun 6, 2023·0 cites·9 claims
- 0757US11549034B2Oxide chemical mechanical planarization (CMP) polishing compositionsVERSUM MAT US LLC·Filed 2019·Granted Jan 10, 2023·0 cites·20 claims
- 0857US11111415B2Chemical mechanical planarization of films comprising elemental siliconVERSUM MAT US LLC·Filed 2019·Granted Sep 7, 2021·0 cites·13 claims
- 0956US12205061B2Shared data induced quality control for a chemical mechanical planarization processVERSUM MAT US LLC·Filed 2022·Granted Jan 21, 2025·0 cites·19 claims
- 1056US12091581B2High oxide film removal rate shallow trench (STI) chemical mechanical planarization (CMP) polishingVERSUM MAT US LLC·Filed 2020·Granted Sep 17, 2024·0 cites·6 claims
- 1156US11072726B2Low oxide trench dishing chemical mechanical polishingVERSUM MAT US LLC·Filed 2019·Granted Jul 27, 2021·0 cites·4 claims
- 1255US11326076B2Shallow trench isolation (STI) chemical mechanical planarization (CMP) polishing with low abrasive concentration and a combination of chemical additivesVERSUM MAT US LLC·Filed 2020·Granted May 10, 2022·0 cites·24 claims
- 1354US2024395558A1Chemical Mechanical Planarization Polishing For Shallow Trench IsolationVERSUM MAT US LLC·Filed 2022·Application pending·0 cites
- 1453US11608451B2Shallow trench isolation (STI) chemical mechanical planarization (CMP) polishing with tunable silicon oxide and silicon nitride removal ratesVERSUM MAT US LLC·Filed 2020·Granted Mar 21, 2023·0 cites·18 claims
- 1552US2020095502A1High Oxide VS Nitride Selectivity, Low And Uniform Oxide Trench Dishing In Shallow Trench Isolation(STI) Chemical Mechanical Planarization Polishing(CMP)VERSUM MAT US LLC·Filed 2019·Application pending·0 cites
- 1651US11254839B2Low oxide trench dishing shallow trench isolation chemical mechanical planarization polishingVERSUM MAT US LLC·Filed 2019·Granted Feb 22, 2022·0 cites·22 claims
- 1751US2018244955A1Chemical Mechanical Planarization of Films Comprising Elemental SiliconVERSUM MAT US LLC·Filed 2018·Application pending·0 cites
- 1850US11180678B2Suppressing SiN removal rates and reducing oxide trench dishing for Shallow Trench Isolation (STI) processVERSUM MAT US LLC·Filed 2019·Granted Nov 23, 2021·0 cites·16 claims
- 1949US12234383B2Low dishing oxide CMP polishing compositions for shallow trench isolation applications and methods of making thereofVERSUM MAT US LLC·Filed 2021·Granted Feb 25, 2025·0 cites·20 claims
- 2047US2024297049A1High Oxide Removal Rates Shallow Trench Isolation Chemical Mechanical Planarization CompositionsVERSUM MAT US LLC·Filed 2020·Application pending·0 cites
- 2144US2020270479A1Shallow Trench Isolation Chemical And Mechanical Polishing SlurryVERSUM MAT US LLC·Filed 2020·Application pending·0 cites
- 2243US10745589B2Chemical mechanical polishing (CMP) of cobalt-containing substrateVERSUM MAT US LLC·Filed 2017·Granted Aug 18, 2020·0 cites·19 claims
- 2343US2020002607A1Low Oxide Trench Dishing Chemical Mechanical PolishingVERSUM MAT US LLC·Filed 2019·Application pending·0 cites
- 2441US2019127607A1Composite Particles, Method of Refining and Use ThereofVERSUM MAT US LLC·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →