Inventor · disambiguated record
John Ruffell
Also filed as: RUFFELL JOHN · RUFFELL JOHN P
10 granted patents·2 pending applications·222 citations·filing 1978–2011
90Inventor score
Top patents by PatentIndex Score
12 records- 0189US6555832B1Determining beam alignment in ion implantation using Rutherford Back ScatteringAPPLIED MATERIALS INC·Filed 2000·Granted Apr 29, 2003·33 cites·19 claims
- 0281US5053627AApparatus for ion implantationIBIS TECHNOLOGY CORP·Filed 1990·Granted Oct 1, 1991·42 cites·6 claims
- 0380US6525327B1Ion implanter and beam stop thereforAPPLIED MATERIALS INC·Filed 2000·Granted Feb 25, 2003·24 cites·27 claims
- 0475US6350097B1Method and apparatus for processing wafersAPPLIED MATERIALS INC·Filed 1999·Granted Feb 26, 2002·42 cites·7 claims
- 0575US4812663ACalorimetric dose monitor for ion implantation equipmentEATON CORP·Filed 1986·Granted Mar 14, 1989·28 cites·10 claims
- 0673US6179921B1Backside gas delivery system for a semiconductor wafer processing systemAPPLIED MATERIALS INC·Filed 1999·Granted Jan 30, 2001·42 cites·19 claims
- 0770US8399851B2Systems and methods for scanning a beam of charged particlesRUFFELL JOHN·Filed 2011·Granted Mar 19, 2013·2 cites·11 claims
- 0863US8481959B2Apparatus and method for multi-directionally scanning a beam of charged particlesRUFFELL JOHN·Filed 2011·Granted Jul 9, 2013·1 cites·21 claims
- 0960US6679675B2Method and apparatus for processing wafersAPPLIED MATERIALS INC·Filed 2001·Granted Jan 20, 2004·6 cites·3 claims
- 1053US2011186748A1Systems And Methods For Scanning A Beam Of Charged ParticlesRUFFELL JOHN·Filed 2009·Application pending·0 cites
- 1137US2004221811A1Method and apparatus for processing wafersFiled 2003·Application pending·0 cites
- 1233US4307406AMultistyli recording systemsBELL & HOWELL CO·Filed 1978·Granted Dec 22, 1981·2 cites·28 claims
Join the waitlist — get patent alerts
Get an alert when John Ruffell files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →