Inventor · disambiguated record
Jorg Schultz
Also filed as: MUELLER LEGAL REPRESENTATIVE C · SCHULTZ JOERG · SCHULTZ JORG
23 granted patents·3 pending applications·1,132 citations·filing 1997–2008
97Inventor score
Files withZEISS CARL SMT AG15ZEISS STIFTUNG7CARL ZEISS SEMICONDUCTOR1CARL ZEISS STIFTUNG TRADING1ZEISS CARL1
Top patents by PatentIndex Score
26 records- 0198US6438199B1Illumination system particularly for microlithographyZEISS STIFTUNG·Filed 2000·Granted Aug 20, 2002·199 cites·65 claims
- 0298US6198793B1Illumination system particularly for EUV lithographyZEISS STIFTUNG·Filed 1999·Granted Mar 6, 2001·236 cites·54 claims
- 0396US6859515B2Illumination system, particularly for EUV lithographyCARL ZEISS STIFTUNG TRADING·Filed 2002·Granted Feb 22, 2005·236 cites·28 claims
- 0495US6400794B1Illumination system, particularly for EUV lithographyZEISS STIFTUNG·Filed 2000·Granted Jun 4, 2002·63 cites·31 claims
- 0594US6507440B1Components with an anamorphotic effect for reducing an aspect ratio of a raster element in an illumination systemZEISS STIFTUNG·Filed 2000·Granted Jan 14, 2003·68 cites·47 claims
- 0691US6570168B1Illumination system with a plurality of light sourcesZEISS STIFTUNG·Filed 2000·Granted May 27, 2003·55 cites·25 claims
- 0788US6859328B2Illumination system particularly for microlithographyCARL ZEISS SEMICONDUCTOR·Filed 2002·Granted Feb 22, 2005·58 cites·24 claims
- 0883US6704095B2Control of a distribution of illumination in an exit pupil of an EUV illumination systemZEISS CARL SMT AG·Filed 2002·Granted Mar 9, 2004·18 cites·86 claims
- 0979US7006595B2Illumination system particularly for microlithographyZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Feb 28, 2006·15 cites·22 claims
- 1079US6840640B2Multi mirror system for an illumination systemZEISS CARL SMT AG·Filed 2002·Granted Jan 11, 2005·18 cites·9 claims
- 1178US7583433B2Multi mirror system for an illumination systemZEISS CARL SMT AG·Filed 2004·Granted Sep 1, 2009·13 cites·25 claims
- 1276US7071476B2Illumination system with a plurality of light sourcesZEISS CARL SMT AG·Filed 2003·Granted Jul 4, 2006·13 cites·43 claims
- 1375US7329886B2EUV illumination system having a plurality of light sources for illuminating an optical elementZEISS CARL SMT AG·Filed 2004·Granted Feb 12, 2008·18 cites·41 claims
- 1475US6445442B2Projection-microlithographic deviceZEISS STIFTUNG·Filed 2001·Granted Sep 3, 2002·14 cites·25 claims
- 1574US6366410B1Reticular objective for microlithography-projection exposure installationsZEISS STIFTUNG·Filed 1997·Granted Apr 2, 2002·33 cites·29 claims
- 1673US6680803B2Partial objective in an illuminating systemsZEISS CARL SMT AG·Filed 2001·Granted Jan 20, 2004·15 cites·39 claims
- 1770US7443948B2Illumination system particularly for microlithographyZEISS CARL SMT AG·Filed 2006·Granted Oct 28, 2008·2 cites·31 claims
- 1867US6295122B1Illumination system and REMA objective with lens displacement and operating process thereforZEISS CARL·Filed 1999·Granted Sep 25, 2001·32 cites·24 claims
- 1965US6770894B1Illumination system with field mirrors for producing uniform scanning energyZEISS CARL SMT AG·Filed 2000·Granted Aug 3, 2004·10 cites·32 claims
- 2064US7126137B2Illumination system with field mirrors for producing uniform scanning energyZEISS CARL SMT AG·Filed 2004·Granted Oct 24, 2006·9 cites·33 claims
- 2159US7130129B2Reticle-masking objective with aspherical lensesZEISS CARL SMT AG·Filed 2003·Granted Oct 31, 2006·5 cites·20 claims
- 2255US2008225259A1Illumination system with variable adjustment of the illuminationZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 2351US7148495B2Illumination system, particularly for EUV lithographyZEISS CARL SMT AG·Filed 2004·Granted Dec 12, 2006·2 cites·9 claims
- 2447US7372634B2Reticle-masking objective with aspherical lensesZEISS CARL SMT AG·Filed 2006·Granted May 13, 2008·0 cites·6 claims
- 2542US2004119961A1Illumination system with variable adjustment of the illuminationZEISS CARL SMT AG·Filed 2003·Application pending·0 cites
- 2641US2007030948A1Illumination system with field mirrors for producing uniform scanning energyZEISS CARL SMT AG·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →