Inventor · disambiguated record
Joseph So
Also filed as: SO JOSEPH · SO JOSEPH K
19 granted patents·11 pending applications·371 citations·filing 2000–2025
94Inventor score
Files withROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC10ROHM & HAAS ELECT MAT7RODEL INC4ALDEN DONNA M1DUPONT ELECTRONIC MAT HOLDING INC1
Top patents by PatentIndex Score
30 records- 0197US6749485B1Hydrolytically stable grooved polishing pads for chemical mechanical planarizationRODEL INC·Filed 2000·Granted Jun 15, 2004·98 cites·31 claims
- 0297US6736709B1Grooved polishing pads for chemical mechanical planarizationRODEL INC·Filed 2000·Granted May 18, 2004·96 cites·28 claims
- 0396US6893328B2Conductive polishing pad with anode and cathodeROHM & HAAS ELECT MAT·Filed 2003·Granted May 17, 2005·71 cites·10 claims
- 0494US11548114B1Compressible non-reticulated polyurea polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2021·Granted Jan 10, 2023·3 cites·10 claims
- 0582US7387964B2Copper polishing cleaning solutionROHM & HAAS ELECT MAT·Filed 2003·Granted Jun 17, 2008·24 cites·10 claims
- 0679US6475069B1Control of removal rates in CMPRODEL INC·Filed 2000·Granted Nov 5, 2002·21 cites·9 claims
- 0777US8257152B2Silicate composite polishing padWANK ANDREW R·Filed 2010·Granted Sep 4, 2012·6 cites·8 claims
- 0876US2023347470A1Pad for chemical mechanical polishingROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2022·Application pending·0 cites
- 0975US12447582B2Chemical mechanical polishing pad with fluorinated polymer and multimodal groove patternROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2023·Granted Oct 21, 2025·0 cites·7 claims
- 1073US2025303516A1Multifunctional endpoint detection windowROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2024·Application pending·0 cites
- 1173US2025303515A1Multifunctional endpoint detection windowROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2024·Application pending·0 cites
- 1272US8202334B2Method of forming silicate polishing padALDEN DONNA M·Filed 2010·Granted Jun 19, 2012·4 cites·10 claims
- 1372US6769968B2Interchangeable conditioning disk apparatusROHM & HAAS ELECT MAT·Filed 2002·Granted Aug 3, 2004·14 cites·18 claims
- 1470US2025222556A1Pad for chemical mechanical polishingDUPONT ELECTRONIC MAT HOLDING INC·Filed 2025·Application pending·0 cites
- 1569US6530824B2Method and composition for polishing by CMPRODEL INC·Filed 2001·Granted Mar 11, 2003·15 cites·22 claims
- 1666US9446498B1Chemical mechanical polishing pad with windowROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2015·Granted Sep 20, 2016·1 cites·7 claims
- 1763US7303993B2Chemical mechanical polishing compositions and methods relating theretoROHM & HAAS ELECT MAT·Filed 2004·Granted Dec 4, 2007·9 cites·7 claims
- 1861US2023082181A1Fluorinated polyurea copolymer padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2021·Application pending·0 cites
- 1958US7084059B2CMP system for metal depositionROHM & HAAS ELECT MAT·Filed 2003·Granted Aug 1, 2006·6 cites·10 claims
- 2055US11897082B2Heterogeneous fluoropolymer mixture polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2021·Granted Feb 13, 2024·0 cites·10 claims
- 2150US7384871B2Chemical mechanical polishing compositions and methods relating theretoROHM & HAAS ELECT MAT·Filed 2004·Granted Jun 10, 2008·3 cites·9 claims
- 2248US11638978B2Low-debris fluopolymer composite CMP polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2019·Granted May 2, 2023·0 cites·10 claims
- 2345US2005104048A1Compositions and methods for polishing copperFiled 2003·Application pending·0 cites
- 2442US8357446B2Hollow polymeric-silicate compositeROHM & HAAS ELECT MAT·Filed 2010·Granted Jan 22, 2013·0 cites·8 claims
- 2540US2003119692A1Copper polishing cleaning solutionFiled 2002·Application pending·0 cites
- 2636US2005136671A1Compositions and methods for low downforce pressure polishing of copperFiled 2003·Application pending·0 cites
- 2736US2003190874A1Composite conditioning toolFiled 2003·Application pending·0 cites
- 2835US2005136670A1Compositions and methods for controlled polishing of copperFiled 2003·Application pending·0 cites
- 2931US10875146B2Debris-removal groove for CMP polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Dec 29, 2020·0 cites·10 claims
- 3031US2002019202A1Control of removal rates in CMPFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →