Inventor · disambiguated record
John P. Stirniman
Also filed as: STIRNIMAN JOHN · STIRNIMAN JOHN P
8 granted patents·390 citations·filing 1997–2010
89Inventor score
Top patents by PatentIndex Score
8 records- 0197US6289499B1Proximity correction software for wafer lithographyAVANT CORP·Filed 2000·Granted Sep 11, 2001·183 cites·20 claims
- 0295US6081658AProximity correction system for wafer lithographyAVANT CORP·Filed 1997·Granted Jun 27, 2000·148 cites·4 claims
- 0386US7458059B2Model of sensitivity of a simulated layout to a change in original layout, and use of model in proximity correctionSYNOPSYS INC·Filed 2005·Granted Nov 25, 2008·21 cites·24 claims
- 0481US7617478B2Flash-based anti-aliasing techniques for high-accuracy high efficiency mask synthesisSYNOPSYS INC·Filed 2007·Granted Nov 10, 2009·13 cites·21 claims
- 0574US7831954B2Flash-based updating techniques for high-accuracy high efficiency mask synthesisSYNOPSYS INC·Filed 2007·Granted Nov 9, 2010·6 cites·25 claims
- 0663US7234129B2Calculating etch proximity-correction using object-precision techniquesSYNOPSYS INC·Filed 2004·Granted Jun 19, 2007·9 cites·24 claims
- 0763US7207029B2Calculating etch proximity-correction using image-precision techniquesSYNOPSYS INC·Filed 2004·Granted Apr 17, 2007·9 cites·21 claims
- 0861US8490032B2Flash-based anti-aliasing techniques for high-accuracy high-efficiency mask synthesisRIEGER MICHAEL L·Filed 2010·Granted Jul 16, 2013·1 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →