Inventor · disambiguated record
Joji Takayoshi
Also filed as: TAKAYOSHI JOJI
7 granted patents·4 pending applications·4 citations·filing 2018–2025
72Inventor score
Files withTOKYO ELECTRON LTD11
Top patents by PatentIndex Score
11 records- 0179US11145490B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2019·Granted Oct 12, 2021·2 cites·11 claims
- 0271US11404249B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Aug 2, 2022·2 cites·25 claims
- 0360US2025124357A1Information processing method, computer program, and information processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0458US11682543B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jun 20, 2023·0 cites·11 claims
- 0553US10546723B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2018·Granted Jan 28, 2020·0 cites·7 claims
- 0649US12288678B2Substrate processing apparatus and substrate transfer position adjustment methodTOKYO ELECTRON LTD·Filed 2022·Granted Apr 29, 2025·0 cites·19 claims
- 0748US11705374B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jul 18, 2023·0 cites·10 claims
- 0846US2023078310A1Method of detecting deviation amount of substrate transport position and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 0945US2025157798A1Control program, information processing program, control method, information processing method, plasma processing device, and information processing deviceTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1042US12033838B2Plasma processing apparatus and wear amount measurement methodTOKYO ELECTRON LTD·Filed 2021·Granted Jul 9, 2024·0 cites·12 claims
- 1139US2022122813A1Substrate processing system, control method, and control programTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →