Inventor · disambiguated record
Johann Trenkler
Also filed as: MUELLENDER STEPHAN · TRENKLER JOHANN
13 granted patents·3 pending applications·62 citations·filing 2003–2018
90Inventor score
Top patents by PatentIndex Score
16 records- 0188US7116394B2Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning systemZEISS CARL SMT AG·Filed 2003·Granted Oct 3, 2006·31 cites·31 claims
- 0282US8243364B2Reflective optical element and EUV lithography applianceTRENKLER JOHANN·Filed 2011·Granted Aug 14, 2012·4 cites·26 claims
- 0381US8891163B2Reflective optical element and EUV lithography applianceZEISS CARL SMT GMBH·Filed 2013·Granted Nov 18, 2014·2 cites·10 claims
- 0480US7952797B2Reflective optical element and EUV lithography applianceZEISS CARL SMT GMBH·Filed 2009·Granted May 31, 2011·6 cites·22 claims
- 0578US8228483B2Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plateLOERING ULRICH·Filed 2010·Granted Jul 24, 2012·6 cites·20 claims
- 0675US8966830B2Safety deviceTRENKLER JOHANN·Filed 2012·Granted Mar 3, 2015·6 cites·14 claims
- 0770US8164077B2Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical elementWEDOWSKI MARCO·Filed 2009·Granted Apr 24, 2012·3 cites·33 claims
- 0867US7646004B2Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical elementZEISS CARL SMT AG·Filed 2006·Granted Jan 12, 2010·2 cites·50 claims
- 0964US2018224585A1Reflective optical element and euv lithography applianceZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 1060US8537460B2Reflective optical element and EUV lithography applianceTRENKLER JOHANN·Filed 2012·Granted Sep 17, 2013·0 cites·20 claims
- 1159US9910193B2Reflective optical element and EUV lithography applianceZEISS CARL SMT GMBH·Filed 2014·Granted Mar 6, 2018·0 cites·25 claims
- 1253US7629055B2Protective coating system for reflective optical elements, reflective optical element and method for the production thereofZEISS CARL SMT AG·Filed 2005·Granted Dec 8, 2009·1 cites·23 claims
- 1350US2006066940A1Reflective optical element and EUV lithography applianceTRENKLER JOHANN·Filed 2005·Application pending·0 cites
- 1447US8944615B2Projection objective and method for its manufactureMANN HANS-JUERGEN·Filed 2010·Granted Feb 3, 2015·0 cites·23 claims
- 1547US7429116B2Projection objective and method for its manufactureZEISS CARL SMT AG·Filed 2004·Granted Sep 30, 2008·1 cites·11 claims
- 1637US2009015951A1Projection objective and method for its manufactureZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →