Inventor · disambiguated record
Joachim Welte
Also filed as: WELTE JOACHIM
11 granted patents·7 pending applications·7 citations·filing 2005–2024
81Inventor score
Top patents by PatentIndex Score
18 records- 0176US11366382B2Method and apparatus for performing an aerial image simulation of a photolithographic maskZEISS CARL SMT GMBH·Filed 2020·Granted Jun 21, 2022·1 cites·21 claims
- 0268US7987121B2Systems and methods for generating an accounting documentSAP AG·Filed 2006·Granted Jul 26, 2011·3 cites·17 claims
- 0364US10325276B2Financial reporting system integrating market segment attributes and accounting dataSAP SE·Filed 2015·Granted Jun 18, 2019·1 cites·17 claims
- 0462US2025103936A1Systems and methods for switchable fiber-based ion addressing schemeIONQ INC·Filed 2024·Application pending·0 cites
- 0561US2025037896A1Systems and methods for mems-based scalable large field-of-view parallel quantum gate control systemIONQ INC·Filed 2024·Application pending·0 cites
- 0661US2024428109A1Multi-aperture large field-of-view raman systemIONQ INC·Filed 2024·Application pending·0 cites
- 0760US8775280B2Managing consistent interfaces for financial business objects across heterogeneous systemsZECH SANDRA·Filed 2011·Granted Jul 8, 2014·2 cites·3 claims
- 0858US11355311B2Method and apparatus for determining a wavefront of a massive particle beamZEISS CARL SMT GMBH·Filed 2020·Granted Jun 7, 2022·0 cites·20 claims
- 0958US2024282475A1Systems and methods for beam shaping for large aspect ratio with a single cylindrical lensIONQ INC·Filed 2024·Application pending·0 cites
- 1055US2025053062A1Methods and apparatuses for acousto-optic device beam displacement and angle compensationIONQ INC·Filed 2024·Application pending·0 cites
- 1153US11487211B2Device and method for processing a microstructured componentZEISS CARL SMT GMBH·Filed 2020·Granted Nov 1, 2022·0 cites·31 claims
- 1251US11385539B2Method and apparatus for compensating defects of a mask blankZEISS CARL SMS LTD·Filed 2020·Granted Jul 12, 2022·0 cites·20 claims
- 1350US11914289B2Method and apparatus for determining an effect of one or more pixels to be introduced into a substrate of a photolithographic maskZEISS CARL SMS LTD·Filed 2021·Granted Feb 27, 2024·0 cites·19 claims
- 1450US2023113702A1Method and apparatus for processing a lithographic maskZEISS CARL SMT GMBH·Filed 2022·Application pending·0 cites
- 1547US2007156546A1Reconciliation method and apparatusOPPERT TILL·Filed 2005·Application pending·0 cites
- 1645US11366383B2Method and apparatus for determining positions of a plurality of pixels to be introduced in a substrate of a photolithographic maskZEISS CARL SMS LTD·Filed 2019·Granted Jun 21, 2022·0 cites·22 claims
- 1745US11249294B2Optical system and method for correcting mask defects using the systemZEISS CARL SMT GMBH·Filed 2019·Granted Feb 15, 2022·0 cites·20 claims
- 1845US10578975B2Method for correcting the critical dimension uniformity of a photomask for semiconductor lithographyZEISS CARL SMT GMBH·Filed 2018·Granted Mar 3, 2020·0 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →