Inventor · disambiguated record
John M. White
Also filed as: SOMEKH SASSON · WHITE JOHN · WHITE JOHN CHARLES · WHITE JOHN M
254 granted patents·145 pending applications·17,681 citations·filing 1976–2023
99Inventor score
Files withAPPLIED MATERIALS INC261WHITE JOHN M34APPLIED KOMATSU TECHNOLOGY INC18CHOI SOO YOUNG16KUDELA JOZEF8
Top patents by PatentIndex Score
399 records- 0199US8328939B2Diffuser plate with slit valve compensationCHOI SOO YOUNG·Filed 2007·Granted Dec 11, 2012·743 cites·24 claims
- 0299US8173228B2Particle reduction on surfaces of chemical vapor deposition processing apparatusCHOI SOO YOUNG·Filed 2006·Granted May 8, 2012·122 cites·18 claims
- 0399US8074599B2Plasma uniformity control by gas diffuser curvatureCHOI SOO YOUNG·Filed 2005·Granted Dec 13, 2011·253 cites·33 claims
- 0499US6825134B2Deposition of film layers by alternately pulsing a precursor and high frequency power in a continuous gas flowAPPLIED MATERIALS INC·Filed 2002·Granted Nov 30, 2004·595 cites·33 claims
- 0599US6477980B1Flexibly suspended gas distribution manifold for plasma chamberAPPLIED MATERIALS INC·Filed 2000·Granted Nov 12, 2002·393 cites·18 claims
- 0699US5558717ACVD Processing chamberAPPLIED MATERIALS INC·Filed 1994·Granted Sep 24, 1996·1.2k cites·36 claims
- 0799US5362526APlasma-enhanced CVD process using TEOS for depositing silicon oxideAPPLIED MATERIALS INC·Filed 1991·Granted Nov 8, 1994·484 cites·15 claims
- 0899US5000113AThermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized processAPPLIED MATERIALS INC·Filed 1986·Granted Mar 19, 1991·1.1k cites·19 claims
- 0999US4892753AProcess for PECVD of silicon oxide using TEOS decompositionAPPLIED MATERIALS INC·Filed 1988·Granted Jan 9, 1990·503 cites·12 claims
- 1099US4872947ACVD of silicon oxide using TEOS decomposition and in-situ planarization processAPPLIED MATERIALS INC·Filed 1988·Granted Oct 10, 1989·522 cites·14 claims
- 1199US4854263AInlet manifold and methods for increasing gas dissociation and for PECVD of dielectric filmsAPPLIED MATERIALS INC·Filed 1987·Granted Aug 8, 1989·791 cites·11 claims
- 1298US9397380B2Guided wave applicator with non-gaseous dielectric for plasma chamberKUDELA JOZEF·Filed 2012·Granted Jul 19, 2016·191 cites·26 claims
- 1398US8992723B2RF bus and RF return bus for plasma chamber electrodeSORENSEN CARL A·Filed 2010·Granted Mar 31, 2015·157 cites·7 claims
- 1498US8083853B2Plasma uniformity control by gas diffuser hole designCHOI SOO YOUNG·Filed 2004·Granted Dec 27, 2011·753 cites·106 claims
- 1598US7785672B2Method of controlling the film properties of PECVD-deposited thin filmsAPPLIED MATERIALS INC·Filed 2004·Granted Aug 31, 2010·247 cites·20 claims
- 1698US7722925B2Showerhead mounting to accommodate thermal expansionAPPLIED MATERIALS INC·Filed 2005·Granted May 25, 2010·233 cites·20 claims
- 1798US7518466B2Methods and apparatus for symmetrical and/or concentric radio frequency matching networksAPPLIED MATERIALS INC·Filed 2006·Granted Apr 14, 2009·63 cites·26 claims
- 1898US7017269B2Suspended gas distribution plateAPPLIED MATERIALS INC·Filed 2003·Granted Mar 28, 2006·251 cites·15 claims
- 1998US6823589B2Flexibly suspended gas distribution manifold for plasma chamberAPPLIED MATERIALS INC·Filed 2002·Granted Nov 30, 2004·249 cites·16 claims
- 2098US6167834B1Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized processAPPLIED MATERIALS INC·Filed 1992·Granted Jan 2, 2001·367 cites·5 claims
- 2198US5512320AVacuum processing apparatus having improved throughputAPPLIED MATERIALS INC·Filed 1994·Granted Apr 30, 1996·261 cites·18 claims
- 2298US5366585AMethod and apparatus for protection of conductive surfaces in a plasma processing reactorAPPLIED MATERIALS INC·Filed 1993·Granted Nov 22, 1994·462 cites·29 claims
- 2397US7476289B2Vacuum elastomer bonding apparatus and methodAPPLIED MATERIALS INC·Filed 2006·Granted Jan 13, 2009·37 cites·20 claims
- 2497US7358192B2Method and apparatus for in-situ film stack processingAPPLIED MATERIALS INC·Filed 2004·Granted Apr 15, 2008·174 cites·31 claims
- 2597US7270713B2Tunable gas distribution plate assemblyAPPLIED MATERIALS INC·Filed 2003·Granted Sep 18, 2007·124 cites·30 claims
- 2697US6235634B1Modular substrate processing systemAPPLIED KOMATSU TECHNOLOGY INC·Filed 1998·Granted May 22, 2001·420 cites·83 claims
- 2797US6079693AIsolation valvesAPPLIED KOMATSU TECHNOLOGY INC·Filed 1998·Granted Jun 27, 2000·95 cites·17 claims
- 2897US5680013ACeramic protection for heated metal surfaces of plasma processing chamber exposed to chemically aggressive gaseous environment therein and method of protecting such heated metal surfacesAPPLIED MATERIALS INC·Filed 1994·Granted Oct 21, 1997·177 cites·30 claims
- 2997US4842683AMagnetic field-enhanced plasma etch reactorAPPLIED MATERIALS INC·Filed 1988·Granted Jun 27, 1989·410 cites·16 claims
- 3096US9382621B2Ground return for plasma processesCHOI SOO YOUNG·Filed 2010·Granted Jul 5, 2016·27 cites·33 claims
- 3196US8206075B2Methods and apparatus for sealing a chamberWHITE JOHN M·Filed 2005·Granted Jun 26, 2012·64 cites·16 claims
- 3296US8174400B2Frequency monitoring to detect plasma process abnormalityPARK BEOM SOO·Filed 2011·Granted May 8, 2012·324 cites·15 claims
- 3396US6626744B1Planarization system with multiple polishing padsAPPLIED MATERIALS INC·Filed 2000·Granted Sep 30, 2003·74 cites·16 claims
- 3496US6244935B1Apparatus and methods for chemical mechanical polishing with an advanceable polishing sheetAPPLIED MATERIALS INC·Filed 1999·Granted Jun 12, 2001·178 cites·42 claims
- 3596US6206176B1Substrate transfer shuttle having a magnetic driveAPPLIED KOMATSU TECHNOLOGY INC·Filed 1998·Granted Mar 27, 2001·191 cites·13 claims
- 3696US5815047AFast transition RF impedance matching network for plasma reactor ignitionAPPLIED MATERIALS INC·Filed 1995·Granted Sep 29, 1998·140 cites·29 claims
- 3796US5582866ASingle substrate vacuum processing apparatus having improved exhaust systemAPPLIED MATERIALS INC·Filed 1994·Granted Dec 10, 1996·147 cites·20 claims
- 3896US5352294AAlignment of a shadow frame and large flat substrates on a supportWHITE JOHN M·Filed 1993·Granted Oct 4, 1994·148 cites·20 claims
- 3995US7429410B2Diffuser gravity supportAPPLIED MATERIALS INC·Filed 2005·Granted Sep 30, 2008·32 cites·15 claims
- 4095US6541384B1Method of initiating cooper CMP processAPPLIED MATERIALS INC·Filed 2000·Granted Apr 1, 2003·54 cites·13 claims
- 4195US6435868B2Multi-function chamber for a substrate processing systemAPPLIED KOMATSU TECHNOLOGY INC·Filed 2000·Granted Aug 20, 2002·79 cites·25 claims
- 4295US5674786AMethod of heating and cooling large area glass substratesAPPLIED MATERIALS INC·Filed 1995·Granted Oct 7, 1997·220 cites·5 claims
- 4395US5312778AMethod for plasma processing using magnetically enhanced plasma chemical vapor depositionAPPLIED MATERIALS INC·Filed 1990·Granted May 17, 1994·111 cites·15 claims
- 4494US8795793B2Gas diffusion shower head design for large area plasma enhanced chemical vapor depositionCHOI SOO YOUNG·Filed 2008·Granted Aug 5, 2014·16 cites·20 claims
- 4594US7845891B2Decoupled chamber bodyAPPLIED MATERIALS INC·Filed 2006·Granted Dec 7, 2010·29 cites·21 claims
- 4694US7611217B2Methods and systems for inkjet drop positioningAPPLIED MATERIALS INC·Filed 2005·Granted Nov 3, 2009·23 cites·12 claims
- 4794US7438175B2Linear vacuum deposition systemAPPLIED MATERIALS INC·Filed 2005·Granted Oct 21, 2008·28 cites·7 claims
- 4894US7432201B2Hybrid PVD-CVD systemAPPLIED MATERIALS INC·Filed 2005·Granted Oct 7, 2008·32 cites·22 claims
- 4994US6688375B1Vacuum processing system having improved substrate heating and coolingAPPLIED MATERIALS INC·Filed 1997·Granted Feb 10, 2004·266 cites·16 claims
- 5094US6413873B1System for chemical mechanical planarizationAPPLIED MATERIALS INC·Filed 2000·Granted Jul 2, 2002·85 cites·3 claims
Showing the top 50 of 399 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →