Inventor · disambiguated record
Johannes Zellner
Also filed as: ZELLNER JOHANNES
14 granted patents·4 pending applications·50 citations·filing 2003–2024
89Inventor score
Top patents by PatentIndex Score
18 records- 0190US8027022B2Projection objectiveZEISS CARL SMT GMBH·Filed 2008·Granted Sep 27, 2011·12 cites·21 claims
- 0287US7477355B2Projection exposure apparatus and projection optical systemZEISS CARL SMT AG·Filed 2005·Granted Jan 13, 2009·10 cites·15 claims
- 0386US8873122B2Microlithographic imaging optical system including multiple mirrorsMANN HANS-JUERGEN·Filed 2011·Granted Oct 28, 2014·4 cites·23 claims
- 0485US8629972B2Projection objective for microlithographyZELLNER JOHANNES·Filed 2010·Granted Jan 14, 2014·6 cites·37 claims
- 0567US7557902B2Projection objectiveZEISS CARL SMT AG·Filed 2003·Granted Jul 7, 2009·10 cites·25 claims
- 0660US9195145B2Microlithographic imaging optical system including multiple mirrorsZEISS CARL SMT GMBH·Filed 2014·Granted Nov 24, 2015·0 cites·37 claims
- 0760US9057964B2Imaging optics and projection exposure installation for microlithography with an imaging opticsMANN HANS-JUERGEN·Filed 2011·Granted Jun 16, 2015·1 cites·20 claims
- 0859US9372411B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Jun 21, 2016·1 cites·34 claims
- 0959US7697211B2Symmetrical objective having four lens groups for microlithographyZEISS CARL SMT AG·Filed 2008·Granted Apr 13, 2010·2 cites·26 claims
- 1059US2024414419A1Optical system for a camera and camera having an optical systemZEISS CARL AG·Filed 2024·Application pending·0 cites
- 1158US9304408B2Projection objective for microlithographyZEISS CARL SMT GMBH·Filed 2013·Granted Apr 5, 2016·0 cites·30 claims
- 1256US2023333364A1Optical systemZEISS CARL AG·Filed 2023·Application pending·0 cites
- 1353US7524072B2Optical component, comprising a material with a predetermined homogeneity of thermal expansionZEISS CARL SMT AG·Filed 2004·Granted Apr 28, 2009·4 cites·34 claims
- 1449US9182578B2Imaging optical system and illumination optical systemMANN HANS-JUERGEN·Filed 2011·Granted Nov 10, 2015·0 cites·38 claims
- 1548US10578972B2EUV collector for use in an EUV projection exposure apparatusZEISS CARL SMT GMBH·Filed 2018·Granted Mar 3, 2020·0 cites·20 claims
- 1647US7999917B2Illumination system and microlithographic projection exposure apparatus including sameZEISS CARL SMT GMBH·Filed 2008·Granted Aug 16, 2011·0 cites·20 claims
- 1740US2008073596A1Lithographic apparatus and methodASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 1836US2012069314A1Imaging optics and projection exposure installation for microlithography with an imaging optics of this typeZELLNER JOHANNES·Filed 2011·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Johannes Zellner files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →