Inventor · disambiguated record

Jun Hatakeyama

Also filed as: HATAKEYAMA JUN

570 granted patents·144 pending applications·5,482 citations·filing 1989–2025

99Inventor score

Technology areasG03F C08F H10P Y10S C07C

Files withSHINETSU CHEMICAL CO598 HATAKEYAMA JUN54 CENTRAL GLASS CO LTD12 CALSONIC KANSEI CORP7 HARADA YUJI6

Top patents by PatentIndex Score

714 records

0199US11644753B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2021·Granted May 9, 2023·6 cites·13 claims
0299US7598016B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2008·Granted Oct 6, 2009·107 cites·13 claims
0399US6448420B1Acid-decomposable ester compound suitable for use in resist materialSHINETSU CHEMICAL CO·Filed 2000·Granted Sep 10, 2002·160 cites·5 claims
0499US6312867B1Ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 1999·Granted Nov 6, 2001·209 cites·17 claims
0598US11493843B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted Nov 8, 2022·4 cites·13 claims
0698US11415887B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted Aug 16, 2022·9 cites·13 claims
0798US10303056B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2017·Granted May 28, 2019·11 cites·2 claims
0898US10295904B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2017·Granted May 21, 2019·43 cites·17 claims
0998US10101654B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2017·Granted Oct 16, 2018·12 cites·15 claims
1098US9250518B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2014·Granted Feb 2, 2016·35 cites·15 claims
1198US9091918B2Sulfonium salt, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2014·Granted Jul 28, 2015·58 cites·19 claims
1298US7771914B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Aug 10, 2010·90 cites·18 claims
1398US7771913B2Resist composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2007·Granted Aug 10, 2010·55 cites·27 claims
1498US7670750B2Polymer, resist protective coating material, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Mar 2, 2010·65 cites·25 claims
1598US7569326B2Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Aug 4, 2009·129 cites·11 claims
1698US7537880B2Polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted May 26, 2009·258 cites·10 claims
1798US7455952B2Patterning process and resist overcoat materialSHINETSU CHEMICAL CO·Filed 2005·Granted Nov 25, 2008·63 cites·16 claims
1898US7358025B2Photoresist undercoat-forming material and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted Apr 15, 2008·55 cites·8 claims
1998US7354693B2Polymer, resist protective coating material, and patterning processSHINETSU CHEMICAL CO·Filed 2005·Granted Apr 8, 2008·54 cites·8 claims
2098US6280898B1Lactone-containing compounds, polymers, resist compositions, and patterning methodSHINETSU CHEMICAL CO·Filed 1999·Granted Aug 28, 2001·229 cites·21 claims
2197US11880136B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2021·Granted Jan 23, 2024·3 cites·13 claims
2297US11860540B2Positive resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2021·Granted Jan 2, 2024·3 cites·12 claims
2397US11835860B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2021·Granted Dec 5, 2023·3 cites·13 claims
2497US11592745B2Positive resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted Feb 28, 2023·4 cites·11 claims
2597US11417842B2Conductive polymer composite and conductive polymer compositionSHINETSU CHEMICAL CO·Filed 2020·Granted Aug 16, 2022·4 cites·13 claims
2697US9360753B2Resist composition and patterning processHATAKEYAMA JUN·Filed 2012·Granted Jun 7, 2016·22 cites·8 claims
2797US8088554B2Bottom resist layer composition and patterning process using the sameHATAKEYAMA JUN·Filed 2010·Granted Jan 3, 2012·16 cites·2 claims
2897US8057985B2Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning processOHASHI MASAKI·Filed 2009·Granted Nov 15, 2011·52 cites·11 claims
2997US7084303B2Tertiary amine compounds having an ester structure and processes for preparing sameSHINETSU CHEMICAL CO·Filed 2002·Granted Aug 1, 2006·79 cites·8 claims
3097US6147249AEster compounds, polymers, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 1999·Granted Nov 14, 2000·81 cites·20 claims
3196US11846884B2Chemically amplified resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2021·Granted Dec 19, 2023·5 cites·14 claims
3296US11567406B2Positive resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted Jan 31, 2023·3 cites·11 claims
3396US10915021B2Monomer, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted Feb 9, 2021·8 cites·15 claims
3496US10613437B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted Apr 7, 2020·8 cites·19 claims
3596US8785105B2Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making methodOHSAWA YOUICHI·Filed 2011·Granted Jul 22, 2014·17 cites·16 claims
3696US8652757B2Method for forming resist underlayer film, patterning process using the same, and composition for the resist underlayer filmSHINETSU CHEMICAL CO·Filed 2013·Granted Feb 18, 2014·12 cites·1 claims
3796US8440386B2Patterning process, resist composition, and acetal compoundHATAKEYAMA JUN·Filed 2011·Granted May 14, 2013·10 cites·14 claims
3896US8105748B2Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning processOHASHI MASAKI·Filed 2009·Granted Jan 31, 2012·81 cites·11 claims
3996US8057982B2Monomer, resist composition, and patterning processHATAKEYAMA JUN·Filed 2009·Granted Nov 15, 2011·33 cites·17 claims
4096US8048610B2Sulfonium salt-containing polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2009·Granted Nov 1, 2011·32 cites·11 claims
4196US8003295B2Patterning process and resist composition used thereinSHINETSU CHEMICAL CO·Filed 2008·Granted Aug 23, 2011·25 cites·11 claims
4296US7759047B2Resist protective film composition and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Jul 20, 2010·33 cites·15 claims
4396US7514202B2Thermal acid generator, resist undercoat material and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Apr 7, 2009·37 cites·9 claims
4496US7514204B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Apr 7, 2009·40 cites·12 claims
4595US11604411B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted Mar 14, 2023·3 cites·13 claims
4695US11281101B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2019·Granted Mar 22, 2022·6 cites·11 claims
4795US10968175B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted Apr 6, 2021·6 cites·18 claims
4895US10474030B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2017·Granted Nov 12, 2019·8 cites·13 claims
4995US10101653B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2017·Granted Oct 16, 2018·7 cites·13 claims
5095US9897914B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2016·Granted Feb 20, 2018·7 cites·14 claims

Showing the top 50 of 714 patent records by PatentIndex Score.

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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →