Inventor · disambiguated record
Julian Kaller
Also filed as: KALLER JULIAN
17 granted patents·5 pending applications·12 citations·filing 2004–2024
89Inventor score
Top patents by PatentIndex Score
22 records- 0181US8870396B2Substrates for mirrors for EUV lithography and their productionZEISS CARL SMT GMBH·Filed 2012·Granted Oct 28, 2014·5 cites·19 claims
- 0275US10509336B2Optical assembly having a thermally conductive componentZEISS CARL SMT GMBH·Filed 2017·Granted Dec 17, 2019·2 cites·34 claims
- 0375US9097984B2Microlithography projection objectiveZEISS CARL SMT GMBH·Filed 2014·Granted Aug 4, 2015·1 cites·30 claims
- 0474US7659976B2Devices and methods for inspecting optical elements with a view to contaminationZEISS CARL SMT AG·Filed 2006·Granted Feb 9, 2010·2 cites·29 claims
- 0565US2024319621A1Apparatus and method for avoiding a degradation of an optical used surface of a mirror module, projection system, illumination system and projection exposure apparatusZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 0662US12405108B2Production method and measurement methodZEISS CARL SMT GMBH·Filed 2023·Granted Sep 2, 2025·0 cites·13 claims
- 0761US10281824B2Microlithography projection objectiveZEISS CARL SMT GMBH·Filed 2017·Granted May 7, 2019·0 cites·24 claims
- 0860US11194119B2Optical assembly having a thermally conductive componentZEISS CARL SMT GMBH·Filed 2019·Granted Dec 7, 2021·0 cites·20 claims
- 0960US2014293256A1Microlithography projection objectiveZEISS CARL SMT GMBH·Filed 2014·Application pending·0 cites
- 1059US2018031827A1Lens module comprising at least one exchangeable optical elementZEISS CARL SMT GMBH·Filed 2017·Application pending·0 cites
- 1158US10203607B2Optical element unit for exposure processesZEISS CARL SMT GMBH·Filed 2014·Granted Feb 12, 2019·0 cites·29 claims
- 1258US8939587B2Lens module comprising at least one exchangeable optical elementZEISS CARL SMT GMBH·Filed 2013·Granted Jan 27, 2015·0 cites·36 claims
- 1357US8376559B2Lens module comprising at least one exchangeable optical elementZEISS CARL SMT GMBH·Filed 2012·Granted Feb 19, 2013·0 cites·8 claims
- 1456US9703098B2Lens module comprising at least one exchangeable optical elementZEISS CARL SMT GMBH·Filed 2016·Granted Jul 11, 2017·0 cites·4 claims
- 1556US9046795B2Optical element unit for exposure processes having sealing elementSCHWERTNER TILMAN·Filed 2008·Granted Jun 2, 2015·1 cites·52 claims
- 1653US9423695B2Lens module comprising at least one exchangeable optical elementZEISS CARL SMT GMBH·Filed 2015·Granted Aug 23, 2016·0 cites·26 claims
- 1752US2009115986A1Microlithography projection objectiveZEISS CARL SMT AG·Filed 2006·Application pending·0 cites
- 1850US7545483B2Optical element unit for exposure processesZEISS CARL SMT AG·Filed 2008·Granted Jun 9, 2009·0 cites·82 claims
- 1945US2011058147A1Cleaning module and euv lithography device with cleaning moduleZEISS CARL SMT AG·Filed 2010·Application pending·0 cites
- 2044US8092029B2Lens module comprising at least one exchangeable optical elementSOYEZ GUIDO·Filed 2005·Granted Jan 10, 2012·0 cites·37 claims
- 2142US7443500B2Apparatus for scattered light inspection of optical elementsZEISS CARL SMT AG·Filed 2004·Granted Oct 28, 2008·1 cites·20 claims
- 2241US8248578B2Projection exposure method and projection exposure system thereforKALLER JULIAN·Filed 2009·Granted Aug 21, 2012·0 cites·30 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →