Inventor · disambiguated record
Jung-Youl Lee
Also filed as: LEE JUNG-YOUL
12 granted patents·2 pending applications·12 citations·filing 2005–2022
84Inventor score
Top patents by PatentIndex Score
14 records- 0183US9416296B2Resist underlayer composition and method for forming pattern using sameDONGJIN SEMICHEM CO LTD·Filed 2014·Granted Aug 16, 2016·3 cites·8 claims
- 0277US7935474B2Acid-amplifier having acetal group and photoresist composition including the sameDONGJIN SEMICHEM CO LTD·Filed 2008·Granted May 3, 2011·2 cites·6 claims
- 0373US7604919B2Monomer, polymer and composition for photoresistDONGJIN SEMICHEM CO LTD·Filed 2007·Granted Oct 20, 2009·2 cites·9 claims
- 0473US7569325B2Monomer having sulfonyl group, polymer thereof and photoresist composition including the sameDONGJIN SEMICHEM CO LTD·Filed 2007·Granted Aug 4, 2009·3 cites·6 claims
- 0568US7695893B2Photo-sensitive compound and photoresist composition including the sameDONGJIN SEMICHEM CO LTD·Filed 2008·Granted Apr 13, 2010·1 cites·7 claims
- 0660US9651867B2Compound and composition for forming lower film of resist pattern, and method for forming lower film using sameDONGJIN SEMICHEM CO LTD·Filed 2013·Granted May 16, 2017·1 cites·9 claims
- 0753US12046464B2Substrate cleaning composition, method for cleaning substrate using the same, and method for fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Jul 23, 2024·0 cites·20 claims
- 0850US7501222B2Photoresist monomer polymer thereof and photoresist composition including the sameDONGJIN SEMICHEM CO LTD·Filed 2006·Granted Mar 10, 2009·0 cites·15 claims
- 0948US7419761B2Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the sameDONGJIN SEMICHEM CO LTD·Filed 2005·Granted Sep 2, 2008·0 cites·13 claims
- 1043US8124311B2Photosensitive molecular compound and photoresist composition including the sameLEE JUNG-YOUL·Filed 2009·Granted Feb 28, 2012·0 cites·7 claims
- 1142US8293458B2Method for forming fine pattern in semiconductor deviceLEE JUN-GYEONG·Filed 2009·Granted Oct 23, 2012·0 cites·19 claims
- 1239US2014242520A1I-line photoresist composition and method for forming fine pattern using sameDONGJIN SEMICHEM CO LTD·Filed 2012·Application pending·0 cites
- 1337US10712662B2Methods of forming patterns using compositions for an underlayer of photoresistSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Jul 14, 2020·0 cites·14 claims
- 1437US2014287587A1Method for Forming Fine Patterns of Semiconductor Device Using Directed Self-Assembly ProcessDONGJIN SEMICHEM CO LTD·Filed 2012·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Jung-Youl Lee files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →