Inventor · disambiguated record
Jun Lin
Also filed as: LIN JUN · LIN JUN-NAN
12 granted patents·3 pending applications·343 citations·filing 2006–2023
86Inventor score
Files withTOKYO ELECTRON LTD10LIN JUN-NAN2CENTRAL GLASS CO LTD1LIEN CHING-HOHN1SEMICONDUCTOR MFG INT SHANGHAI1
Top patents by PatentIndex Score
15 records- 0197US9991138B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Jun 5, 2018·337 cites·6 claims
- 0269US10199268B2Film forming method and film forming systemTOKYO ELECTRON LTD·Filed 2017·Granted Feb 5, 2019·1 cites·15 claims
- 0368US12381096B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2023·Granted Aug 5, 2025·0 cites·6 claims
- 0468US10460946B2Naturally oxidized film removing method and naturally oxidized film removing deviceTOKYO ELECTRON LTD·Filed 2016·Granted Oct 29, 2019·1 cites·8 claims
- 0565US11189498B2Method of etching silicon-containing film, computer-readable storage medium, and apparatus for etching silicon-containing filmTOKYO ELECTRON LTD·Filed 2019·Granted Nov 30, 2021·1 cites·5 claims
- 0663US11791175B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Oct 17, 2023·0 cites·13 claims
- 0760US8263432B2Material composition having core-shell microstructure used for varistorLIEN CHING-HOHN·Filed 2007·Granted Sep 11, 2012·3 cites·3 claims
- 0848US11282714B2Etching method and etching deviceCENTRAL GLASS CO LTD·Filed 2017·Granted Mar 22, 2022·0 cites·15 claims
- 0944US10998199B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2019·Granted May 4, 2021·0 cites·9 claims
- 1044US10734242B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Aug 4, 2020·0 cites·5 claims
- 1142US8163174B2Submerged biofiltration purifying apparatusLIN JUN-NAN·Filed 2010·Granted Apr 24, 2012·0 cites·10 claims
- 1241US10734243B2Etching method and substrate processing systemTOKYO ELECTRON LTD·Filed 2017·Granted Aug 4, 2020·0 cites·6 claims
- 1341US2009045122A1Fine bubble diffuser membrane for water and wastewater treatmentLIN JUN-NAN·Filed 2007·Application pending·0 cites
- 1438US2008078420A1Method for post-cmp wafer surface cleaningSEMICONDUCTOR MFG INT SHANGHAI·Filed 2006·Application pending·0 cites
- 1532US2019378724A1Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →