Inventor · disambiguated record
Jun Nonaka
Also filed as: NONAKA JUN · NONAKA JUN-ICHI
28 granted patents·6 pending applications·183 citations·filing 1989–2024
95Inventor score
Top patents by PatentIndex Score
34 records- 0187US9897919B2Substrate liquid treatment apparatus, substrate liquid treatment method and storage mediumTOKYO ELECTRON LTD·Filed 2016·Granted Feb 20, 2018·5 cites·15 claims
- 0286US11724235B2Mixing apparatus, mixing method and substrate processing systemTOKYO ELECTRON LTD·Filed 2020·Granted Aug 15, 2023·2 cites·16 claims
- 0383US11938524B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2020·Granted Mar 26, 2024·1 cites·14 claims
- 0478US2024379388A1Substrate processing apparatus, mixing method, and substrate processing methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0577US10236192B2Liquid processing apparatus, liquid processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2014·Granted Mar 19, 2019·5 cites·11 claims
- 0673US12068175B2Substrate processing apparatus, mixing method, and substrate processing methodTOKYO ELECTRON LTD·Filed 2022·Granted Aug 20, 2024·0 cites·8 claims
- 0771US5798784ALaser drawing apparatus featuring a beam separator supported by an adjusting means swingable about a rotating shaftASAHI OPTICAL CO LTD·Filed 1996·Granted Aug 25, 1998·31 cites·24 claims
- 0870US7622720B2Exposure deviceORC MAUFACTURING CO LTD·Filed 2008·Granted Nov 24, 2009·4 cites·15 claims
- 0969US6309984B1Agent for treating water repellency supply cloth and water repellency supply clothSOFT 99 CORP·Filed 1999·Granted Oct 30, 2001·24 cites·10 claims
- 1065US11257692B2Substrate processing apparatus, mixing method, and substrate processing methodTOKYO ELECTRON LTD·Filed 2020·Granted Feb 22, 2022·0 cites·11 claims
- 1165US5204119AExternal preparation comprising calcium silicateSHIOBARA TAKAO·Filed 1991·Granted Apr 20, 1993·44 cites·7 claims
- 1263US8956465B2Liquid processing method, liquid processing device, and storage mediumTOKYO ELECTRON LTD·Filed 2013·Granted Feb 17, 2015·1 cites·12 claims
- 1362US9412627B2Liquid processing method and liquid processing apparatusNONAKA JUN·Filed 2012·Granted Aug 9, 2016·2 cites·6 claims
- 1460US5046796AApparatus for correcting scanning beams on basis of tilting of surface segments of polygonal mirror used in scanning pattern drawing apparatusASAHI OPTICAL CO LTD·Filed 1989·Granted Sep 10, 1991·17 cites·4 claims
- 1557US6475934B1Wet cloth for cleaning, water repellent finish and polishing of automobile paint filmSOFT 99 CORP·Filed 1999·Granted Nov 5, 2002·18 cites·16 claims
- 1655US11723259B2Substrate processing apparatus and method of processing substrateTOKYO ELECTRON LTD·Filed 2021·Granted Aug 8, 2023·0 cites·12 claims
- 1753US12198948B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Jan 14, 2025·0 cites·18 claims
- 1852US11282727B2Control device of substrate processing apparatus and control method of substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Mar 22, 2022·0 cites·15 claims
- 1951US5043566AMonitor mechanism for use with a scanning optical apparatus with composite drawing a monitoring beamsASAHI OPTICAL CO LTD·Filed 1989·Granted Aug 27, 1991·11 cites·3 claims
- 2048US12033872B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Jul 9, 2024·0 cites·13 claims
- 2148US2021368586A1Storage device and storage methodTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 2247US12255082B2Substrate processing methodTOKYO ELECTRON LTD·Filed 2022·Granted Mar 18, 2025·0 cites·16 claims
- 2341US10748790B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2018·Granted Aug 18, 2020·0 cites·10 claims
- 2441US10242889B2Substrate liquid processing method and substrate liquid processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Mar 26, 2019·0 cites·8 claims
- 2540US2013284213A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 2640US2014377463A1Liquid processing method, liquid processing apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 2737US5027137ADrawing surface adjusting mechanism for use with scanning pattern drawing apparatusASAHI OPTICAL CO LTD·Filed 1989·Granted Jun 25, 1991·4 cites·5 claims
- 2834US5805198ALaser drawing apparatus and method for adjusting the sameASAHI OPTICAL CO LTD·Filed 1994·Granted Sep 8, 1998·4 cites·12 claims
- 2934US2017316961A1Substrate liquid processing method, substrate liquid processing apparatus, and computer-readable storage medium that stores substrate liquid processing programTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 3033US5093561ADrawing surface adjusting mechanism for scanning pattern drawing apparatusASAHI OPTICAL CO LTD·Filed 1991·Granted Mar 3, 1992·5 cites·24 claims
- 3133US2017301534A1Substrate liquid processing method, substrate liquid processing apparatus, and computer-readable storage medium that stores substrate liquid processing programTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 3231US9862007B2Substrate liquid processing apparatus and method, and computer-readable recording medium with substrate liquid processing program recorded thereinTOKYO ELECTRON LTD·Filed 2015·Granted Jan 9, 2018·0 cites·14 claims
- 3330US5017949ATable assembly for pattern drawing apparatusASAHI OPTICAL CO LTD·Filed 1989·Granted May 21, 1991·2 cites·9 claims
- 3427US5164792AMovement measuring interferometer and driving systemASAHI OPTICAL CO LTD·Filed 1990·Granted Nov 17, 1992·3 cites·18 claims
Join the waitlist — get patent alerts
Get an alert when Jun Nonaka files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →