Inventor · disambiguated record
Jung-Min Oh
Also filed as: OH JUNG M · OH JUNG-MIN
55 granted patents·25 pending applications·162 citations·filing 1991–2025
98Inventor score
Files withSAMSUNG ELECTRONICS CO LTD51LEE HYO-SAN3OH JUNG-MIN3SAMSUNG SDI CO LTD3AVAGO TECH INT SALES PTE LID2
Top patents by PatentIndex Score
80 records- 0193US10679843B2Method of treating substrates using supercritical fluidsSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Jun 9, 2020·7 cites·10 claims
- 0291US11390805B2Etching composition and method for manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Jul 19, 2022·3 cites·20 claims
- 0388US8766343B2Integrated circuit capacitors having sidewall supportsKANG DAE-HYUK·Filed 2012·Granted Jul 1, 2014·10 cites·20 claims
- 0488US8119476B2Methods of forming integrated circuit capacitors having sidewall supports and capacitors formed therebyKANG DAE-HYUK·Filed 2010·Granted Feb 21, 2012·10 cites·16 claims
- 0587US10083829B2Apparatus for treating substrates using supercritical fluids, substrate treatment system including the same and method of treating substrates using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Sep 25, 2018·4 cites·14 claims
- 0687US8790470B2Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methodsLEE HYO-SAN·Filed 2011·Granted Jul 29, 2014·8 cites·35 claims
- 0786US9027576B2Substrate treatment systems using supercritical fluidCHO YONG-JHIN·Filed 2013·Granted May 12, 2015·10 cites·8 claims
- 0886US7445314B2Piezoelectric ink-jet printhead and method of manufacturing a nozzle plate of the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Nov 4, 2008·9 cites·33 claims
- 0984US10388537B2Cleaning apparatus, chemical mechanical polishing system including the same, cleaning method after chemical mechanical polishing, and method of manufacturing semiconductor device including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Aug 20, 2019·3 cites·21 claims
- 1084US8084367B2Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methodsLEE HYO-SAN·Filed 2007·Granted Dec 27, 2011·9 cites·31 claims
- 1182US9941110B2Manufacturing method and fluid supply system for treating substrateSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Apr 10, 2018·3 cites·12 claims
- 1282US8815697B2Method of fabricating semiconductor deviceYOON JUN-HO·Filed 2012·Granted Aug 26, 2014·9 cites·19 claims
- 1382US8585917B2Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methodsLEE HYO-SAN·Filed 2011·Granted Nov 19, 2013·5 cites·36 claims
- 1481US9831081B2Method for treating substrateSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Nov 28, 2017·3 cites·19 claims
- 1579US7498217B2Methods of manufacturing semiconductor memory devices with unit cells having charge trapping layersSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Mar 3, 2009·9 cites·26 claims
- 1679US7435644B2Method of manufacturing capacitor of semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Oct 14, 2008·3 cites·20 claims
- 1778US10991600B2Process chamber and substrate processing apparatus including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Apr 27, 2021·2 cites·20 claims
- 1878US9627233B2Substrate treating apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Apr 18, 2017·4 cites·19 claims
- 1977US9829952B2Processor that has its operating frequency controlled in view of power consumption during operation and semiconductor device including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Nov 28, 2017·3 cites·20 claims
- 2076US9852921B2Substrate treating apparatus and method of treating substrateSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Dec 26, 2017·2 cites·18 claims
- 2176US9524864B2Manufacturing method and fluid supply system for treating substrateSAMSUNG ELECTRONICS CO LTD·Filed 2013·Granted Dec 20, 2016·3 cites·10 claims
- 2274US8795541B2Substrate processing method and substrate processing system for performing the sameCHO YONG-JHIN·Filed 2011·Granted Aug 5, 2014·3 cites·11 claims
- 2374US8449813B1Deoxidation apparatus for preparing titanium powder with low oxygen concentrationLIM JAE-WON·Filed 2012·Granted May 28, 2013·2 cites·4 claims
- 2472US7820508B2Semiconductor device having capacitor and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Oct 26, 2010·3 cites·17 claims
- 2571US11091696B2Etching composition and method for manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Aug 17, 2021·1 cites·15 claims
- 2671US7985999B2Semiconductor device having capacitorSAMSUNG ELECTRONICS CO LTD·Filed 2010·Granted Jul 26, 2011·2 cites·8 claims
- 2769US8979975B2Method of producing low oxygen-content molybdenum powder by reducing molybdenum trioxideKOREA INST GEOSCIENCE & MINERA·Filed 2013·Granted Mar 17, 2015·1 cites·5 claims
- 2868US11227761B2Method of removing chemicals from a substrateSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Jan 18, 2022·0 cites·9 claims
- 2968US8449646B1Method for preparing titanium powder with low oxygen concentrationLIM JAE-WON·Filed 2012·Granted May 28, 2013·1 cites·3 claims
- 3067US11610788B2Process chamber and substrate processing apparatus including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Mar 21, 2023·0 cites·20 claims
- 3167US9155028B2Apparatus and method for scanning network in a mobile communication terminalKIM NOH-SUN·Filed 2009·Granted Oct 6, 2015·4 cites·12 claims
- 3266US7459370B2Method of fabricating semiconductor memory device having plurality of storage node electrodesSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Dec 2, 2008·2 cites·38 claims
- 3365US7419737B2Fuel supply device for direct methanol fuel cellsSAMSUNG SDI CO LTD·Filed 2004·Granted Sep 2, 2008·7 cites·18 claims
- 3465US2025236793A1Etching compositions and methods for fabricating semiconductor devices by using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2025·Application pending·0 cites
- 3563US2021098261A1Cleaning apparatus, chemical mechanical polishing system including the same, cleaning method after chemical mechanical polishing, and method of manufacturing semiconductor device including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Application pending·0 cites
- 3662US12297385B2Etching compositions and methods for fabricating semiconductor devices by using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted May 13, 2025·0 cites·9 claims
- 3762US2025361625A1Etchant composition for molybdenum layer and method for fabricating integrated circuit device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 3861US8415072B2Membrane electrode assembly for fuel cellOH JUNG-MIN·Filed 2006·Granted Apr 9, 2013·1 cites·14 claims
- 3960US8836431B2High-efficiency power amplifier with multiple power modesHAN CHOONG SOO·Filed 2010·Granted Sep 16, 2014·4 cites·18 claims
- 4060US2025187928A1Max precursor having reduced oxygen content and method for producing mxeneINNOMXENE CO LTD·Filed 2023·Application pending·0 cites
- 4157US12107550B2Linearization of differential RF power amplifier by bias control using cross-coupling componentsAVAGO TECH INT SALES PTE LID·Filed 2022·Granted Oct 1, 2024·0 cites·20 claims
- 4257US7704828B2Method of fabricating a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Apr 27, 2010·1 cites·26 claims
- 4355US2024336839A1TiN ETCHANT COMPOSITION AND METHOD OF FORMING SEMICONDUCTOR DEVICESAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 4454US10795263B2Compositions for removing photoresistSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Oct 6, 2020·0 cites·7 claims
- 4554US2018315613A1Cleaning apparatus, chemical mechanical polishing system including the same, cleaning method after chemical mechanical polishing, and method of manufacturing semiconductor device including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Application pending·0 cites
- 4653US8043765B2Fuel cell system comprising vapor-phase fuel supplying systemSAMSUNG SDI CO LTD·Filed 2006·Granted Oct 25, 2011·0 cites·33 claims
- 4751US2025277149A1Etching composition and method for manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 4850US10186427B2Substrate treating apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Jan 22, 2019·0 cites·14 claims
- 4950US9394509B2Cleaning solution composition and method of cleaning semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Jul 19, 2016·0 cites·15 claims
- 5050US8278006B2Fuel cell system and mobile communication device including the sameLEE JAE-YONG·Filed 2006·Granted Oct 2, 2012·0 cites·33 claims
Showing the top 50 of 80 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →