Inventor · disambiguated record
Juan Carlos Rocha
Also filed as: ROCHA JUAN C · ROCHA JUAN CARLOS
16 granted patents·10 pending applications·482 citations·filing 2008–2025
92Inventor score
Top patents by PatentIndex Score
26 records- 0197US10056279B2Semiconductor process equipmentAPPLIED MATERIALS INC·Filed 2016·Granted Aug 21, 2018·22 cites·8 claims
- 0297US8338809B2Ultraviolet reflector with coolant gas holes and methodYANG YAO-HUNG·Filed 2011·Granted Dec 25, 2012·408 cites·23 claims
- 0396US11956883B2Methods and apparatus for controlling RF parameters at multiple frequenciesAPPLIED MATERIALS INC·Filed 2022·Granted Apr 9, 2024·3 cites·18 claims
- 0496US10734265B2Semiconductor process equipmentAPPLIED MATERIALS INC·Filed 2018·Granted Aug 4, 2020·13 cites·18 claims
- 0594US11570879B2Methods and apparatus for controlling RF parameters at multiple frequenciesAPPLIED MATERIALS INC·Filed 2020·Granted Jan 31, 2023·3 cites·18 claims
- 0687US7964858B2Ultraviolet reflector with coolant gas holes and methodAPPLIED MATERIALS INC·Filed 2008·Granted Jun 21, 2011·21 cites·44 claims
- 0784US10663491B2Voltage-current probe for measuring radio-frequency electrical power in a high-temperature environment and method of calibrating the sameAPPLIED MATERIALS INC·Filed 2018·Granted May 26, 2020·1 cites·8 claims
- 0881US2025201534A1Baffle implementation for improving bottom purge gas flow uniformityAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0974US10227695B2Shadow ring for modifying wafer edge and bevel depositionDU BOIS DALE R·Filed 2010·Granted Mar 12, 2019·4 cites·13 claims
- 1072US11136665B2Shadow ring for modifying wafer edge and bevel depositionAPPLIED MATERIALS INC·Filed 2019·Granted Oct 5, 2021·1 cites·13 claims
- 1170US11009455B2Precursor delivery system and methods related theretoAPPLIED MATERIALS INC·Filed 2019·Granted May 18, 2021·1 cites·17 claims
- 1269US12183553B2Baffle implementation for improving bottom purge gas flow uniformityAPPLIED MATERIALS INC·Filed 2020·Granted Dec 31, 2024·0 cites·14 claims
- 1368US8841629B2Microwave excursion detection for semiconductor processingHENDRICKSON SCOTT A·Filed 2012·Granted Sep 23, 2014·3 cites·17 claims
- 1467US11499229B2Substrate supports including metal-ceramic interfacesAPPLIED MATERIALS INC·Filed 2019·Granted Nov 15, 2022·1 cites·20 claims
- 1567US10438860B2Dynamic wafer leveling/tilting/swiveling steps for use during a chemical vapor deposition processAPPLIED MATERIALS INC·Filed 2016·Granted Oct 8, 2019·1 cites·20 claims
- 1666US2025283205A1Manufacturing of mesas using deposited layer for substrate supportsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1761US2025391700A1Hybrid vacuum electrostatic chuckAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1860US2025372432A1Substrate heater having reduced surface roughnessAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 1959US2025201538A1Esc design with enhanced tunability for wafer far edge plasma profile controlAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2059US2025293009A1Advanced thermal management system (atm) for pedestal temperature control in high power pecvd chamberAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2156US2020013586A1Semiconductor processing apparatus for high rf power processAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 2253US2019378696A1Apparatus for suppressing parasitic plasma in plasma enhanced chemical vapor deposition chamberAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 2352US11434569B2Ground path systems for providing a shorter and symmetrical ground pathAPPLIED MATERIALS INC·Filed 2019·Granted Sep 6, 2022·0 cites·20 claims
- 2452US2025299993A1Method and apparatus for securing a substrateAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2544US2020058539A1Coating material for processing chambersAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 2643US11276569B2On stack overlay improvement for 3D NANDAPPLIED MATERIALS INC·Filed 2019·Granted Mar 15, 2022·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →