Inventor · disambiguated record
Ju-Cheol Shin
Also filed as: SHIN JU-CHEOL
7 granted patents·4 pending applications·43 citations·filing 2001–2005
83Inventor score
Files withSAMSUNG ELECTRONICS CO LTD8
Top patents by PatentIndex Score
11 records- 0174US6623798B2Chemical vapor deposition method for depositing silicide and apparatus for performing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Sep 23, 2003·13 cites·14 claims
- 0260US6797575B2Method for forming a polycide structure in a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Sep 28, 2004·8 cites·10 claims
- 0358US6905960B2Method of forming a contact in a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jun 14, 2005·9 cites·13 claims
- 0456US6670268B2Metal interconnection with low resistance in a semiconductor device and a method of forming the sameSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Dec 30, 2003·6 cites·31 claims
- 0553US6774029B2Method for forming a conductive film and a conductive pattern of a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Aug 10, 2004·4 cites·24 claims
- 0646US7135407B2Method of manufacturing a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Nov 14, 2006·3 cites·18 claims
- 0745US7122468B2Methods of fabricating integrated circuit conductive contact structures including groovesSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Oct 17, 2006·0 cites·10 claims
- 0842US2003219536A1Chemical vapor deposition method for depositing silicide and apparatus for performing the sameFiled 2003·Application pending·0 cites
- 0939US2004067607A1Metal interconnection with low resistance in a semiconductor device and a method of forming the sameSAMSUNG ELECTRONICS CO LTD·Filed 2003·Application pending·0 cites
- 1038US2004259344A1Method for forming a metal layer method for manufacturing a semiconductor device using the sameFiled 2004·Application pending·0 cites
- 1137US2004000717A1Integrated circuit conductive contact structures including grooves and fabrication methods thereofFiled 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →