Inventor · disambiguated record
Jun Ye
Also filed as: YE JUN · YE JUN JASON
147 granted patents·11 pending applications·4,394 citations·filing 1998–2023
99Inventor score
Files withASML NETHERLANDS BV44BRION TECH INC27YE JUN21ON BRIGHT ELECTRONICS SHANGHAI CO LTD20CAO YU6
Top patents by PatentIndex Score
158 records- 0199US7587704B2System and method for mask verification using an individual mask error modelBRION TECH INC·Filed 2006·Granted Sep 8, 2009·483 cites·17 claims
- 0298US11042687B2Fast freeform source and mask co-optimization methodASML NETHERLANDS BV·Filed 2020·Granted Jun 22, 2021·4 cites·20 claims
- 0398US9111062B2Fast freeform source and mask co-optimization methodASML NETHERLANDS BV·Filed 2013·Granted Aug 18, 2015·22 cites·16 claims
- 0498US8200468B2Methods and system for lithography process window simulationYE JUN·Filed 2008·Granted Jun 12, 2012·147 cites·22 claims
- 0598US8057967B2Process window signature patterns for lithography process controlYE JUN·Filed 2010·Granted Nov 15, 2011·39 cites·11 claims
- 0698US7694267B1Method for process window optimized optical proximity correctionBRION TECH INC·Filed 2007·Granted Apr 6, 2010·86 cites·16 claims
- 0798US7492619B2System and method for providing control for switch-mode power supplyON BRIGHT ELECTRONICS SHANGHAI CO LTD·Filed 2006·Granted Feb 17, 2009·83 cites·17 claims
- 0898US7120895B2System and method for lithography simulationBRION TECH INC·Filed 2005·Granted Oct 10, 2006·73 cites·28 claims
- 0998US7117478B2System and method for lithography simulationBRION TECH INC·Filed 2005·Granted Oct 3, 2006·61 cites·52 claims
- 1098US7003758B2System and method for lithography simulationBRION TECH INC·Filed 2004·Granted Feb 21, 2006·281 cites·35 claims
- 1198US6884984B2System and method for lithography process monitoring and controlBRION TECH INC·Filed 2004·Granted Apr 26, 2005·101 cites·53 claims
- 1298US6828542B2System and method for lithography process monitoring and controlBRION TECH INC·Filed 2003·Granted Dec 7, 2004·120 cites·40 claims
- 1398US6803554B2System and method for lithography process monitoring and controlBRION TECH INC·Filed 2003·Granted Oct 12, 2004·107 cites·49 claims
- 1497US9009647B2Methods and systems for lithography calibration using a mathematical model for a lithographic processASML NETHERLANDS BV·Filed 2013·Granted Apr 14, 2015·16 cites·23 claims
- 1597US8856694B2Computational process controlYE JUN·Filed 2012·Granted Oct 7, 2014·20 cites·22 claims
- 1697US8589829B2Three-dimensional mask model for photolithography simulationLIU PENG·Filed 2013·Granted Nov 19, 2013·13 cites·28 claims
- 1797US8584056B2Fast freeform source and mask co-optimization methodCHEN LUOQI·Filed 2009·Granted Nov 12, 2013·42 cites·15 claims
- 1897US8065636B2System and method for creating a focus-exposure model of a lithography processYE JUN·Filed 2010·Granted Nov 22, 2011·18 cites·24 claims
- 1997US7882480B2System and method for model-based sub-resolution assist feature generationASML NETHERLANDS BV·Filed 2007·Granted Feb 1, 2011·37 cites·16 claims
- 2097US7853920B2Method for detecting, sampling, analyzing, and correcting marginal patterns in integrated circuit manufacturingASML NETHERLANDS BV·Filed 2006·Granted Dec 14, 2010·67 cites·28 claims
- 2197US7747978B2System and method for creating a focus-exposure model of a lithography processASML NETHERLANDS BV·Filed 2006·Granted Jun 29, 2010·37 cites·43 claims
- 2297US7695876B2Method for identifying and using process window signature patterns for lithography process controlBRION TECH INC·Filed 2006·Granted Apr 13, 2010·61 cites·26 claims
- 2397US7488933B2Method for lithography model calibrationBRION TECH INC·Filed 2006·Granted Feb 10, 2009·58 cites·104 claims
- 2497US7111277B2System and method for lithography simulationBRION TECH INC·Filed 2004·Granted Sep 19, 2006·65 cites·38 claims
- 2597US7099164B2Adaptive multi-level threshold system and method for power converter protectionON BRIGHT ELECTRONICS SHANGHAI CO LTD·Filed 2005·Granted Aug 29, 2006·72 cites·33 claims
- 2697US7053355B2System and method for lithography process monitoring and controlBRION TECH INC·Filed 2005·Granted May 30, 2006·93 cites·34 claims
- 2797US6969837B2System and method for lithography process monitoring and controlBRION TECH INC·Filed 2004·Granted Nov 29, 2005·82 cites·30 claims
- 2897US6969864B2System and method for lithography process monitoring and controlBRION TECH INC·Filed 2004·Granted Nov 29, 2005·71 cites·41 claims
- 2997US6807503B2Method and apparatus for monitoring integrated circuit fabricationBRION TECH INC·Filed 2003·Granted Oct 19, 2004·126 cites·50 claims
- 3097US6806456B1System and method for lithography process monitoring and controlBRION TECH INC·Filed 2003·Granted Oct 19, 2004·86 cites·32 claims
- 3196US9372957B2Three-dimensional mask model for photolithography simulationASML NETHERLANDS BV·Filed 2015·Granted Jun 21, 2016·6 cites·11 claims
- 3296US8938694B2Three-dimensional mask model for photolithography simulationASML NETHERLANDS BV·Filed 2013·Granted Jan 20, 2015·22 cites·16 claims
- 3396US8918742B2Methods and systems for pattern design with tailored response to wavefront aberrationFENG HANYING·Filed 2012·Granted Dec 23, 2014·23 cites·21 claims
- 3496US8560978B2Pattern-dependent proximity matching/tuning including light manipulation by projection opticsFENG HANYING·Filed 2011·Granted Oct 15, 2013·15 cites·20 claims
- 3596US8318391B2Process window signature patterns for lithography process controlYE JUN·Filed 2011·Granted Nov 27, 2012·12 cites·21 claims
- 3696US7999920B2Method of performing model-based scanner tuningASML NETHERLANDS BV·Filed 2007·Granted Aug 16, 2011·22 cites·20 claims
- 3796US7749666B2System and method for measuring and analyzing lithographic parameters and determining optimal process correctionsASML NETHERLANDS BV·Filed 2006·Granted Jul 6, 2010·44 cites·13 claims
- 3896US7703069B1Three-dimensional mask model for photolithography simulationBRION TECH INC·Filed 2007·Granted Apr 20, 2010·128 cites·23 claims
- 3996US7684462B2System and method for controlling variations of switching frequencyON BRIGHT ELECTRONICS SHANGHAI CO LTD·Filed 2005·Granted Mar 23, 2010·40 cites·32 claims
- 4096US7679938B2System and method for providing control for switch-mode power supplyON BRIGHT ELECTRONICS SHANGHAI CO LTD·Filed 2008·Granted Mar 16, 2010·47 cites·14 claims
- 4196US7617477B2Method for selecting and optimizing exposure tool using an individual mask error modelBRION TECH INC·Filed 2006·Granted Nov 10, 2009·47 cites·14 claims
- 4296US7345895B2Adaptive multi-level threshold system and method for power converter protectionON BRIGHT ELECTRONICS SHANGHAI CO LTD·Filed 2006·Granted Mar 18, 2008·59 cites·21 claims
- 4396US6820028B2Method and apparatus for monitoring integrated circuit fabricationBRION TECH INC·Filed 2004·Granted Nov 16, 2004·81 cites·43 claims
- 4495US10839131B2Three-dimensional mask model for photolithography simulationASML NETHERLANDS BV·Filed 2019·Granted Nov 17, 2020·3 cites·21 claims
- 4595US10310371B2Method and system for lithography process-window-maximizing optical proximity correctionASML NETHERLANDS BV·Filed 2016·Granted Jun 4, 2019·6 cites·20 claims
- 4695US8874423B2Model-based scanner tuning systems and methodsASML NETHERLANDS BV·Filed 2013·Granted Oct 28, 2014·9 cites·26 claims
- 4795US8832610B2Method for process window optimized optical proximity correctionASML NETHERLANDS BV·Filed 2013·Granted Sep 9, 2014·27 cites·22 claims
- 4895US8570485B2Lens heating compensation systems and methodsYE JUN·Filed 2009·Granted Oct 29, 2013·24 cites·34 claims
- 4995US8352885B2Three-dimensional mask model for photolithography simulationASML NETHERLANDS BV·Filed 2010·Granted Jan 8, 2013·21 cites·46 claims
- 5095US8245160B2System and method for creating a focus-exposure model of a lithography processYE JUN·Filed 2011·Granted Aug 14, 2012·11 cites·21 claims
Showing the top 50 of 158 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →