Inventor · disambiguated record
Kazuo Aita
Also filed as: AITA KAZUO
22 granted patents·3 pending applications·205 citations·filing 1989–2018
94Inventor score
Files withHITACHI HIGH TECH SCIENCE CORP9SEIKO INSTR INC8KAITO TAKASHI2MITSUBISHI ELECTRIC CORP2SII NANOTECHNOLOGY INC2
Top patents by PatentIndex Score
25 records- 0182US8764994B2Method for fabricating emitterHITACHI HIGH TECH SCIENCE CORP·Filed 2013·Granted Jul 1, 2014·4 cites·4 claims
- 0280US9773634B2Iridium tip, gas field ion source, focused ion beam apparatus, electron source, electron microscope, electron beam applied analysis apparatus, ion-electron multi-beam apparatus, scanning probe microscope, and mask repair apparatusHITACHI HIGH-TECH SCIENCE CORP·Filed 2017·Granted Sep 26, 2017·2 cites·11 claims
- 0379US4942618AMethod and apparatus for determining the shape of wire or like articleMITSUBISHI ELECTRIC CORP·Filed 1989·Granted Jul 17, 1990·51 cites·2 claims
- 0478US5405734AMethod for correcting a patterned film using an ion beamSEIKO INSTR INC·Filed 1993·Granted Apr 11, 1995·51 cites·4 claims
- 0576US8274063B2Composite focused ion beam device, process observation method using the same, and processing methodKAITO TAKASHI·Filed 2008·Granted Sep 25, 2012·4 cites·20 claims
- 0674US9378858B2Repair apparatusHITACHI HIGH TECH SCIENCE CORP·Filed 2014·Granted Jun 28, 2016·2 cites·5 claims
- 0772US6365905B1Focused ion beam processing apparatusSEIKO INSTR INC·Filed 1999·Granted Apr 2, 2002·24 cites·20 claims
- 0871US8269194B2Composite focused ion beam device, and processing observation method and processing method using the sameKAITO TAKASHI·Filed 2008·Granted Sep 18, 2012·3 cites·19 claims
- 0969US6544692B1Black defect correction method and black defect correction device for photomaskSEIKO INSTR INC·Filed 2000·Granted Apr 8, 2003·10 cites·5 claims
- 1062US7103209B1Method for extracting objective imageSII NANOTECHNOLOGY INC·Filed 2000·Granted Sep 5, 2006·4 cites·6 claims
- 1161US6467426B1Photomask correction deviceSEIKO INSTR INC·Filed 2000·Granted Oct 22, 2002·6 cites·20 claims
- 1259US9583299B2Iridium tip, gas field ion source, focused ion beam apparatus, electron source, electron microscope, electron beam applied analysis apparatus, ion-electron multi-beam apparatus, scanning probe microscope, and mask repair apparatusHITACHI HIGH-TECH SCIENCE CORP·Filed 2014·Granted Feb 28, 2017·0 cites·1 claims
- 1359US8999178B2Method for fabricating emitterHITACHI HIGH TECH SCIENCE CORP·Filed 2014·Granted Apr 7, 2015·0 cites·4 claims
- 1456US10276343B2Method for acquiring image and ion beam apparatusHITACHI HIGH TECH SCIENCE CORP·Filed 2018·Granted Apr 30, 2019·0 cites·6 claims
- 1555US6392230B1Focused ion beam forming methodSEIKO INSTR INC·Filed 1999·Granted May 21, 2002·20 cites·7 claims
- 1654US6642512B2Focused ion beam apparatusSEIKO INSTR INC·Filed 2002·Granted Nov 4, 2003·2 cites·14 claims
- 1754US5854488AIon beam machining method and device thereofSEIKO INSTR INC·Filed 1997·Granted Dec 29, 1998·11 cites·5 claims
- 1852US10014157B2Method for acquiring image and ion beam apparatusHITACHI HIGH TECH SCIENCE CORP·Filed 2016·Granted Jul 3, 2018·0 cites·4 claims
- 1952US9793085B2Focused ion beam apparatusHITACHI HIGH-TECH SCIENCE CORP·Filed 2016·Granted Oct 17, 2017·0 cites·11 claims
- 2052US2016322123A1Repair ApparatusHITACHI HIGH-TECH SCIENCE CORP·Filed 2016·Application pending·0 cites
- 2146US6864475B1Image sensor having uniform sensitivityMITSUBISHI ELECTRIC CORP·Filed 2000·Granted Mar 8, 2005·1 cites·1 claims
- 2244US6281496B1Observing/forming method with focused ion beam and apparatus thereforSEIKO INSTR INC·Filed 1999·Granted Aug 28, 2001·10 cites·19 claims
- 2343US2004209172A1Defect correction method for a photomaskFiled 2004·Application pending·0 cites
- 2442US7323685B2Ion beam processing methodSII NANOTECHNOLOGY INC·Filed 2004·Granted Jan 29, 2008·0 cites·2 claims
- 2540US2002121109A1Glass substrate processing methodFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →