Inventor · disambiguated record
Kai-Hsiung Chen
Also filed as: CHEN KAI-HSIUNG
23 granted patents·91 citations·filing 2004–2022
94Inventor score
Top patents by PatentIndex Score
23 records- 0193US10983005B2Spectroscopic overlay metrologyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Apr 20, 2021·6 cites·19 claims
- 0293US10281827B2Noise reduction for overlay controlTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted May 7, 2019·5 cites·20 claims
- 0390US9053284B2Method and system for overlay controlTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jun 9, 2015·8 cites·20 claims
- 0489US10031426B2Method and system for overlay controlTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jul 24, 2018·5 cites·20 claims
- 0587US7301603B2Exposure system and methodTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Nov 27, 2007·35 cites·23 claims
- 0685US9418199B2Method and apparatus for extracting systematic defectsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Aug 16, 2016·4 cites·20 claims
- 0783US10514612B2Method and system for overlay controlTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 24, 2019·2 cites·20 claims
- 0880US9766554B2Method and apparatus for estimating focus and dose of an exposure processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Sep 19, 2017·2 cites·20 claims
- 0979US10866524B2Method and system for overlay controlTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 15, 2020·1 cites·20 claims
- 1079US10684556B2Noise reduction for overlay controlTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jun 16, 2020·1 cites·20 claims
- 1177US8984450B2Method and apparatus for extracting systematic defectsTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Mar 17, 2015·5 cites·20 claims
- 1276US9070622B2Systems and methods for similarity-based semiconductor process controlTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jun 30, 2015·4 cites·20 claims
- 1373US11726413B2Overlay marks for reducing effect of bottom layer asymmetryTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Aug 15, 2023·0 cites·20 claims
- 1472US11294293B2Overlay marks for reducing effect of bottom layer asymmetryTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Apr 5, 2022·1 cites·20 claims
- 1571US11513444B2Noise reduction for overlay controlTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Nov 29, 2022·0 cites·20 claims
- 1670US10461037B2Method for forming semiconductor device structure with overlay gratingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Oct 29, 2019·1 cites·20 claims
- 1766US7004814B2CMP process control methodTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Feb 28, 2006·11 cites·23 claims
- 1865US11656391B2Aperture design and methods thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 23, 2023·0 cites·20 claims
- 1965US10867933B2Method for forming semiconductor device structure with overlay gratingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Dec 15, 2020·0 cites·20 claims
- 2060US10734325B2Method for forming semiconductor device structure with overlay gratingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 4, 2020·0 cites·20 claims
- 2157US10663633B2Aperture design and methods thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted May 26, 2020·0 cites·20 claims
- 2246US9690212B2Hybrid focus-exposure matrixTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Jun 27, 2017·0 cites·19 claims
- 2339US10204867B1Semiconductor metrology target and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Feb 12, 2019·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →