Inventor · disambiguated record
Kazumasa Endo
Also filed as: ENDO KAZUMASA
14 granted patents·1 pending application·233 citations·filing 1986–2011
93Inventor score
Top patents by PatentIndex Score
15 records- 0190US6262793B1Method of manufacturing and using correction member to correct aberration in projection exposure apparatusNIKON CORP·Filed 1994·Granted Jul 17, 2001·55 cites·31 claims
- 0280US5903400AProjection-optical system for use in a projection-exposure apparatusNIKON CORP·Filed 1997·Granted May 11, 1999·47 cites·22 claims
- 0376US5835285AProjection optical system and exposure apparatus using the sameNIKON CORP·Filed 1997·Granted Nov 10, 1998·42 cites·57 claims
- 0475US8705840B2Defect inspection device and defect inspection methodENDO KAZUMASA·Filed 2011·Granted Apr 22, 2014·4 cites·19 claims
- 0574US6958803B2Projection exposure apparatus and method with adjustment of rotationally asymmetric optical characteristicsNIKON CORP·Filed 2003·Granted Oct 25, 2005·10 cites·116 claims
- 0671US8730465B2Polarized light defect detection in pupil imagesENDO KAZUMASA·Filed 2008·Granted May 20, 2014·5 cites·19 claims
- 0768USRE37846EProjection optical system and exposure apparatus using the sameNIPPON KOGAKU KK·Filed 2000·Granted Sep 17, 2002·9 cites·90 claims
- 0867US6850371B2Optical member and method of producing the same, and projection alignerNIKON CORP·Filed 2002·Granted Feb 1, 2005·6 cites·10 claims
- 0966US6084723AExposure apparatusNIKON CORP·Filed 1996·Granted Jul 4, 2000·31 cites·35 claims
- 1056US6829039B2Optical member for photolithography and method of evaluating the sameNIKON CORP·Filed 2002·Granted Dec 7, 2004·4 cites·23 claims
- 1153US4758864AProjection exposure apparatusNIPPON KOGAKU KK·Filed 1987·Granted Jul 19, 1988·11 cites·12 claims
- 1246US7166163B2Optical member, method of manufacturing the same, and projection exposure systemNIKON CORP·Filed 2004·Granted Jan 23, 2007·1 cites·4 claims
- 1340US4660966AOptical alignment apparatusNIPPON KOGAKU KK·Filed 1986·Granted Apr 28, 1987·5 cites·8 claims
- 1439US2002054282A1Projection exposure apparatusNIKON CORP·Filed 2002·Application pending·0 cites
- 1533US4723846AOptical path length compensating optical system in an alignment apparatusNIPPON KOGAKU KK·Filed 1986·Granted Feb 9, 1988·3 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →