USRE37846EExpiredUtility
Projection optical system and exposure apparatus using the same
Est. expiryJan 6, 2015(expired)· nominal 20-yr term from priority
G03F 7/70241G02B 13/24G02B 13/22G02B 9/62G02B 27/18
68
PatentIndex Score
9
Cited by
94
References
90
Claims
Abstract
The present invention relates to an exposure apparatus using a projection optical system to realize a small size and the bitelecentricity as securing a wide exposure area and a large numerical aperture and to realize extremely good correction for aberrations, particularly for distortion. The projection optical system comprises a first lens group G 1 with a positive refracting power, a second lens group G 2 with a negative refracting power, a third lens group G 3 with a positive refracting power, a fourth lens group G 4 with a negative refracting power, a fifth lens group G 5 with a positive refracting power, and a sixth lens group G 6 with a positive refracting power in order from the side of the first object R, wherein the second lens group G 2 comprises a front lens L 2F with a negative refracting power, a rear lens L 2R of a negative meniscus shape, and an intermediate lens group G 2M disposed between the front lens and the rear lens, and wherein the intermediate lens group G 2M has a first lens L M1 with a positive refracting power, a second lens L M2 with a negative refracting power, and a third lens L M3 with a negative refracting power in order from the side of the first object R. The system is arranged to satisfy within suitable ranges of focal lengths for the first to sixth lens groups G 1 -G 6 , based on the above arrangement.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1. A projection optical system provided between a first object and a second object, for projecting an image of a first object onto a second object, said projection optical system comprising a first lens group with a positive refracting power, a second lens group with a negative refracting power, a third lens group with a positive refracting power, a fourth lens group with a negative refracting power, a fifth lens group with a positive refracting power, and a sixth lens group with a positive refracting power in order from the side of said first object,
wherein said second lens group comprises a front lens with a negative refracting power disposed as closest to said first object and shaped with a concave surface to said second object, a rear lens of a negative meniscus shape disposed as closest to said second object and shaped with a concave surface to said first object, and an intermediate lens group disposed between said front lens and said rear lens, said intermediate lens group having a first lens with a positive refracting power, a second lens with a negative refracting power, and a third lens with a negative refracting power in order from the side of said first object, and
wherein when f 1 is a focal length of said first lens group, f 2 is a focal length of said second lens group, f 3 is a focal length of said third lens group, f 4 is a focal length of said fourth lens group, f 5 is a focal length of said fifth lens group, f 6 is a focal length of said sixth lens group, and L is a distance from said first object to said second object, the following conditions are satisfied:
f 1 /L<0.8
−0.033<f 2 /L
0.01<f 3 /L<1.0
f 4 /L<−0.005
0.01<f 5 /L<0.9
0.02<f 6 /L<1.6.
2. A projection optical system according to claim 1 , wherein when I is an axial distance from said first object to a first-object-side focal point of said entire projection optical system and L is the distance from said first object to said second object, the following condition is satisfied:
1.0<I/L.
3. A projection optical system according to claim 1 , wherein said fourth lens group comprises:
a front lens group disposed as closest to the first object, said front lens group having two negative meniscus lenses each shaped with a concave surface to said second object;
a rear lens disposed as closest to the second object, said rear lens group having a negative lens with a concave surface to said first object; and
an intermediate lens group disposed between said front lens group in said fourth lens group and said rear lens group in said fourth lens group, said intermediate lens group having first and second negative lenses in order from the side of said first object, and
wherein when f 4A is a focal length of said first negative lens in said fourth lens group and f 4B is a focal length of said second negative lens in said fourth lens group, the following condition is satisfied:
0.05<f 4A /f 4B <20.
4. A projection optical system according to claim 1 , wherein when r 2Ff is a radius of curvature of a first-object-side surface of said front lens and r 2Fr is a radius of curvature of a second-object-side surface of said front lens, the front lens in said second lens group satisfies the following condition:
1.00≦(r 2Ff −r 2Fr )/(r 2Ff +r 2Fr )<5.0.
5. A projection optical system according to claim 1 , wherein said fourth lens group has:
a front lens group having a negative lens disposed as closest to said first object and shaped with a concave surface to said second object;
a rear lens group having a negative lens disposed as closest to the second object and shaped with a concave surface to said first object; and
an intermediate lens group having a negative lens and a positive lens with a convex surface adjacent to a concave surface of said negative lens is disposed between said front lens group in said fourth lens group and said rear lens group in said fourth lens group, and
wherein when r 4N is a radius of curvature of said concave surface of the negative lens in said intermediate lens group and r 4P is a radius of curvature of said convex surface of the positive lens in said intermediate lens group, the following condition is satisfied:
−0.9<(r 4N −r 4P )/(r rN +r 4P )<0.9,
provided that when L is the distance from said first object to said second object, said concave surface of said negative lens in said intermediate lens group or said convex surface of said positive lens in said intermediate lens group satisfies at least one of the following conditions:
|r 4N /L|<2.0
|r 4P /L|<2.0.
6. A projection optical system according to claim 1 , wherein when f 22 is a focal length of the second lens with the negative refracting power in said second lens group and f 23 is a focal length of the third lens with the negative refracting power in said second lens group, the following condition is satisfied:
0.1<f 22 /f 23 <10.
7. A projection optical system according to claim 1 , wherein said fifth lens group has a negative meniscus lens, and a positive lens disposed as adjacent to a concave surface of said negative meniscus lens and having a convex surface opposed to the concave surface of said negative meniscus lens, and
wherein when r 5n is a radius of curvature of the concave surface of said negative meniscus lens in said fifth lens group and r 5P is a radius of curvature of the convex surface, opposed to the concave surface of the negative meniscus lens, of the positive lens disposed as adjacent to the concave surface of said negative meniscus lens in said fifth lens group, the following condition is satisfied:
0<(r 5P −r 5n )/(r 5P +r 5n )<1.
8. A projection optical system according to claim 7 , wherein said negative meniscus lens and said positive lens adjacent to the concave surface of said negative meniscus lens are disposed between at least one positive lens in said fifth lens group and at least one positive lens in said fifth lens group.
9. A projection optical system according to claim 1 , wherein said fifth lens group has a negative lens disposed as closest to the second object and shaped with a concave surface to the second object and the sixth lens group has a lens disposed as closest to the first object and shaped with a convex surface to the first object, and
wherein when r 5R is a radius of curvature of a second-object-side surface of the negative lens disposed as closest to the second object in said fifth lens group and r 6F is a radius of curvature of a first-object-side surface of the lens disposed as closest to the first object in said sixth lens group, the following condition is satisfied:
−0.90<(r 5R −r 6F )/(r 5R +r 5F )<−0.001.
10. A projection optical system according to claim 1 , wherein when d 56 is a lens group separation between said fifth lens group and said sixth lens group and L is the distance from said first object to said second object, the following condition is satisfied:
d 56 /L<0.017.
11. A projection optical system according to claim 1 , wherein when r 6F is a radius of curvature of a lens surface closest to the first object in said sixth lens group and d 6 is an axial distance from the lens surface closest to the first object in said sixth lens group to the second object, the following condition is satisfied:
0.50<d 6 /r 6F <1.50.
12. A projection optical system according to claim 1 , wherein said fifth lens group has a negative lens disposed as closest to the second object and shaped with a concave surface to the second object, and wherein when r 5F is a radius of curvature of a first-object-side surface of the negative lens disposed as closest to the second object in said fifth lens group and r 5R is a radius of curvature of a second-object-side surface of the negative lens disposed as closest to the second object in said fifth lens group, the following condition is satisfied:
0.30<(r 5F −r 5R )/(r 5F +r 5R )<1.28.
13. A projection optical system according to claim 1 , wherein when f 2 is a focal length of the first lens with the positive refracting power in the intermediate lens group in said second lens group and L is the distance from said first object to said second object, the following condition is satisfied:
0.230<f 21 /L<0.40.
14. A projection optical system according to claim 1 , wherein when f 2F is a focal length of the front lens with the negative refracting power disposed as closest to the first object in said second lens group and shaped with the concave surface to said second object and f 2R is a focal length of the rear lens with the negative refracting power disposed as closest to the second object in said second lens group and shaped with the concave surface to said first object, the following condition is satisfied:
0<f 2F /f 2R <18.
15. A projection optical system according to claim 1 , wherein the intermediate lens group in said second lens group has a negative refracting power.
16. A projection optical system according to claim 1 , wherein said first lens group has at least two positive lenses, said third lens group has at least three positive lenses, said fourth lens group has at least three negative lenses, said fifth lens group has at least five positive lenses and at least one negative lens, and said sixth lens group has at least one positive lens.
17. A projection optical system according to claim 1 , wherein said sixth lens group comprises three or less lenses having at least one lens surface satisfying the following condition:
1/|φL|<20
where φ: a refractive power of said lens surface, and L: the object-to-image distance from said first object to said second object.
18. A projection optical system according to claim 1 , wherein a magnification of said projection optical system is ⅕.
19. A method for manufacturing integrated circuits, said method including an exposure process of projecting an image of a pattern on a mask onto a photosensitive substrate with an exposure light of a predetermined wavelength, said exposure process comprising the steps of:
supplying said exposure light;
introducing said exposure light to said mask;
making said exposure light passing through said mask incident on a projection optical system according to claim 1 ; and
introducing said exposure light passing through said projection optical system onto said photosensitive substrate.
20. A projection optical system according to claim 1 , wherein said fifth lens group comprises a negative lens placed as closet to the second object and having a concave surface opposed to the second object.
21. A projection optical system according to claim 20 , wherein when d 56 is a lens group separation between said fifth lens group and said sixth lens group and L is the distance from said first object to said second object, the following condition is satisfied:
d 56 /L<0.017.
22. A projection optical system according to claim 20 , wherein when r 6F is a radius of curvature of a lens surface closest to the first object in said sixth lens group and d 6 is an axial distance from the lens surface closest to the first object in said sixth lens group to the second object, the following condition is satisfied:
0.50<d 6 /r 6F <1.50.
23. A projection optical system according to claim 20 , wherein said sixth lens group comprises three or less lenses having at least one lens surface satisfying the following condition:
1/|φL|<20
where φ: a refractive power of said lens surface, and
L: the object-to-image distance from said first object to said second object.
24. A projection optical system according to claim 16 , wherein when I is an axial distance from said first object to a first-object-side focal point of said entire projection optical system and L is the distance from said first object to said second object, the following condition is satisfied:
1.0<I/L.
25. A projection optical system according to claim 24 , wherein said fifth lens group has a negative meniscus lens, and a positive lens disposed as adjacent to a concave surface of said negative meniscus lens and having a convex surface opposed to the concave surface of said negative meniscus lens, and
wherein when r 5n is a radius of curvature of the concave surface of said negative meniscus lens in said fifth lens group and r 5P is a radius of curvature of the convex surface, opposed to the concave surface of the negative meniscus lens, of the positive lens disposed as adjacent to the concave surface of said negative meniscus lens in said fifth lens group, the following condition is satisfied:
0<(r 5p −r 5n )/(r 5p +r 5n )<1.
26. A projection optical system according to claim 25 , wherein said negative meniscus lens and said positive lens adjacent to the concave surface of said negative meniscus lens are disposed between at least one positive lens in said fifth lens group and at least one positive lens in said fifth lens group.
27. A projection optical system according to claim 26 , wherein said fifth lens group comprises a negative lens placed as closest to the second object and having a concave surface opposed to the second object.
28. A projection optical system according to claim 27 , wherein when r 6F is a radius of curvature of a lens surface closest to the first object in said sixth lens group and d 6 is an axial distance from the lens surface closest to the first object in said sixth lens group to the second object, the following condition is satisfied:
0.50<d 6 /r 6F <1.50.
29. A projection optical system according to claim 28 , wherein when f 22 is a focal length of the second lens with the negative refracting power in said second lens group and f 23 is a focal length of the third lens with the negative refracting power in said second lens group, the following condition is satisfied:
0.1<f 22 /f 23 <10.
30. A projection optical system according to claim 29 , wherein when f 21 is a focal length of the first lens with the positive refracting power in the intermediate lens group in said second lens group and L is the distance from said first object to said second object, the following condition is satisfied:
0.230<f 21 /L<0.40.
31. A method for manufacturing integrated circuits, said method including an exposure process of projecting an image of a pattern on a mask onto a photosensitive substrate with an exposure light of a predetermined wavelength, said exposure process comprising the steps of:
supplying said exposure light;
introducing said exposure light to said mask;
making said exposure light passing through said mask incident on a projection optical system according to claim 30 ; and
introducing said exposure light passing through said projection optical system onto said photosensitive substrate.
32. A method for manufacturing integrated circuits, said method including an exposure process of projecting an image of a pattern on a mask onto a photosensitive substrate with an exposure light of a predetermined wavelength, said exposure process comprising the steps of:
supplying said exposure light;
introducing said exposure light to said mask;
making said exposure light passing through said mask incident on a projection optical system according to claim 28 ; and
introducing said exposure light passing through said projection optical system onto said photosensitive substrate.
33. A projection optical system according to claim 24 , wherein said fourth lens group comprises:
a front lens group disposed as closest to the first object, said front lens group having two negative meniscus lenses each shaped with a concave surface to said second object;
a rear lens group disposed as closest to the second object, said rear lens group having a negative lens with a concave surface to said first object; and
an intermediate lens group disposed between said front lens group in said fourth lens group and said rear lens group in said fourth lens group, said intermediate lens group having first and second negative lenses in order from the side of said first object, and
wherein when f 4A is a focal length of said first negative lens in said fourth lens group and f 4B is a focal length of said second negative lens in said fourth lens group, the following condition is satisfied:
0.05<f 4A /f 4B <20.
34. A projection optical system according to claim 24 , wherein when r Ff is a radius of curvature of a first-object-side surface of said front lens and r Fr is a radius of curvature of a second-object-side surface of said front lens, the front lens in said second lens group satisfies the following condition:
1.00<(r 2Ff −r 2Fr )/(r 2Ff +r 2Fr )<5.0
35. A projection optical system according to claim 24 , wherein said fourth lens group has:
a front lens group having a negative lens disposed as closest to said first object and shaped with a concave surface to said second object;
a rear lens group having a negative lens disposed as closest to the second object and shaped with a concave surface to said first object; and
an intermediate lens group having a negative lens and a positive lens with a convex surface adjacent to a concave surface of said negative lens is disposed between said front lens group in said fourth lens group and said rear lens group in said fourth lens group, and
wherein when r 4N is a radius of curvature of said concave surface of the negative lens in said intermediate lens group and r 4P is a radius of curvature of said convex surface of the positive lens in said intermediate lens group, the following condition is satisfied:
−0.9<(r 4N −r 4P )/(r 4N +r 4P )<0.9,
provided that when L is the distance from said first object to said second object, said concave surface of said negative lens in said intermediate lens group or said convex surface of said positive lens in said intermediate lens group satisfies at least one of the following conditions:
|r 4N /L|<2.0
|r 4P /L|<2.0.
36. A projection optical system according to claim 24 , wherein said fifth lens group comprises a negative lens placed as closest to the second object and having a concave surface opposed to the second object.
37. A projection optical system according to claim 36 , wherein when r 6F is a radius of curvature of a lens surface closest to the first object in said sixth lens group and d 6 is an axial distance from the lens surface closest to the first object in said sixth lens group to the second object, the following condition is satisfied:
0.50<d 6 /r 6F <1.50.
38. A projection optical system according to claim 37 , wherein when f 22 s a focal length of the second lens with the negative refracting power in said second lens group and f 23 is a focal length of the third lens with the negative refracting power in said second lens group, the following condition is satisfied:
0.1<f 22 /f 23 <10.
39. A projection optical system according to claim 38 , wherein when f 21 is a focal length of the first lens with the positive refracting power in the intermediate lens group in said second lens group and L is the distance from said first object to said second object, the following condition is satisfied:
0.230<f 21 /L<0.40.
40. A method for manufacturing integrated circuits, said method including an exposure process of projecting an image of a pattern on a mask onto a photosensitive substrate with an exposure light of a predetermined wavelength, said exposure process comprising the steps of:
supplying said exposure light;
introducing said exposure light to said mask;
making said exposure light passing through said mask incident on a projection optical system according to claim 39 ; and
introducing said exposure light passing through said projection optical system onto said photosensitive substrate.
41. A projection optical system according to claim 24 , wherein when f 22 , is a focal length of the second lens with the negative refracting power in said second lens group and f 23 is a focal length of the third lens with the negative refracting power in said second lens group, the following condition is satisfied:
0.1<f 22 /f 23 <10.
42. A projection optical system according to claim 41 , wherein when f 21 is a focal length of the first lens with the positive refracting power in the intermediate lens group in said second lens group and L is the distance from said first object to said second object, the following condition is satisfied:
0.230<f 21 /L<0.40.
43. A projection optical system according to claim 24 , wherein when f 21 is a focal length of the first lens with the positive refracting power in the intermediate lens group in said second lens group and L is the distance from said first object to said second object, the following condition is satisfied:
0.230<f 21 /L<0.40.
44. A method for manufacturing integrated circuits, said method including an exposure process of projecting an image of a pattern on a mask onto a photosensitive substrate with an exposure light of a predetermined wavelength, said exposure process comprising the steps of:
supplying said exposure light;
introducing said exposure light to said mask;
making said exposure light passing through said mask incident on a projection optical system according to claim 24 ; and
introducing said exposure light passing through said projection optical system onto said photosensitive substrate.
45. A projection optical system according to claim 16 , wherein said fifth lens group has a negative meniscus lens, and a positive lens disposed as adjacent to a concave surface of said negative meniscus lens and having a convex surface opposed to the concave surface of said negative meniscus lens, and
wherein when r 5n is a radius of curvature of the concave surface of said negative meniscus lens in said fifth lens group and r 5P is a radius of curvature of the convex surface, opposed to the concave surface of the negative meniscus lens, of the positive lens disposed as adjacent to the concave surface of said negative meniscus lens in said fifth lens group, the following condition is satisfied:
0<(r 5p −r 5n )/(r 5p +r 5n )<1.
46. A projection optical system according to claim 45 , wherein said negative meniscus lens and said positive lens adjacent to the concave surface of said negative meniscus lens are disposed between at least one positive lens in said fifth lens group and at least one positive lens in said fifth lens group.
47. A method for manufacturing integrated circuits, said method including an exposure process of projecting an image of a pattern on a mask onto a photosensitive substrate with an exposure light of a predetermined wavelength, said exposure process comprising the steps of:
supplying said exposure light;
introducing said exposure light to said mask;
making said exposure light passing through said mask incident on a projection optical system according to claim 46 ; and
introducing said exposure light passing through said projection optical system onto said photosensitive substrate.
48. An exposure apparatus comprising:
a stage allowing a photosensitive substrate to be held on a main surface thereof;
an illumination optical system for emitting exposure light of a predetermined wavelength and transferring a predetermined pattern of a mask onto said substrate; and
a projection optical system provided between said mask and said substrate, said projection optical system including a first lens group with a positive refracting power, a second lens group with a negative refracting power, a third lens group with a positive refracting power, a fourth lens group with a negative refracting power, a fifth lens group with a positive refracting power, and a sixth lens group with a positive refracting power in order from the side of said mask,
wherein said second lens group comprises a front lens with a negative refracting power disposed as closest to said first object and shaped with a concave surface to said second object, a rear lens of a negative meniscus shape disposed as closest to said second object and shaped with a concave surface to said mask, and an intermediate lens group disposed between said front lens and said rear lens, said intermediate lens group having a first lens with a positive refracting power, a second lens with a negative refracting power, and a third lens with a negative refracting power in order from the side of said mask, and
wherein when f 1 is a focal length of said first lens group, f 2 is a focal length of said second lens group, f 3 is a focal length of said third lens group, f 4 is a focal length of said fourth lens group, f 5 is a focal length of said fifth lens group, f 6 is a focal length of said sixth lens group, and L is a distance from said mask to said substrate, the following conditions are satisfied:
f 1 /L<0.8
−0.033<f 2 /L
0.01<f 3 /L<1.0
f 4 /L<−0.005
0.01<f 5 /L<0.9
0.02<f 6 /L<1.6.
49. An exposure apparatus according to claim 48 , wherein a magnification of said projection optical system is ⅕.
50. An exposure apparatus according to claim 48 , wherein said first lens group has at least two positive lenses, said third lens group has at least three positive lenses, said fourth lens group has at least three negative lenses, said fifth lens group has at least five positive lenses and at least one negative lens, and said sixth lens group has at least one positive lens.
51. An exposure apparatus according to claim 50 , wherein when I is an axial distance from said first object to a first-object-side focal point of said entire projection optical system and L is the distance from said first object to said second object, the following condition is satisfied:
1.0<I/L.
52. An exposure apparatus according to claim 51 , wherein said fifth lens group has a negative meniscus lens, and a positive lens disposed as adjacent to a concave surface of said negative meniscus lens and having a convex surface opposed to the concave surface of said negative meniscus lens, and
wherein when r 5n is a radius of curvature of the concave surface of said negative meniscus lens in said fifth lens group and r 5P is a radius of curvature of the convex surface, opposed to the concave surface of the negative meniscus lens, of the positive lens disposed as adjacent to the concave surface of said negative meniscus lens in said fifth lens group, the following condition is satisfied:
0<(r 5p −r 5n )/(r 5P +r 5n )<1.
53. An exposure apparatus according to claim 52 , wherein said negative meniscus lens and said positive lens adjacent to the concave surface of said negative meniscus lens are disposed between at least one positive lens in said fifth lens group and at least one positive lens in said fifth lens group.
54. An exposure apparatus according to claim 51 , wherein said fifth lens group comprises a negative lens placed as closest to the second object and having a concave surface opposed to the second object.
55. An exposure apparatus according to claim 54 , wherein when r 6F is a radius of curvature of a lens surface closest to the first object in said sixth lens group and d 6 is an axial distance from the lens surface closest to the first object in said sixth lens group to the second object, the following condition is satisfied:
0.50<d 6 /r 6F <1.50.
56. An exposure apparatus according to claim 51 , wherein when f 22 is focal length of the second lens with the negative refracting power in said second lens group and f 23 is a focal length of the third lens with the negative refracting power in said second lens group, the following condition is satisfied:
0.1<f 22 /f 23 <10.
57. An exposure apparatus according to claim 51 , wherein when f 21 is a focal length of the first lens with the positive refracting power in the intermediate lens group in said second lens group and L is the distance from said first object to said second object, the following condition is satisfied:
0.230<f 21 /L<0.40.
58. A projection optical system for projecting a reduced image of a first surface onto a second surface, comprising:
a first lens group with a positive refracting power arranged in an optical path between the first surface and the second surface;
a second lens group with a negative refracting power arranged in an optical path between said first positive lens group and the second surface;
a third lens group with a positive refracting power arranged in an optical path between said second lens group and the second surface; and
additional lens groups arranged in an optical path between said third lens group and the second surface and comprising
a first pair of lenses,
a second pair of lenses, and
an aperture stop located between the first and second pairs of lenses,
wherein at least one of the first and second pairs of lenses comprises a negative lens.
59. The projection optical system according to claim 58 , wherein at least one of the first and second pairs of lenses has a negative refractive power.
60. The projection optical system according to claim 59 , wherein the negative lens in said additional lens groups is juxtaposed to the aperture stop.
61. The projection optical system according to claim 60 , further comprising a meniscus- shaped space juxtaposed to the negative lens in said additional lens groups.
62. The projection optical system according to claim 58 , wherein the negative lens in said additional lens groups is juxtaposed to the aperture stop.
63. The projection optical system according to claim 62 , further comprising a meniscus- shaped space juxtaposed to the negative lens in said additional lens groups.
64. The projection optical system according to claim 58 , further comprising a space juxtaposed to the negative lens in said additional lens groups and having a shape with an on- axis distance along an optical axis longer than a peripheral distance along a direction parallel to the optical axis.
65. The projection optical system according to claim 64 , wherein said space comprises a meniscus shape.
66. The projection optical system according to claim 64 , wherein said space is arranged in an optical path between said third lens group and the aperture stop.
67. The projection optical system according to claim 58 , wherein
the first pair of lenses comprises a space juxtaposed to the negative lens in said additional lens groups and having a shape with an on - axis distance along an optical axis longer than a peripheral distance along a direction parallel to the optical axis, and
the second pair of lenses comprises a space juxtaposed to the negative lens in said additional lens groups and comprising a shape with an on - axis distance along an optical axis longer than a peripheral distance along a direction parallel to the optical axis.
68. The projection optical system according to claim 58 , wherein each of the lenses in the projection optical system consists of a non- cemented lens.
69. The projection optical system according to claim 58 , wherein said third lens group comprises three positive lenses.
70. The projection optical system according to claim 58 , wherein the projection optical system is a bitelecentric optical system.
71. The projection optical system according to claim 58 , wherein said first lens group comprises a negative lens disposed at a side closest to the first surface.
72. The projection optical system according to claim 58 , wherein said additional lens groups further comprise a lens group with a positive refractive power.
73. The projection optical system according to claim 58 , wherein each of said lenses in the projection optical system comprises a single glass material.
74. The projection optical system according to claim 73 , wherein the single glass material comprises SiO 2 .
75. The projection optical system according to claim 58 , wherein each of said lenses in the projection optical system comprises a plurality of optical materials.
76. The projection optical system according to claim 58 , wherein the first pair of lenses comprises a negative lens, and the second pair of lenses comprises a negative lens.
77. The projection optical system according to claim 58 , wherein at least one of the first and second pairs of lenses comprises a positive lens and a negative lens.
78. The projection optical system according to claim 58 , wherein the first and second pairs of lenses comprise a positive lens and a negative lens, respectively.
79. The projection optical system according to claim 58 , wherein said additional lens groups further comprise
a fourth lens group arranged in an optical path between said third lens group and the second surface,
a fifth lens group arranged in an optical path between the fourth lens group and the second surface, and
a sixth lens group arranged in an optical path between the fifth lens group and the second surface.
80. The projection optical system according to claim 79 , wherein
said first lens group comprises two positive lenses,
said third lens group comprises three positive lenses,
the fourth lens group comprises three negative lenses,
the fifth lens group comprises five positive lenses and a negative lens, and
the sixth lens group comprises a positive lens.
81. The projection optical system according to claim 58 , wherein said first lens group comprises two positive lenses, and said third lens group comprises three positive lenses.
82. An exposure apparatus for transferring a pattern of mask arranged on a first surface onto a workpiece arranged on a second surface, the apparatus comprising:
a light source to provide an exposure light of a predetermined wavelength;
an illumination optical system arranged in an optical path between said light source and the first surface and illuminating the mask with the exposure light; and
a projection optical system arranged between the first surface and the second surface and projecting a reduced image of the pattern with the exposure light onto the workpiece and comprising:
a first lens group with a positive refracting power arranged in an optical path between the first surface and the second surface;
a second lens group with a negative refracting power arranged in an optical path between the first positive lens group and the second surface;
a third lens group with positive refracting power arranged in an optical path between the second lens group and the second surface; and
additional lens groups arranged in an optical path between the third lens group and the second surface and comprising a first pair of lenses, a second pair of lenses, and an aperture stop located between the first and second pairs of lenses, wherein the at least one of the first and second pairs of lenses comprises a negative lens.
83. The exposure apparatus according to claim 82 , wherein each of the lenses in said projection optical system consists of a non- cemented lens.
84. The exposure apparatus according to claim 82 , wherein said projection optical system is a bitelecentric optical system.
85. A method for manufacturing integrated circuits, the method including an exposure process of projecting an image of a pattern on a mask onto a photosensitive substrate with an exposure light of a predetermined wavelength, the exposure process comprising:
supplying the exposure light;
introducing the exposure light to the mask;
passing the exposure light through the mask incident on a projection optical system according to
claim 58
; and
introducing the exposure light passing through the projection optical system onto the photosensitive substrate.
86. The method according to claim 85 , wherein the light introduced onto the photosensitive substrate through the projection optical system does not pass through a cemented lens.
87. The method according to claim 85 , wherein the projection optical system is a both- side - telecentric optical system.
88. An imaging method for imaging an image of a first surface onto a second surface, comprising:
introducing a light beam toward a first lens group with positive refracting power;
introducing the light beam from the first lens group toward a second lens group with negative refractive power;
introducing the light beam from the second lens group toward a third lens group with positive refractive power; and
introducing the light beam from the third lens group toward an additional lens groups comprising a first pair of lenses, a second pair of lenses, and an aperture stop located between the first and second pairs of lenses;
wherein at least one of the first and second pairs of lenses comprises a negative lens.
89. The method according to claim 88 , wherein the light does not pass through a cemented lens.
90. The method according to claim 88 , wherein the lenses defines an optical system that is a both- side - telecentric optical system.Cited by (0)
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