Inventor · disambiguated record
Kazuyuki Hagiwara
Also filed as: HAGIWARA KAZUYUKI
16 granted patents·3 pending applications·179 citations·filing 2008–2017
93Inventor score
Top patents by PatentIndex Score
19 records- 0196US8473875B2Method and system for forming high accuracy patterns using charged particle beam lithographyFUJIMURA AKIRA·Filed 2011·Granted Jun 25, 2013·39 cites·16 claims
- 0296US7759026B2Method and system for manufacturing a reticle using character projection particle beam lithographyD2S INC·Filed 2008·Granted Jul 20, 2010·25 cites·16 claims
- 0396US7759027B2Method and system for design of a reticle to be manufactured using character projection lithographyD2S INC·Filed 2008·Granted Jul 20, 2010·48 cites·20 claims
- 0494US7745078B2Method and system for manufacturing a reticle using character projection lithographyD2S INC·Filed 2008·Granted Jun 29, 2010·17 cites·9 claims
- 0593US9343267B2Method and system for dimensional uniformity using charged particle beam lithographyD2S INC·Filed 2014·Granted May 17, 2016·12 cites·13 claims
- 0693US9057956B2Method and system for design of enhanced edge slope patterns for charged particle beam lithographyFUJIMURA AKIRA·Filed 2011·Granted Jun 16, 2015·9 cites·24 claims
- 0791US9043734B2Method and system for forming high accuracy patterns using charged particle beam lithographyD2S INC·Filed 2013·Granted May 26, 2015·13 cites·8 claims
- 0889US9612530B2Method and system for design of enhanced edge slope patterns for charged particle beam lithographyD2S INC·Filed 2016·Granted Apr 4, 2017·4 cites·16 claims
- 0986US9859100B2Method and system for dimensional uniformity using charged particle beam lithographyD2S INC·Filed 2016·Granted Jan 2, 2018·3 cites·12 claims
- 1082US8959463B2Method and system for dimensional uniformity using charged particle beam lithographyD2S INC·Filed 2013·Granted Feb 17, 2015·5 cites·26 claims
- 1180US8865377B2Method and system for forming a diagonal pattern using charged particle beam lithographyD2S INC·Filed 2013·Granted Oct 21, 2014·3 cites·26 claims
- 1263US10431422B2Method and system for dimensional uniformity using charged particle beam lithographyD2S INC·Filed 2017·Granted Oct 1, 2019·0 cites·15 claims
- 1356US7901845B2Method for optical proximity correction of a reticle to be manufactured using character projection lithographyD2S INC·Filed 2008·Granted Mar 8, 2011·0 cites·25 claims
- 1449US9047693B2Color distribution design assistance systemADACHI TAKASHI·Filed 2012·Granted Jun 2, 2015·1 cites·6 claims
- 1549US2015338737A1Method and System for Design of Enhanced Edge Slope Patterns for Charged Particle Beam LithographyD2S INC·Filed 2015·Application pending·0 cites
- 1647US2013252143A1Method and system for design of enhanced accuracy patterns for charged particle beam lithographyD2S INC·Filed 2013·Application pending·0 cites
- 1744US8949750B2Method and system for forming a diagonal pattern using charged particle beam lithographyD2S INC·Filed 2013·Granted Feb 3, 2015·0 cites·20 claims
- 1840US8431914B2Method and system for manufacturing a surface using charged particle beam lithography with variable beam blurHAGIWARA KAZUYUKI·Filed 2010·Granted Apr 30, 2013·0 cites·27 claims
- 1938US2012221980A1Method and system for design of enhanced accuracy patterns for charged particle beam lithographyFUJIMURA AKIRA·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →