Inventor · disambiguated record
Katsuhiko Iwabuchi
Also filed as: IWABUCHI KATSUHIKO
12 granted patents·4 pending applications·407 citations·filing 1989–2017
92Inventor score
Top patents by PatentIndex Score
16 records- 0190US5462397AProcessing apparatusTOKYO ELECTRON LTD·Filed 1994·Granted Oct 31, 1995·149 cites·12 claims
- 0288US7624772B2Load lock apparatus, processing system and substrate processing methodTOKYO ELECTRON LTD·Filed 2006·Granted Dec 1, 2009·13 cites·22 claims
- 0386US6432208B1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Aug 13, 2002·42 cites·14 claims
- 0484US5407350AHeat-treatment apparatusTOKYO ELECTRON LTD·Filed 1993·Granted Apr 18, 1995·46 cites·9 claims
- 0582US5697749AWafer processing apparatusTOKYO ELECTRON LTD·Filed 1995·Granted Dec 16, 1997·92 cites·3 claims
- 0677US10600621B2Plasma electrode and plasma processing deviceTOKYO ELECTRON LTD·Filed 2017·Granted Mar 24, 2020·1 cites·10 claims
- 0771US5016567AApparatus for treatment using gasTEL SAGAMI LTD·Filed 1989·Granted May 21, 1991·29 cites·7 claims
- 0870US8196619B2Load lock apparatus, processing system and substrate processing methodIWABUCHI KATSUHIKO·Filed 2009·Granted Jun 12, 2012·4 cites·18 claims
- 0969US7916447B2Electrostatic chuck for substrate stage, electrode used for the chuck, and treating system having the chuck and electrodeFUTURE VISION INC·Filed 2004·Granted Mar 29, 2011·13 cites·13 claims
- 1051US7780391B2Substrate processing deviceTOKYO ELECTRON LTD·Filed 2003·Granted Aug 24, 2010·3 cites·11 claims
- 1149US6022418AVacuum processing methodTOKYO ELECTRON LTD·Filed 1998·Granted Feb 8, 2000·15 cites·7 claims
- 1246US2011247560A1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1342US8574676B2Substrate processing methodYASUI KANJI·Filed 2009·Granted Nov 5, 2013·0 cites·18 claims
- 1442US2006245852A1Load lock apparatus, load lock section, substrate processing system and substrate processing methodTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 1538US2004168769A1Plasma processing equipment and plasma processing methodFiled 2003·Application pending·0 cites
- 1636US2006112880A1Treating apparatusIWABUCHI KATSUHIKO·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →