Inventor · disambiguated record
Katsuhisa Kasanami
Also filed as: KASANAMI KATSUHISA
6 granted patents·3 pending applications·616 citations·filing 2000–2009
85Inventor score
Technology areasH10P
Files withHITACHI INT ELECTRIC INC4KOKUSAI ELECTRIC CO LTD2HITACHI KOKUSAI ELECTRONIC INC1KASANAMI KATSUHISA1
Top patents by PatentIndex Score
9 records- 0197US6483989B1Substrate processing apparatus and semiconductor device producing methodHITACHI INT ELECTRIC INC·Filed 2001·Granted Nov 19, 2002·551 cites·7 claims
- 0286US6414280B1Heat treatment method and heat treatment apparatusKOKUSAI ELECTRIC CO LTD·Filed 2000·Granted Jul 2, 2002·36 cites·16 claims
- 0378US6472639B2Heat treatment method and heat treatment apparatusKOKUSAI ELECTRIC CO LTD·Filed 2002·Granted Oct 29, 2002·19 cites·8 claims
- 0477US7842160B2Semiconductor producing device and semiconductor device producing methodHITACHI INT ELECTRIC INC·Filed 2008·Granted Nov 30, 2010·5 cites·9 claims
- 0569US8906161B2Semiconductor producing device and semiconductor device producing methodKASANAMI KATSUHISA·Filed 2009·Granted Dec 9, 2014·4 cites·14 claims
- 0647US2006075972A1Substrate processing apparatus and substrate processing methodHITACHI INT ELECTRIC INC·Filed 2005·Application pending·0 cites
- 0746US6541344B2Substrate processing apparatus and semiconductor device manufacturing methodHITACHI INT ELECTRIC INC·Filed 2001·Granted Apr 1, 2003·1 cites·20 claims
- 0839US2006151117A1Semiconductor producing device and semiconductor producing methodHITACHI KOKUSAI ELECTRONIC INC·Filed 2004·Application pending·0 cites
- 0937US2002017363A1Substrate processing apparatus and substrate processing methodFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →