Inventor · disambiguated record
Kazuhiro Katayama
Also filed as: KATAYAMA KAZUHIRO
61 granted patents·16 pending applications·225 citations·filing 1995–2025
98Inventor score
Top patents by PatentIndex Score
77 records- 0196US8057982B2Monomer, resist composition, and patterning processHATAKEYAMA JUN·Filed 2009·Granted Nov 15, 2011·33 cites·17 claims
- 0295US11560355B2Onium salt, chemically amplified resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted Jan 24, 2023·4 cites·24 claims
- 0393US8426115B2Patterning process and resist compositionHATAKEYAMA JUN·Filed 2010·Granted Apr 23, 2013·9 cites·13 claims
- 0492US11774853B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2019·Granted Oct 3, 2023·5 cites·17 claims
- 0591US10120278B2Carboxylic acid onium salt, chemically amplified resist composition, and pattern forming processSHINETSU CHEMICAL CO·Filed 2017·Granted Nov 6, 2018·4 cites·15 claims
- 0691US8507175B2Patterning process and resist compositionHATAKEYAMA JUN·Filed 2010·Granted Aug 13, 2013·13 cites·21 claims
- 0791US8198016B2Patterning processHATAKEYAMA JUN·Filed 2009·Granted Jun 12, 2012·13 cites·17 claims
- 0890US11009793B2Monomer, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted May 18, 2021·4 cites·17 claims
- 0990US9250523B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Feb 2, 2016·7 cites·9 claims
- 1089US9081290B2Patterning process and resist compositionSHINETSU CHEMICAL CO·Filed 2013·Granted Jul 14, 2015·6 cites·15 claims
- 1189US8329384B2Resist-modifying composition and pattern forming processWATANABE TAKERU·Filed 2010·Granted Dec 11, 2012·10 cites·10 claims
- 1288US8507173B2Patterning processHATAKEYAMA JUN·Filed 2009·Granted Aug 13, 2013·10 cites·14 claims
- 1387US10023674B2Monomer, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2017·Granted Jul 17, 2018·3 cites·11 claims
- 1487US8105760B2Patterning process and pattern surface coating compositionHATAKEYAMA JUN·Filed 2008·Granted Jan 31, 2012·11 cites·7 claims
- 1585US9182668B2Patterning process, resist composition, polymer, and monomerSHINETSU CHEMICAL CO·Filed 2014·Granted Nov 10, 2015·4 cites·13 claims
- 1684US11940728B2Molecular resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2021·Granted Mar 26, 2024·1 cites·8 claims
- 1782US9618850B2Pattern forming process and shrink agentSHINETSU CHEMICAL CO·Filed 2015·Granted Apr 11, 2017·3 cites·9 claims
- 1879US9274425B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2014·Granted Mar 1, 2016·4 cites·6 claims
- 1976US9213235B2Patterning process, resist composition, polymer, and monomerSHINETSU CHEMICAL CO·Filed 2014·Granted Dec 15, 2015·2 cites·13 claims
- 2076US9091933B2Negative pattern forming processSHINETSU CHEMICAL CO·Filed 2012·Granted Jul 28, 2015·2 cites·15 claims
- 2176US2025370342A1Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 2275US11448961B2Iodonium salt, resist composition, and pattern forming processSHINETSU CHEMICAL CO·Filed 2019·Granted Sep 20, 2022·1 cites·12 claims
- 2375US9029064B2Patterning process and resist compositionHATAKEYAMA JUN·Filed 2012·Granted May 12, 2015·2 cites·17 claims
- 2474US10591819B2Monomer, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2019·Granted Mar 17, 2020·0 cites·8 claims
- 2574US8895231B2Patterning process and resist compositionHATAKEYAMA JUN·Filed 2011·Granted Nov 25, 2014·7 cites·17 claims
- 2673US10754248B2Sulfonium salt, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted Aug 25, 2020·1 cites·23 claims
- 2773US8741554B2Patterning process and resist compositionHATAKEYAMA JUN·Filed 2010·Granted Jun 3, 2014·2 cites·19 claims
- 2873US8426105B2Resist-modifying composition and pattern forming processWATANABE TAKERU·Filed 2010·Granted Apr 23, 2013·2 cites·11 claims
- 2973US2024361690A1Resist Material, Resist Composition, Patterning Process, And MonomerSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 3071US8741546B2Patterning process and resist compositionSHINETSU CHEMICAL CO·Filed 2013·Granted Jun 3, 2014·1 cites·1 claims
- 3171US8617800B2Patterning processHATAKEYAMA JUN·Filed 2009·Granted Dec 31, 2013·3 cites·12 claims
- 3270US9046772B2Monomer, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2014·Granted Jun 2, 2015·1 cites·13 claims
- 3370US8877424B2Monomer, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Nov 4, 2014·1 cites·11 claims
- 3467US9057949B2Patterning process, resist composition, polymer, and polymerizable ester compoundSHINETSU CHEMICAL CO·Filed 2012·Granted Jun 16, 2015·1 cites·4 claims
- 3567US8993222B2Pattern forming processSHINETSU CHEMICAL CO·Filed 2014·Granted Mar 31, 2015·1 cites·5 claims
- 3667US8932803B2Pattern forming processSHINETSU CHEMICAL CO·Filed 2013·Granted Jan 13, 2015·1 cites·14 claims
- 3767US2024036466A1Onium Salt, Resist Composition, And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 3866US9086625B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Jul 21, 2015·1 cites·8 claims
- 3966US8999630B2Patterning process and resist compositionHATAKEYAMA JUN·Filed 2012·Granted Apr 7, 2015·1 cites·10 claims
- 4065US9632415B2Pattern forming process and shrink agentSHINETSU CHEMICAL CO·Filed 2015·Granted Apr 25, 2017·1 cites·10 claims
- 4165US8129099B2Double patterning processTAKEMURA KATSUYA·Filed 2009·Granted Mar 6, 2012·2 cites·16 claims
- 4263US12159718B2Method for evaluating pancreatic cancer, pancreatic cancer evaluating apparatus, pancreatic cancer evaluating method, pancreatic cancer evaluating program product, pancreatic cancer evaluating system and information communication terminal apparatusAJINOMOTO KK·Filed 2021·Granted Dec 3, 2024·0 cites·3 claims
- 4361US9235122B2Monomer, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Jan 12, 2016·0 cites·14 claims
- 4461US2023161254A1Chemically amplified resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 4560US2023137472A1Chemically amplified resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 4660US2023134822A1Amine compound, chemically amplified resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 4760US2023116120A1Chemically amplified resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 4860US2024210830A1Resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 4957US12216401B2Sulfonium salt, chemically amplified resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2021·Granted Feb 4, 2025·0 cites·19 claims
- 5057US11953827B2Molecular resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted Apr 9, 2024·0 cites·10 claims
Showing the top 50 of 77 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →