Inventor · disambiguated record
Katsuhiko Komori
Also filed as: KOMORI KATSUHIKO
14 granted patents·3 pending applications·879 citations·filing 1996–2017
91Inventor score
Top patents by PatentIndex Score
17 records- 0198US7648895B2Vertical CVD apparatus for forming silicon-germanium filmTOKYO ELECTRON LTD·Filed 2008·Granted Jan 19, 2010·337 cites·14 claims
- 0297US8945339B2Film formation apparatusKAKIMOTO AKINOBU·Filed 2011·Granted Feb 3, 2015·488 cites·8 claims
- 0380US9758865B2Silicon film forming method, thin film forming method and cross-sectional shape control methodTOKYO ELECTRON LTD·Filed 2014·Granted Sep 12, 2017·4 cites·29 claims
- 0480US5695528ATreating agent for cellulosic textile material and process for treating cellulosic textile materialNIPPON CHEMICAL IND·Filed 1996·Granted Dec 9, 1997·35 cites·5 claims
- 0577US10570508B2Film forming apparatus, film forming method and heat insulating memberTOKYO ELECTRON LTD·Filed 2017·Granted Feb 25, 2020·2 cites·4 claims
- 0674US9005459B2Film deposition method and film deposition apparatusKAKIMOTO AKINOBU·Filed 2012·Granted Apr 14, 2015·3 cites·4 claims
- 0769US9558940B2Method and apparatus for forming silicon filmTOKYO ELECTRON LTD·Filed 2014·Granted Jan 31, 2017·2 cites·3 claims
- 0863US9798317B2Substrate processing method and control apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Oct 24, 2017·1 cites·3 claims
- 0960US7273818B2Film formation method and apparatus for semiconductor processTOKYO ELECTRON LTD·Filed 2004·Granted Sep 25, 2007·7 cites·16 claims
- 1051US9384974B2Trench filling method and processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Jul 5, 2016·0 cites·5 claims
- 1150US9490139B2Method and apparatus for forming silicon filmTOKYO ELECTRON LTD·Filed 2014·Granted Nov 8, 2016·0 cites·6 claims
- 1249US2005181586A1Vertical CVD apparatus for forming silicon-germanium filmFiled 2004·Application pending·0 cites
- 1346US9984875B2Film forming methodTOKYO ELECTRON LTD·Filed 2017·Granted May 29, 2018·0 cites·8 claims
- 1443US9318328B2Method and apparatus for forming silicon filmTOKYO ELECTRON LTD·Filed 2013·Granted Apr 19, 2016·0 cites·6 claims
- 1538US9799577B2Heat treatment system, heat treatment method, and programTOKYO ELECTRON LTD·Filed 2016·Granted Oct 24, 2017·0 cites·6 claims
- 1635US2016289833A1Vertical Heat Treatment ApparatusTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 1731US2016244892A1Method for Crystallizing Group IV Semiconductor, and Film Forming ApparatusTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →