Inventor · disambiguated record
Katsumi Maeda
Also filed as: MAEDA KATSUMI
74 granted patents·30 pending applications·1,006 citations·filing 1976–2025
99Inventor score
Top patents by PatentIndex Score
104 records- 0198US7432035B2(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using itNEC CORP·Filed 2007·Granted Oct 7, 2008·54 cites·11 claims
- 0296US7186495B2(Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using itNEC CORP·Filed 2000·Granted Mar 6, 2007·46 cites·26 claims
- 0395US8569892B2Semiconductor device and manufacturing method thereofMORI KENTARO·Filed 2009·Granted Oct 29, 2013·41 cites·9 claims
- 0492US5186912AControlled release dishwasher detergent dispenserECOLAB INC·Filed 1991·Granted Feb 16, 1993·109 cites·13 claims
- 0591US5994025APhotoresist, compounds for composing the photoresist, and method of forming pattern by using the photoresistNEC CORP·Filed 1996·Granted Nov 30, 1999·93 cites·6 claims
- 0690US5585507AAlkylsulfonium salts and photoresist compositions containing the sameNEC CORP·Filed 1995·Granted Dec 17, 1996·35 cites·9 claims
- 0788US5635332AAlkylsulfonium salts and photoresist compositions containing the sameNEC CORP·Filed 1994·Granted Jun 3, 1997·63 cites·4 claims
- 0887US6528232B1Sulfonium salt compound, photoresist composition and method for patterning by employing sameNEC CORP·Filed 2000·Granted Mar 4, 2003·28 cites·7 claims
- 0985US10622678B2Lithium ion secondary batteryNEC CORP·Filed 2016·Granted Apr 14, 2020·2 cites·5 claims
- 1084US8969483B2(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using itNEC CORP·Filed 2012·Granted Mar 3, 2015·2 cites·2 claims
- 1183US6685416B2Bookbinding device and methodDYNIC CORP·Filed 2002·Granted Feb 3, 2004·45 cites·13 claims
- 1283US4959692ADeveloping device with retractable cutoff memberMINOLTA CAMERA KK·Filed 1988·Granted Sep 25, 1990·26 cites·6 claims
- 1382US6602647B2Sulfonium salt compound and resist composition and pattern forming method using the sameNEC CORP·Filed 2000·Granted Aug 5, 2003·11 cites·14 claims
- 1482US6074801ANegative type photoresist composition used for light beam with short wavelength and method of forming pattern using the sameNEC CORP·Filed 1998·Granted Jun 13, 2000·41 cites·28 claims
- 1581US6106998ANegative resist materials, pattern formation method making use thereof, and method of manufacturing semiconductor devicesNEC CORP·Filed 1998·Granted Aug 22, 2000·44 cites·6 claims
- 1680US6146806ANegative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the sameNEC CORP·Filed 1999·Granted Nov 14, 2000·36 cites·10 claims
- 1779US7829207B2Manufacture method for ZnO based compound semiconductor crystal and ZnO based compound semiconductor substrateSTANLEY ELECTRIC CO LTD·Filed 2008·Granted Nov 9, 2010·5 cites·6 claims
- 1878US6391529B2(Meth)acrylate, polymer photoresist composition, and pattern forming process making use of the compositionNEC CORP·Filed 2001·Granted May 21, 2002·12 cites·4 claims
- 1978US5665518APhotoresist and monomer and polymer for composing the photoresistNEC CORP·Filed 1996·Granted Sep 9, 1997·36 cites·3 claims
- 2077US7847017B2Photosensitive resin composition for optical waveguide formation, optical waveguide and method for producing optical waveguideNEC CORP·Filed 2006·Granted Dec 7, 2010·3 cites·4 claims
- 2176US10050309B2Nonaqueous electrolytic solution and lithium ion secondary batteryNEC CORP·Filed 2015·Granted Aug 14, 2018·1 cites·10 claims
- 2276US7378683B2Transistor using organic material having a bridged cyclic hydrocarbon lactone structure and process for producing the sameNEC CORP·Filed 2005·Granted May 27, 2008·4 cites·11 claims
- 2375US7939241B2(Meth)acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning methodNEC CORP·Filed 2006·Granted May 10, 2011·3 cites·18 claims
- 2475US6437052B1Monomer having diol structure, polymer thereof, and negative photoresist composition and pattern forming method using the sameNEC CORP·Filed 1999·Granted Aug 20, 2002·29 cites·32 claims
- 2573US7438762B2Manufacture method for ZnO based compound semiconductor crystal and ZnO based compound semiconductor substrateSTANLEY ELECTRIC CO LTD TOKYO·Filed 2006·Granted Oct 21, 2008·5 cites·8 claims
- 2671US12113219B2Reduced graphene oxide-graphite composite material, method for producing same, and lithium ion secondary battery using sameNEC CORP·Filed 2020·Granted Oct 8, 2024·0 cites·7 claims
- 2770US6469197B1Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the sameNEC CORP·Filed 2000·Granted Oct 22, 2002·8 cites·1 claims
- 2870US2025172574A1Reagent for detecting methyl salicylate, methyl salicylate sensor, method for sensing methyl salicylate using the same and methods for detecting plant pathogen infectionsNEC CORP·Filed 2024·Application pending·0 cites
- 2969US12298245B2Detection device, assistance device and assistance methodNEC CORP·Filed 2022·Granted May 13, 2025·0 cites·15 claims
- 3069US6140010ANegative type photoresist composition used for light beam with short wavelength and method of forming pattern using the sameNEC CORP·Filed 1998·Granted Oct 31, 2000·27 cites·12 claims
- 3168US7232639B2Monomer having fluorine-containing acetal or ketal structure, polymer thereof, and chemical-amplification-type resist composition as well as process for formation of pattern with use of the sameNEC CORP·Filed 2003·Granted Jun 19, 2007·4 cites·31 claims
- 3268US6638685B2Photoacid generator containing two kinds of sulfonium salt compound, chemically amplified resist containing the same and pattern transfer methodNEC CORP·Filed 2001·Granted Oct 28, 2003·9 cites·18 claims
- 3368US6639084B2Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layerNEC CORP·Filed 2002·Granted Oct 28, 2003·6 cites·9 claims
- 3468US2025377364A1Reagent, method, and device for detecting albuminNEC CORP·Filed 2025·Application pending·0 cites
- 3568US2024327704A1Reagent for detecting methyl salicylate, methyl salicylate sensor, method for sensing methyl salicylate using the same and methods for detecting plant pathogen infectionsNEC CORP·Filed 2024·Application pending·0 cites
- 3667US8536691B2Semiconductor device and method for manufacturing the sameKIKUCHI KATSUMI·Filed 2007·Granted Sep 17, 2013·4 cites·25 claims
- 3767US5770346APhotoresist and compounds for composing the photoresistNEC CORP·Filed 1996·Granted Jun 23, 1998·18 cites·11 claims
- 3865US12054394B2Reduced graphene-based materialNEC CORP·Filed 2019·Granted Aug 6, 2024·0 cites·4 claims
- 3965US10991940B2Graphite-based material for lithium ion secondary batteries and method for producing the same, and negative electrode and lithium ion secondary batteryNEC CORP·Filed 2017·Granted Apr 27, 2021·0 cites·9 claims
- 4065US6030747AChemically amplified resist large in transparency and sensitivity to exposure light less than 248 nanometer wavelength and process of forming maskNEC CORP·Filed 1998·Granted Feb 29, 2000·29 cites·4 claims
- 4165US2015183912A1(meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using itNEC CORP·Filed 2014·Application pending·0 cites
- 4265US2023384219A1Method for sensing methyl salicylate, methyl salicylate sensor, and method for detecting pathogen infection of crops using terbium-sulfoxide complexNEC CORP·Filed 2023·Application pending·0 cites
- 4364US6352813B2Photosensitive resin composition and patterning method using the sameNEC CORP·Filed 1998·Granted Mar 5, 2002·22 cites·9 claims
- 4463US10069166B2Cyclic sulfonic acid ester compound, non-aqueous electrolyte solution, and lithium ion secondary battery using sameNEC CORP·Filed 2014·Granted Sep 4, 2018·0 cites·9 claims
- 4563US2024010912A1Reagent for detecting methyl salicylate, methyl slicylate sensor, method for sensing methyl salicylate using same, and method for detecting pathogen infection in plantNEC CORP·Filed 2023·Application pending·0 cites
- 4661US5985522APhotoresist and compounds for composing the photoresistNEC CORP·Filed 1997·Granted Nov 16, 1999·14 cites·15 claims
- 4761US5747622APolymer having silicon atoms and sulfonium salt units and photoresist compositions containing the sameNEC CORP·Filed 1997·Granted May 5, 1998·21 cites·23 claims
- 4860US10944111B2Electrode for lithium ion secondary battery and lithium ion secondary battery using the sameNEC CORP·Filed 2017·Granted Mar 9, 2021·0 cites·20 claims
- 4960US8802798B2(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using itMAEDA KATSUMI·Filed 2008·Granted Aug 12, 2014·0 cites·5 claims
- 5060US6710188B2Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layerNEC CORP·Filed 2003·Granted Mar 23, 2004·4 cites·25 claims
Showing the top 50 of 104 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Katsumi Maeda files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →