Inventor · disambiguated record
Katie Lynn Nardi
Also filed as: NARDI KATIE · Nardi Katie Lynn
4 granted patents·9 pending applications·8 citations·filing 2015–2025
66Inventor score
Files withLAM RES CORP13
Top patents by PatentIndex Score
13 records- 0188US12436464B2Pre-exposure photoresist curing to enhance EUV lithographic performanceLAM RES CORP·Filed 2021·Granted Oct 7, 2025·2 cites·25 claims
- 0288US11921427B2Methods for making hard masks useful in next-generation lithographyLAM RES CORP·Filed 2019·Granted Mar 5, 2024·4 cites·42 claims
- 0378US12027375B2Selective etch using a sacrificial maskLAM RES CORP·Filed 2020·Granted Jul 2, 2024·1 cites·21 claims
- 0469US2025291253A1Apparatus for photoresist dry depositionLAM RES CORP·Filed 2025·Application pending·0 cites
- 0569US2025244672A1Bake strategies to enhance lithographic performance of metal-containing resistLAM RES CORP·Filed 2025·Application pending·0 cites
- 0665US2025201553A1Methods for making euv patternable hard masksLAM RES CORP·Filed 2025·Application pending·0 cites
- 0762US9988715B2Interface engineering during MGO deposition for magnetic tunnel junctionsLAM RES CORP·Filed 2015·Granted Jun 5, 2018·1 cites·9 claims
- 0856US2022308462A1Apparatus for photoresist dry depositionLAM RES CORP·Filed 2020·Application pending·0 cites
- 0952US2023314946A1Method of forming photo-sensitive hybrid filmsLAM RES CORP·Filed 2021·Application pending·0 cites
- 1050US2021013034A1Methods for making euv patternable hard masksLAM RES CORP·Filed 2019·Application pending·0 cites
- 1147US2022365434A1Substrate surface modification with high euv absorbers for high performance euv photoresistsLAM RES CORP·Filed 2020·Application pending·0 cites
- 1244US2022344136A1Dry chamber clean of photoresist filmsLAM RES CORP·Filed 2020·Application pending·0 cites
- 1344US2022299877A1Positive tone development of cvd euv resist filmsLAM RES CORP·Filed 2020·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →