Inventor · disambiguated record
Karen A. Reinhardt
Also filed as: REINHARDT KAREN · REINHARDT KAREN A · REINHARDT KAREN ANN
9 granted patents·3 pending applications·728 citations·filing 1986–2014
91Inventor score
Files withNOVELLUS SYSTEMS INC4ADVANCED MICRO DEVICES INC2MT SYSTEMS INC2DYNATEX1GASONICS INTERNAT CORP1
Top patents by PatentIndex Score
12 records- 0196US6848458B1Apparatus and methods for processing semiconductor substrates using supercritical fluidsNOVELLUS SYSTEMS INC·Filed 2002·Granted Feb 1, 2005·162 cites·59 claims
- 0295US7503334B1Apparatus and methods for processing semiconductor substrates using supercritical fluidsNOVELLUS SYSTEMS INC·Filed 2005·Granted Mar 17, 2009·49 cites·13 claims
- 0393US6228563B1Method and apparatus for removing post-etch residues and other adherent matricesGASONICS INTERNAT CORP·Filed 1999·Granted May 8, 2001·218 cites·20 claims
- 0492US6333268B1Method and apparatus for removing post-etch residues and other adherent matricesNOVELLUS SYSTEMS INC·Filed 2000·Granted Dec 25, 2001·117 cites·10 claims
- 0590US6747243B1Spot cleaning of particles after inspectionNOVELLUS SYSTEMS INC·Filed 2002·Granted Jun 8, 2004·59 cites·18 claims
- 0686US4676867APlanarization process for double metal MOS using spin-on glass as a sacrificial layerROCKWELL INTERNATIONAL CORP·Filed 1986·Granted Jun 30, 1987·97 cites·17 claims
- 0750US9214583B2Method to build transparent polarizing solar cellMITRA HIRAK·Filed 2011·Granted Dec 15, 2015·0 cites·4 claims
- 0849US5290399ASurface planarizing methods for integrated circuit devicesADVANCED MICRO DEVICES INC·Filed 1991·Granted Mar 1, 1994·19 cites·7 claims
- 0948US2011079250A1Post-texturing cleaning method for photovoltaic silicon substratesMT SYSTEMS INC·Filed 2009·Application pending·0 cites
- 1044US2008213978A1Debris management for wafer singulationDYNATEX·Filed 2007·Application pending·0 cites
- 1142US2016215415A1Sapphire thinning and smoothing using high temperature wet processMT SYSTEMS INC·Filed 2014·Application pending·0 cites
- 1234US5441599ALightly doped drain etch method for semiconductor manufactureADVANCED MICRO DEVICES INC·Filed 1992·Granted Aug 15, 1995·7 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →