Inventor · disambiguated record
Kazuyoshi Sugihara
Also filed as: SUGIHARA KAZUYOSHI
37 granted patents·1,302 citations·filing 1980–2012
98Inventor score
Files withTOSHIBA KK26TOKYO SHIBAURA ELECTRIC CO4MITSUBISHI ELECTRIC CORP3EBARA CORP2SUGIHARA KAZUYOSHI1
Top patents by PatentIndex Score
37 records- 0198US6992290B2Electron beam inspection system and inspection method and method of manufacturing devices using the systemTOSHIBA KK·Filed 2001·Granted Jan 31, 2006·97 cites·5 claims
- 0297US7351969B2Electron beam inspection system and inspection method and method of manufacturing devices using the systemEBARA CORP·Filed 2005·Granted Apr 1, 2008·37 cites·5 claims
- 0397US6534766B2Charged particle beam system and pattern slant observing methodTOSHIBA KK·Filed 2001·Granted Mar 18, 2003·93 cites·23 claims
- 0496US7569838B2Electron beam inspection system and inspection method and method of manufacturing devices using the systemEBARA CORP·Filed 2008·Granted Aug 4, 2009·23 cites·5 claims
- 0596US5429730AMethod of repairing defect of structureTOSHIBA KK·Filed 1993·Granted Jul 4, 1995·114 cites·54 claims
- 0696US4532423AIC Tester using an electron beam capable of easily setting a probe card unit for wafers & packaged IC's to be testedTOKYO SHIBAURA ELECTRIC CO·Filed 1983·Granted Jul 30, 1985·144 cites·12 claims
- 0792US6028953AMask defect repair system and method which controls a dose of a particle beamTOSHIBA KK·Filed 1998·Granted Feb 22, 2000·65 cites·7 claims
- 0890US7745073B2Method for manufacturing a semiconductor device, stencil mask and method for manufacturing a the sameTOSHIBA KK·Filed 2008·Granted Jun 29, 2010·10 cites·7 claims
- 0988US7459246B2Method for manufacturing a semiconductor device, stencil mask and method for manufacturing a the sameTOSHIBA KK·Filed 2007·Granted Dec 2, 2008·9 cites·8 claims
- 1088US5639699AFocused ion beam deposition using TMCTSTOSHIBA KK·Filed 1995·Granted Jun 17, 1997·62 cites·11 claims
- 1188US5591970ACharged beam apparatusTOSHIBA KK·Filed 1995·Granted Jan 7, 1997·56 cites·11 claims
- 1288US5539211ACharged beam apparatus having cleaning function and method of cleaning charged beam apparatusTOSHIBA KK·Filed 1994·Granted Jul 23, 1996·56 cites·30 claims
- 1386US7179569B2Method for manufacturing a semiconductor device, stencil mask and method for manufacturing the sameTOSHIBA KK·Filed 2004·Granted Feb 20, 2007·24 cites·14 claims
- 1486US6991878B2Photomask repair method and apparatusTOSHIBA KK·Filed 2002·Granted Jan 31, 2006·23 cites·18 claims
- 1586US6770402B2Method for manufacturing a semiconductor device, stencil mask and method for manufacturing the sameTOSHIBA KK·Filed 2001·Granted Aug 3, 2004·24 cites·1 claims
- 1686USD334174SResidual current operated circuit-breakerMITSUBISHI ELECTRIC CORP·Filed 1991·Granted Mar 23, 1993·30 cites·1 claims
- 1785US6316163B1Pattern forming methodTOSHIBA KK·Filed 1998·Granted Nov 13, 2001·57 cites·29 claims
- 1884US5989759APattern forming method using alignment from latent image or base pattern on substrateTOSHIBA KK·Filed 1998·Granted Nov 23, 1999·41 cites·22 claims
- 1980US4572956AElectron beam pattern transfer system having an autofocusing mechanismTOKYO SHIBAURA ELECTRIC CO·Filed 1983·Granted Feb 25, 1986·21 cites·18 claims
- 2079US5799104AMask defect repair system and methodTOSHIBA KK·Filed 1996·Granted Aug 25, 1998·38 cites·13 claims
- 2177US6495841B1Charged beam drawing apparatusTOSHIBA KK·Filed 1999·Granted Dec 17, 2002·30 cites·8 claims
- 2276US4347412AHandle lock device for a switchMITSUBISHI ELECTRIC CORP·Filed 1980·Granted Aug 31, 1982·37 cites·1 claims
- 2370US6941008B2Pattern forming methodTOSHIBA KK·Filed 2003·Granted Sep 6, 2005·7 cites·4 claims
- 2470US6147355APattern forming methodTOSHIBA KK·Filed 1999·Granted Nov 14, 2000·22 cites·8 claims
- 2570US4578607APiezoelectric precise rotation mechanism for slightly rotating an objectTOSHIBA KK·Filed 1984·Granted Mar 25, 1986·20 cites·10 claims
- 2669US6633045B1Assembly part with wiring and for manufacturing system, method of manufacturing such assembly part, and semiconductor manufacturing system constituted using assembly partTOSHIBA KK·Filed 2000·Granted Oct 14, 2003·13 cites·18 claims
- 2768US5994030APattern-forming method and lithographic systemTOSHIBA KK·Filed 1998·Granted Nov 30, 1999·23 cites·10 claims
- 2867US4455501APrecision rotation mechanismTOKYO SHIBAURA ELECTRIC CO·Filed 1982·Granted Jun 19, 1984·28 cites·24 claims
- 2965US5523576ACharged beam drawing apparatusTOSHIBA KK·Filed 1994·Granted Jun 4, 1996·21 cites·33 claims
- 3058US5843603AMethod of evaluating shaped beam of charged beam writer and method of forming patternTOSHIBA KK·Filed 1996·Granted Dec 1, 1998·14 cites·8 claims
- 3158US4469949AElectron beam pattern transfer device and method for aligning mask and semiconductor waferTOSHIBA KK·Filed 1982·Granted Sep 4, 1984·21 cites·12 claims
- 3257US5949076ACharged beam applying apparatusTOSHIBA KK·Filed 1997·Granted Sep 7, 1999·12 cites·17 claims
- 3352US6093931APattern-forming method and lithographic systemTOSHIBA KK·Filed 1999·Granted Jul 25, 2000·11 cites·13 claims
- 3450US8943962B2Printing device, printing method and computer-readable storage medium storing program for executing the printing methodSUGIHARA KAZUYOSHI·Filed 2012·Granted Feb 3, 2015·0 cites·16 claims
- 3542US4945329ATripping device with burning prevention switchMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Jul 31, 1990·5 cites·3 claims
- 3640US4467210AElectron-beam image transfer deviceTOKYO SHIBAURA ELECTRIC CO·Filed 1982·Granted Aug 21, 1984·9 cites·6 claims
- 3738US4408126ACassette retaining device of electron beam apparatusTOSHIBA MACHINE CO LTD·Filed 1981·Granted Oct 4, 1983·5 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →