Inventor · disambiguated record
Kazuma Yamamoto
Also filed as: YAMAMOTO KAZUMA
16 granted patents·13 pending applications·150 citations·filing 1993–2025
91Inventor score
Files withMERCK PATENT GMBH9AZ ELECTRONIC MAT LUXEMBOURG SARL3CANON KK3DAIDO HOXAN INC2FURUKAWA SATOSHI2
Top patents by PatentIndex Score
29 records- 0183US9194458B2Friction transmission beltFURUKAWA SATOSHI·Filed 2012·Granted Nov 24, 2015·4 cites·15 claims
- 0281US6408148B1Image processing apparatus, image recording apparatus, controlling method for these apparatuses, and power supply apparatus used thereinCANON KK·Filed 2000·Granted Jun 18, 2002·49 cites·20 claims
- 0377US2025328080A1Electronic device manufacturing aqueous solution, method for manufacturing resist pattern and method for manufacturing deviceMERCK PATENT GMBH·Filed 2025·Application pending·0 cites
- 0474US9411232B2Composition for forming fine resist pattern, and pattern formation method using sameAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2014·Granted Aug 9, 2016·3 cites·16 claims
- 0574US5912186AMethod for processing semiconductor materialDAIDO HOXAN INC·Filed 1996·Granted Jun 15, 1999·48 cites·4 claims
- 0673US8697336B2Composition for forming a developable bottom antireflective coatingNAKASUGI SHIGEMASA·Filed 2011·Granted Apr 15, 2014·2 cites·14 claims
- 0768US10451974B2Rinse composition, a method for forming resist patterns and a method for making semiconductor devicesAZ ELECTRONIC MAT LUXEMBOURG SARL·Filed 2017·Granted Oct 22, 2019·1 cites·11 claims
- 0868US2025172876A1Developer tolerance resist underlayer composition and method for manufacturing resist patternMERCK PATENT GMBH·Filed 2025·Application pending·0 cites
- 0966US11414381B2Fluorinated imide salt compound and surfactantMITSUBISHI MAT ELECTRONIC CHEMICALS CO LTD·Filed 2019·Granted Aug 16, 2022·0 cites·6 claims
- 1064US9360756B2Composition for forming fine resist pattern and pattern formation method using sameYAMAMOTO KAZUMA·Filed 2013·Granted Jun 7, 2016·2 cites·12 claims
- 1162US2025085635A1Developable resist overlayer composition as well as method for manufacturing resist overlayer pattern and resist patternMERCK PATENT GMBH·Filed 2024·Application pending·0 cites
- 1260US2024213824A1Stator, motor and pump deviceNIDEC INSTRUMENTS CORP·Filed 2023·Application pending·0 cites
- 1359US2025368921A1Electronic device manufacturing aqueous solution, method for manufacturing resist pattern and method for manufacturing deviceMERCK PATENT GMBH·Filed 2025·Application pending·0 cites
- 1457US5751925AImage processing apparatusCANON KK·Filed 1997·Granted May 12, 1998·19 cites·14 claims
- 1556US2024425777A1Electronic device manufacturing solution, method for manufacturing resist pattern, and method for manufacturing deviceMERCK PATENT GMBH·Filed 2024·Application pending·0 cites
- 1653US9921481B2Fine resist pattern-forming composition and pattern forming method using sameAZ ELECTRONIC MAT LUXEMBOURG SARL·Filed 2014·Granted Mar 20, 2018·0 cites·12 claims
- 1753US5602975AImage processing apparatusCANON KK·Filed 1993·Granted Feb 11, 1997·16 cites·3 claims
- 1852US2014193753A1Composition for forming a developable bottom antireflective coatingNAKASUGI SHIGEMASA·Filed 2014·Application pending·0 cites
- 1951US12051946B2Rotor, motor, and rotor manufacturing methodNIDEC SANKYO CORP·Filed 2019·Granted Jul 30, 2024·0 cites·25 claims
- 2050US2024036469A1Method for manufacturing thickened resist pattern, thickening solution, and method for manufacturing processed substrateMERCK PATENT GMBH·Filed 2021·Application pending·0 cites
- 2150US2010323835A1Friction transmission beltFURUKAWA SATOSHI·Filed 2008·Application pending·0 cites
- 2249US12077727B2Semiconductor aqueous composition and use of the sameMERCK PATENT GMBH·Filed 2019·Granted Sep 3, 2024·0 cites·26 claims
- 2347US2024294855A1Electronic device manufacturing aqueous solution, method for manufacturing resist pattern and method for manufacturing deviceMERCK PATENT GMBH·Filed 2022·Application pending·0 cites
- 2447US2023167383A1Electronic device manufacturing aqueous solution, method for manufacturing resist pattern and method for manufacturing deviceMERCK PATENT GMBH·Filed 2021·Application pending·0 cites
- 2545US10191380B2Composition for resist patterning and method for forming pattern using sameAZ ELECTRONIC MAT LUXEMBOURG SARL·Filed 2015·Granted Jan 29, 2019·0 cites·14 claims
- 2644US2023045307A1Replacement liquid of liquid filling between resist patterns, and method for producing resist patterns using the sameMERCH PATENT GMBH·Filed 2020·Application pending·0 cites
- 2741US6284661B1Method and apparatus for producing a waferDAIDO HOXAN INC·Filed 1997·Granted Sep 4, 2001·6 cites·7 claims
- 2839US2005232810A1Method and apparatus for fumigationYAMAMOTO KAZUMA·Filed 2003·Application pending·0 cites
- 2935US11156920B2Lithography composition, a method for forming resist patterns and a method for making semiconductor devicesRIDGEFIELD ACQUISITION·Filed 2017·Granted Oct 26, 2021·0 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →