Inventor · disambiguated record
Kelvin Chan
Also filed as: CHAN KELVIN · CHAN KELVIN H K · CHAN KELVIN HAU-KONG
74 granted patents·34 pending applications·707 citations·filing 2004–2025
98Inventor score
Files withAPPLIED MATERIALS INC94CHAN KELVIN4ROLLS ROYCE PLC3MASSACHUSETTS INST TECHNOLOGY2MICROSOFT CORP1
Top patents by PatentIndex Score
108 records- 0198US10886172B2Methods for wordline separation in 3D-NAND devicesAPPLIED MATERIALS INC·Filed 2020·Granted Jan 5, 2021·8 cites·20 claims
- 0297US8492170B2UV assisted silylation for recovery and pore sealing of damaged low K filmsXIE BO·Filed 2011·Granted Jul 23, 2013·522 cites·20 claims
- 0396US10354916B2Methods for wordline separation in 3D-NAND devicesAPPLIED MATERIALS INC·Filed 2018·Granted Jul 16, 2019·12 cites·20 claims
- 0495US10622251B2Methods for wordline separation in 3D-NAND devicesAPPLIED MATERIALS INC·Filed 2019·Granted Apr 14, 2020·8 cites·13 claims
- 0595US7431969B2Chemical vapor deposition of hydrogel filmsMASSACHUSETTS INST TECHNOLOGY·Filed 2005·Granted Oct 7, 2008·22 cites·17 claims
- 0694US7297376B1Method to reduce gas-phase reactions in a PECVD process with silicon and organic precursors to deposit defect-free initial layersAPPLIED MATERIALS INC·Filed 2006·Granted Nov 20, 2007·33 cites·26 claims
- 0793US10410869B2CVD based oxide-metal multi structure for 3D NAND memory devicesAPPLIED MATERIALS INC·Filed 2017·Granted Sep 10, 2019·8 cites·17 claims
- 0892US12368024B2Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2021·Granted Jul 22, 2025·2 cites·17 claims
- 0991US9508545B2Selectively lateral growth of silicon oxide thin filmAPPLIED MATERIALS INC·Filed 2015·Granted Nov 29, 2016·6 cites·12 claims
- 1091US8993444B2Method to reduce dielectric constant of a porous low-k filmAPPLIED MATERIALS INC·Filed 2013·Granted Mar 31, 2015·5 cites·20 claims
- 1189US11459652B2Techniques and device structures based upon directional dielectric deposition and bottom-up fillAPPLIED MATERIALS INC·Filed 2020·Granted Oct 4, 2022·2 cites·20 claims
- 1289US11174551B2Methods for depositing tungsten on halosilane based metal silicide nucleation layersAPPLIED MATERIALS INC·Filed 2017·Granted Nov 16, 2021·2 cites·20 claims
- 1388US9506145B2Method and hardware for cleaning UV chambersAPPLIED MATERIALS INC·Filed 2016·Granted Nov 29, 2016·3 cites·20 claims
- 1488US9364871B2Method and hardware for cleaning UV chambersAPPLIED MATERIALS INC·Filed 2013·Granted Jun 14, 2016·4 cites·11 claims
- 1588US8877659B2Low-k dielectric damage repair by vapor-phase chemical exposureCHAN KELVIN·Filed 2013·Granted Nov 4, 2014·7 cites·12 claims
- 1687US11749564B2Techniques for void-free material depositionsAPPLIED MATERIALS INC·Filed 2020·Granted Sep 5, 2023·2 cites·16 claims
- 1787US9978685B2Conformal amorphous silicon as nucleation layer for W ALD processAPPLIED MATERIALS INC·Filed 2016·Granted May 22, 2018·4 cites·15 claims
- 1886US9123532B2Low-k dielectric damage repair by vapor-phase chemical exposureAPPLIED MATERIALS INC·Filed 2014·Granted Sep 1, 2015·5 cites·20 claims
- 1986US9105695B2Cobalt selectivity improvement in selective cobalt process sequenceAPPLIED MATERIALS INC·Filed 2014·Granted Aug 11, 2015·6 cites·20 claims
- 2086US7410916B2Method of improving initiation layer for low-k dielectric film by digital liquid flow meterAPPLIED MATERIALS INC·Filed 2006·Granted Aug 12, 2008·9 cites·18 claims
- 2185US11886120B2Deposition of semiconductor integration filmsAPPLIED MATERIALS INC·Filed 2021·Granted Jan 30, 2024·1 cites·20 claims
- 2284US9741558B2Selectively lateral growth of silicon oxide thin filmAPPLIED MATERIALS INC·Filed 2016·Granted Aug 22, 2017·3 cites·8 claims
- 2384US8481422B2Prevention and reduction of solvent and solution penetration into porous dielectrics using a thin barrier layerCHAN KELVIN·Filed 2012·Granted Jul 9, 2013·6 cites·16 claims
- 2483US11562904B2Deposition of semiconductor integration filmsAPPLIED MATERIALS INC·Filed 2020·Granted Jan 24, 2023·1 cites·6 claims
- 2582US9058980B1UV-assisted photochemical vapor deposition for damaged low K films pore sealingAPPLIED MATERIALS INC·Filed 2013·Granted Jun 16, 2015·5 cites·18 claims
- 2680US11956978B2Techniques and device structure based upon directional seeding and selective depositionAPPLIED MATERIALS INC·Filed 2020·Granted Apr 9, 2024·1 cites·13 claims
- 2780US7563734B2Chemical vapor deposition of antimicrobial polymer coatingsMASSACHUSETTS INST TECHNOLOGY·Filed 2005·Granted Jul 21, 2009·5 cites·11 claims
- 2879US9659765B2Enhancement of modulus and hardness for UV-cured ultra low-k dielectric filmsAPPLIED MATERIALS INC·Filed 2015·Granted May 23, 2017·3 cites·15 claims
- 2978US12228534B2Capacitive sensor for monitoring gas concentrationAPPLIED MATERIALS INC·Filed 2024·Granted Feb 18, 2025·0 cites·19 claims
- 3078US9478460B2Cobalt selectivity improvement in selective cobalt process sequenceAPPLIED MATERIALS INC·Filed 2015·Granted Oct 25, 2016·2 cites·20 claims
- 3174US12482641B2Printed microwave resonator for measuring high electron density plasmasAPPLIED MATERIALS INC·Filed 2023·Granted Nov 25, 2025·0 cites·22 claims
- 3274US11043386B2Enhanced spatial ALD of metals through controlled precursor mixingAPPLIED MATERIALS INC·Filed 2018·Granted Jun 22, 2021·1 cites·19 claims
- 3374US8236684B2Prevention and reduction of solvent and solution penetration into porous dielectrics using a thin barrier layerCHAN KELVIN·Filed 2008·Granted Aug 7, 2012·4 cites·10 claims
- 3473US12422210B2Techniques and device structures based upon directional dielectric deposition and bottom-up fillAPPLIED MATERIALS INC·Filed 2022·Granted Sep 23, 2025·0 cites·19 claims
- 3573US12300491B2Deposition of semiconductor integration filmsAPPLIED MATERIALS INC·Filed 2022·Granted May 13, 2025·0 cites·8 claims
- 3673US11621160B2Doped and undoped vanadium oxides for low-k spacer applicationsAPPLIED MATERIALS INC·Filed 2021·Granted Apr 4, 2023·0 cites·12 claims
- 3772US11702742B2Methods of forming nucleation layers with halogenated silanesAPPLIED MATERIALS INC·Filed 2021·Granted Jul 18, 2023·0 cites·20 claims
- 3872US11289374B2Nucleation-free gap fill ALD processAPPLIED MATERIALS INC·Filed 2017·Granted Mar 29, 2022·1 cites·4 claims
- 3971US12406837B2Reaction cell for species sensingAPPLIED MATERIALS INC·Filed 2022·Granted Sep 2, 2025·0 cites·19 claims
- 4071US2025224678A1Photoresist deposition using independent multichannel showerheadAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 4170US12131948B2Techniques for void-free material depositionsAPPLIED MATERIALS INC·Filed 2023·Granted Oct 29, 2024·0 cites·16 claims
- 4270US11887856B2Enhanced spatial ALD of metals through controlled precursor mixingAPPLIED MATERIALS INC·Filed 2021·Granted Jan 30, 2024·0 cites·17 claims
- 4369US12394670B2Nucleation-free gap fill ALD processAPPLIED MATERIALS INC·Filed 2022·Granted Aug 19, 2025·0 cites·16 claims
- 4469US12282256B2Photoresist deposition using independent multichannel showerheadAPPLIED MATERIALS INC·Filed 2021·Granted Apr 22, 2025·0 cites·18 claims
- 4569US7947611B2Method of improving initiation layer for low-k dielectric film by digital liquid flow meterAPPLIED MATERIALS INC·Filed 2008·Granted May 24, 2011·2 cites·10 claims
- 4669US2024040808A1Techniques and device structure based upon directional seeding and selective depositionAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4767US9613908B2Ultra-thin dielectric diffusion barrier and etch stop layer for advanced interconnect applicationsAPPLIED MATERIALS INC·Filed 2015·Granted Apr 4, 2017·1 cites·20 claims
- 4866US11959868B2Capacitive sensor for monitoring gas concentrationAPPLIED MATERIALS INC·Filed 2021·Granted Apr 16, 2024·0 cites·9 claims
- 4966US11094533B2Doped and undoped vanadium oxides for low-k spacer applicationsAPPLIED MATERIALS INC·Filed 2019·Granted Aug 17, 2021·0 cites·8 claims
- 5064US2023146981A1Hydrogen management in plasma deposited filmsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
Showing the top 50 of 108 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →