Inventor · disambiguated record
Keiko Hada
Also filed as: HADA KEIKO
6 granted patents·1 pending application·23 citations·filing 2001–2021
73Inventor score
Files withTOKYO ELECTRON LTD7
Top patents by PatentIndex Score
7 records- 0177US10903083B2Substrate processing method, substrate processing apparatus and substrate processing systemTOKYO ELECTRON LTD·Filed 2017·Granted Jan 26, 2021·2 cites·9 claims
- 0275US6617095B2Evaluating method of hydrophobic process, forming method of resist pattern, and forming system of resist patternTOKYO ELECTRON LTD·Filed 2001·Granted Sep 9, 2003·21 cites·18 claims
- 0360US12237173B2Substrate processing method, substrate processing apparatus and substrate processing systemTOKYO ELECTRON LTD·Filed 2020·Granted Feb 25, 2025·0 cites·5 claims
- 0445US11557493B2Substrate cleaning apparatus and substrate cleaning methodTOKYO ELECTRON LTD·Filed 2020·Granted Jan 17, 2023·0 cites·2 claims
- 0544US11548804B2Method and apparatus for processing oxygen-containing workpieceTOKYO ELECTRON LTD·Filed 2019·Granted Jan 10, 2023·0 cites·6 claims
- 0644US2022068657A1Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 0741US10213076B2Particle collecting apparatus and particle collecting methodTOKYO ELECTRON LTD·Filed 2012·Granted Feb 26, 2019·0 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →