Inventor · disambiguated record
Keizo Hasebe
Also filed as: HASEBE KEIZE · HASEBE KEIZO
11 granted patents·1,339 citations·filing 1991–2001
94Inventor score
Files withTOKYO ELECTRON LTD11
Top patents by PatentIndex Score
11 records- 0198US5826129ASubstrate processing systemTOKYO ELECTRON LTD·Filed 1995·Granted Oct 20, 1998·552 cites·23 claims
- 0294US5658615AMethod of forming coating film and apparatus thereforTOKYO ELECTRON LTD·Filed 1994·Granted Aug 19, 1997·187 cites·23 claims
- 0390US6063190AMethod of forming coating film and apparatus thereforTOKYO ELECTRON LTD·Filed 1999·Granted May 16, 2000·94 cites·7 claims
- 0490US6033475AResist processing apparatusTOKYO ELECTRON LTD·Filed 1995·Granted Mar 7, 2000·90 cites·12 claims
- 0590US5942035ASolvent and resist spin coating apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Aug 24, 1999·103 cites·13 claims
- 0687US5374312ALiquid coating systemTOKYO ELECTRON LTD·Filed 1993·Granted Dec 20, 1994·119 cites·7 claims
- 0786US6228561B1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 1997·Granted May 8, 2001·36 cites·17 claims
- 0884US6503003B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Jan 7, 2003·19 cites·5 claims
- 0981US5252137ASystem and method for applying a liquidTOKYO ELECTRON LTD·Filed 1991·Granted Oct 12, 1993·77 cites·14 claims
- 1068US5866307AResist processing method and resist processing systemTOKYO ELECTRON LTD·Filed 1997·Granted Feb 2, 1999·34 cites·22 claims
- 1165US6217657B1Resist processing system having process solution deaeration mechanismTOKYO ELECTRON LTD·Filed 1998·Granted Apr 17, 2001·28 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →