Inventor · disambiguated record
Kerstin Hild
Also filed as: HILD KERSTIN
15 granted patents·2 pending applications·17 citations·filing 2016–2023
87Inventor score
Files withZEISS CARL SMT GMBH17
Top patents by PatentIndex Score
17 records- 0188US10852643B2Optical system, and methodZEISS CARL SMT GMBH·Filed 2019·Granted Dec 1, 2020·3 cites·19 claims
- 0280US10684466B2Mirror arrangement for lithography exposure apparatus and optical system comprising mirror arrangementZEISS CARL SMT GMBH·Filed 2018·Granted Jun 16, 2020·3 cites·19 claims
- 0379US11366395B2Mirror, in particular for a microlithographic projection exposure systemZEISS CARL SMT GMBH·Filed 2020·Granted Jun 21, 2022·1 cites·15 claims
- 0478US11187990B2Mirror for a microlithographic projection exposure apparatus, and method for operating a deformable mirrorZEISS CARL SMT GMBH·Filed 2021·Granted Nov 30, 2021·1 cites·15 claims
- 0578US10908509B2Mirror, in particular for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2019·Granted Feb 2, 2021·3 cites·20 claims
- 0674US9785054B2Mirror, more particularly for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Oct 10, 2017·3 cites·20 claims
- 0772US11360393B2Mirror, in particular for a microlithographic projection exposure systemZEISS CARL SMT GMBH·Filed 2020·Granted Jun 14, 2022·1 cites·20 claims
- 0870US10331048B2Mirror, in particular for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2018·Granted Jun 25, 2019·1 cites·20 claims
- 0968US10146138B2Method for producing an optical element for an optical system, in particular for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2017·Granted Dec 4, 2018·1 cites·15 claims
- 1064US12210289B2Mirror, in particular for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2022·Granted Jan 28, 2025·0 cites·22 claims
- 1160US12411417B2Projection objective including an optical deviceZEISS CARL SMT GMBH·Filed 2023·Granted Sep 9, 2025·0 cites·20 claims
- 1259US11029515B2Optical element, and method for correcting the wavefront effect of an optical elementZEISS CARL SMT GMBH·Filed 2020·Granted Jun 8, 2021·0 cites·15 claims
- 1357US2024025003A1Method of producing an optical element for a lithography apparatusZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 1453US11137687B2Optical arrangement for EUV radiation with a shield for protection against the etching effect of a plasmaZEISS CARL SMT GMBH·Filed 2020·Granted Oct 5, 2021·0 cites·15 claims
- 1551US12276917B2Mirror, in particular for microlithographyZEISS CARL SMT GMBH·Filed 2022·Granted Apr 15, 2025·0 cites·19 claims
- 1644US2022206401A1Mirror assembly having a hydrogen barrier and optical assemblyZEISS CARL SMT GMBH·Filed 2022·Application pending·0 cites
- 1742US11328831B2Method for treating a reflective optical element for the EUV wavelength range, method for producing same, and treating apparatusZEISS CARL SMT GMBH·Filed 2018·Granted May 10, 2022·0 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →