Inventor · disambiguated record
Keita Kato
Also filed as: KATO KEITA
47 granted patents·28 pending applications·75 citations·filing 2000–2025
97Inventor score
Top patents by PatentIndex Score
75 records- 0197US9897922B2Method of forming pattern and developer for use in the methodFUJIFILM CORP·Filed 2016·Granted Feb 20, 2018·10 cites·12 claims
- 0292US10802399B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2018·Granted Oct 13, 2020·5 cites·20 claims
- 0391US9417528B2Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Aug 16, 2016·7 cites·15 claims
- 0485US10859914B2Pattern forming method, method for producing electronic device, and actinic ray-sensitive or radiation-sensitive resin composition for organic solvent developmentFUJIFILM CORP·Filed 2017·Granted Dec 8, 2020·3 cites·9 claims
- 0585US9482958B2Method of forming pattern and developer for use in the methodFUJIFILM CORP·Filed 2015·Granted Nov 1, 2016·2 cites·12 claims
- 0684US9996003B2Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2017·Granted Jun 12, 2018·4 cites·19 claims
- 0784US8999621B2Pattern forming method, chemical amplification resist composition and resist filmENOMOTO YUICHIRO·Filed 2010·Granted Apr 7, 2015·4 cites·58 claims
- 0882US11067890B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2019·Granted Jul 20, 2021·2 cites·12 claims
- 0981US9250532B2Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2013·Granted Feb 2, 2016·3 cites·20 claims
- 1080US10261417B2Active-light-sensitive or radiation-sensitive resin composition, active-light-sensitive or radiation-sensitive film and pattern forming method, each using composition, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2016·Granted Apr 16, 2019·3 cites·23 claims
- 1179US9128376B2Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2014·Granted Sep 8, 2015·4 cites·30 claims
- 1278US9097973B2Method of forming pattern and developer for use in the methodENOMOTO YUICHIRO·Filed 2011·Granted Aug 4, 2015·2 cites·8 claims
- 1377US10902057B2Image processing apparatus and method of controlling the sameCANON KK·Filed 2018·Granted Jan 26, 2021·2 cites·9 claims
- 1476US10018913B2Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2017·Granted Jul 10, 2018·2 cites·17 claims
- 1575US10025186B2Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2017·Granted Jul 17, 2018·2 cites·12 claims
- 1672US10248019B2Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist filmFUJIFILM CORP·Filed 2012·Granted Apr 2, 2019·1 cites·9 claims
- 1772US9760003B2Pattern forming method and actinic-ray- or radiation-sensitive resin compositionIWATO KAORU·Filed 2011·Granted Sep 12, 2017·2 cites·36 claims
- 1872US9709892B2Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the sameKATAOKA SHOHEI·Filed 2011·Granted Jul 18, 2017·2 cites·9 claims
- 1972US9075310B2Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2014·Granted Jul 7, 2015·2 cites·15 claims
- 2065US2023367212A1Pattern forming method and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 2164US9551935B2Pattern forming method and resist compositionKATO KEITA·Filed 2011·Granted Jan 24, 2017·1 cites·34 claims
- 2262US2025336179A1Information processing device, information processing system, information processing method, and non-transitory computer-readable storage mediumCANON KK·Filed 2025·Application pending·0 cites
- 2362US2023133710A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2022·Application pending·0 cites
- 2462US2025355608A1Image processing device, image processing method, and recording mediumCANON KK·Filed 2025·Application pending·0 cites
- 2561US12007688B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic device, and resinFUJIFILM CORP·Filed 2020·Granted Jun 11, 2024·0 cites·20 claims
- 2661US9523913B2Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2013·Granted Dec 20, 2016·1 cites·12 claims
- 2761US9086623B2Method of forming pattern, actinic-ray- or radiation-sensitive resin composition and actinic-ray- or radiation-sensitive filmKATO KEITA·Filed 2012·Granted Jul 21, 2015·1 cites·18 claims
- 2861US6577385B1Optical time-domain reflectometer capable of determining when a test of an optical fiber should be conductedANRITSU CORP·Filed 2000·Granted Jun 10, 2003·10 cites·17 claims
- 2959US2025014223A1Information processing device, parcel detection system, and calibration methodPANASONIC IP MAN CO LTD·Filed 2024·Application pending·0 cites
- 3058US11886113B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2020·Granted Jan 30, 2024·0 cites·15 claims
- 3158US2023259029A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 3257US2014205947A1Pattern forming method, chemical amplification resist composition and resist filmFUJIFILM CORP·Filed 2014·Application pending·0 cites
- 3357US2014127629A1Method of forming patternFUJIFILM CORP·Filed 2014·Application pending·0 cites
- 3456US12481215B2Active-light-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, method for manufacturing electronic device, compound, and resinFUJIFILM CORP·Filed 2022·Granted Nov 25, 2025·0 cites·15 claims
- 3556US2022334476A1Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2022·Application pending·0 cites
- 3655US2017102618A1Method of forming patternFUJIFILM CORP·Filed 2016·Application pending·0 cites
- 3754US8722319B2Pattern forming method, chemical amplification resist composition and resist filmIWATO KAORU·Filed 2011·Granted May 13, 2014·0 cites·15 claims
- 3853US8663907B2Method of forming patternKATO KEITA·Filed 2011·Granted Mar 4, 2014·0 cites·18 claims
- 3952US2022082938A1Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2021·Application pending·0 cites
- 4049US9791777B2Active light sensitive or radiation sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2016·Granted Oct 17, 2017·0 cites·12 claims
- 4149US8753802B2Pattern forming method, chemical amplification resist composition and resist filmFUJIFILM CORP·Filed 2012·Granted Jun 17, 2014·0 cites·16 claims
- 4248US8871642B2Method of forming pattern and developer for use in the methodENOMOTO YUICHIRO·Filed 2011·Granted Oct 28, 2014·0 cites·29 claims
- 4347US11073762B2Actinic ray-sensitive or radiation sensitive resin composition, actinic raysensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and photoacid generatorFUJIFILM CORP·Filed 2019·Granted Jul 27, 2021·0 cites·9 claims
- 4447US9086627B2Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, manufacturing method of electronic device, and electronic deviceFUJIFILM CORP·Filed 2014·Granted Jul 21, 2015·0 cites·19 claims
- 4547US8859192B2Negative pattern forming method and resist patternFUJIFILM CORP·Filed 2013·Granted Oct 14, 2014·0 cites·9 claims
- 4646US10776927B2Image processing apparatus, image processing method, and programCANON KK·Filed 2018·Granted Sep 15, 2020·0 cites·16 claims
- 4746US9841679B2Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2016·Granted Dec 12, 2017·0 cites·15 claims
- 4846US2015111157A1Method of forming pattern and actinic-ray- or radiation-sensitive resin composition for use in the methodFUJIFILM CORP·Filed 2014·Application pending·0 cites
- 4944US10321089B2Image preproduction apparatus, method for controlling the same, and recording mediumCANON KK·Filed 2016·Granted Jun 11, 2019·0 cites·19 claims
- 5044US9223219B2Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist filmENOMOTO YUICHIRO·Filed 2011·Granted Dec 29, 2015·0 cites·36 claims
Showing the top 50 of 75 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →