Inventor · disambiguated record
Kenri Konno
Also filed as: KONNO KENRI
8 granted patents·12 pending applications·23 citations·filing 2011–2024
79Inventor score
Top patents by PatentIndex Score
20 records- 0193US8795948B2Resist composition, method of forming resist pattern and polymeric compoundTOKYO OHKA KOGYO CO LTD·Filed 2013·Granted Aug 5, 2014·12 cites·3 claims
- 0290US9023581B2Resist composition, method of forming resist pattern, polymeric compound, and compoundKAWAUE AKIYA·Filed 2011·Granted May 5, 2015·8 cites·14 claims
- 0367US8986919B2Resist composition, method of forming resist pattern and polymeric compoundTAKAKI DAICHI·Filed 2012·Granted Mar 24, 2015·2 cites·8 claims
- 0466US9746766B2Composition for nanoimprint and nanoimprint pattern forming methodTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Aug 29, 2017·1 cites·7 claims
- 0560US2025051540A1Curable composition for forming low refractive index film, low refractive index film, optical device, and method for producing low refractive index filmTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 0654US2014162193A1Resist composition for euv, method of producing resist composition for euv, and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2014·Application pending·0 cites
- 0752US2022347913A1Pattern forming method and method of producing curable compositionTOKYO OHKA KOGYO CO LTD·Filed 2022·Application pending·0 cites
- 0846US2022373889A1Pattern forming methodTOKYO OHKA KOGYO CO LTD·Filed 2022·Application pending·0 cites
- 0946US2022334475A1Photocurable composition and pattern forming methodTOKYO OHKA KOGYO CO LTD·Filed 2022·Application pending·0 cites
- 1046US2012208124A1Resist composition for euv, method for producing resist composition for euv, and method of forming resist patternIWASHITA JUN·Filed 2012·Application pending·0 cites
- 1146US2022371092A1Production method for refined product of metal nanoparticle-containing composition and production method for refined product of metal nanoparticle dispersion liquidTOKYO OHKA KOGYO CO LTD·Filed 2022·Application pending·0 cites
- 1245US9250531B2Method of forming resist pattern and negative tone-development resist compositionHIRANO TOMOYUKI·Filed 2012·Granted Feb 2, 2016·0 cites·20 claims
- 1344US9057948B2Resist composition for EUV or EB, and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2012·Granted Jun 16, 2015·0 cites·5 claims
- 1443US9097971B2Compound, radical polymerization initiator, method for producing compound, polymer, resist composition, and method for forming resist patternUTSUMI YOSHIYUKI·Filed 2012·Granted Aug 4, 2015·0 cites·4 claims
- 1543US2014093824A1Resist composition for euv or eb and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2013·Application pending·0 cites
- 1640US2024158541A1Photocurable composition and pattern-forming methodTOKYO OHKA KOGYO CO LTD·Filed 2022·Application pending·0 cites
- 1740US2024166779A1Photocurable composition and pattern formation methodTOKYO OHKA KOGYO CO LTD·Filed 2022·Application pending·0 cites
- 1839US2012100487A1Resist composition, method of forming resist pattern, and polymeric compoundHIRANO TOMOYUKI·Filed 2011·Application pending·0 cites
- 1936US2013071789A1Resist composition and method of forming resist patternIWASHITA JUN·Filed 2012·Application pending·0 cites
- 2034US8586281B2Positive resist composition and method of forming resist patternIWASHITA JUN·Filed 2011·Granted Nov 19, 2013·0 cites·3 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →