Inventor · disambiguated record
Ken Maruyama
Also filed as: MARUYAMA KEN
32 granted patents·34 pending applications·60 citations·filing 2003–2025
95Inventor score
Top patents by PatentIndex Score
66 records- 0192US11592746B2Radiation-sensitive resin composition, resist pattern-forming method, compound and method of generating acidJSR CORP·Filed 2020·Granted Feb 28, 2023·4 cites·13 claims
- 0292US9023584B2Radiation-sensitive composition, and compoundJSR CORP·Filed 2013·Granted May 5, 2015·8 cites·8 claims
- 0392US2025377590A1Radiation-sensitive resin composition and method for forming resist patternJSR CORP·Filed 2025·Application pending·0 cites
- 0491US11609495B2Radiation-sensitive resin composition and resist pattern-forming methodJSR CORP·Filed 2020·Granted Mar 21, 2023·3 cites·18 claims
- 0589US9122154B2Radiation-sensitive resin composition, and radiation-sensitive acid generating agentJSR CORP·Filed 2013·Granted Sep 1, 2015·5 cites·13 claims
- 0687US9128370B2Radiation-sensitive composition and compoundJSR CORP·Filed 2013·Granted Sep 8, 2015·4 cites·9 claims
- 0785US8173351B2Compound and radiation-sensitive compositionSHIMIZU DAISUKE·Filed 2008·Granted May 8, 2012·6 cites·10 claims
- 0882US12422748B2Radiation-sensitive resin composition and method for forming resist patternJSR CORP·Filed 2023·Granted Sep 23, 2025·0 cites·12 claims
- 0982US2024152050A1Radiation-sensitive composition and resist pattern-forming methodJSR CORP·Filed 2023·Application pending·0 cites
- 1079US11747725B2Radiation-sensitive resin composition and method for forming resist patternJSR CORP·Filed 2018·Granted Sep 5, 2023·1 cites·20 claims
- 1179US9200098B2Radiation-sensitive composition and compoundMARUYAMA KEN·Filed 2012·Granted Dec 1, 2015·3 cites·10 claims
- 1276US7977442B2Radiation-sensitive composition, polymer and monomerJSR CORP·Filed 2010·Granted Jul 12, 2011·2 cites·6 claims
- 1375US8389202B2Polymer, radiation-sensitive composition, monomer, and method of producing compoundMARUYAMA KEN·Filed 2012·Granted Mar 5, 2013·2 cites·7 claims
- 1475US2023205082A9Radiation-sensitive composition and resist pattern-forming methodJSR CORP·Filed 2022·Application pending·0 cites
- 1574US8377627B2Compound and radiation-sensitive compositionJSR CORP·Filed 2008·Granted Feb 19, 2013·2 cites·6 claims
- 1673US9104102B2Radiation-sensitive resin compositionMATSUDA YASUHIKO·Filed 2012·Granted Aug 11, 2015·2 cites·11 claims
- 1773US8632945B2Radiation-sensitive resin composition, monomer, polymer, and production method of radiation-sensitive resin compositionMARUYAMA KEN·Filed 2012·Granted Jan 21, 2014·2 cites·13 claims
- 1873US2025224679A1Resist pattern formation methodJSR CORP·Filed 2025·Application pending·0 cites
- 1972US9304393B2Radiation-sensitive resin composition and compoundJSR CORP·Filed 2013·Granted Apr 5, 2016·1 cites·11 claims
- 2072US8968980B2Radiation-sensitive resin composition and compoundMARUYAMA KEN·Filed 2011·Granted Mar 3, 2015·2 cites·7 claims
- 2169US2025237948A1Radiation-sensitive resin composition and pattern formation methodJSR CORP·Filed 2023·Application pending·0 cites
- 2268US2024377742A1Radiation-sensitive resin composition, method of forming resist pattern, and polymerJSR CORP·Filed 2024·Application pending·0 cites
- 2367US2024329523A1Radiation-sensitive composition and method of forming resist patternJSR CORP·Filed 2024·Application pending·0 cites
- 2465US2025251662A1Radical scavenger additives for metal oxide based resists and precursor solutionsINPRIA CORP·Filed 2025·Application pending·0 cites
- 2564US2020026188A1Radiation-sensitive composition and resist pattern-forming methodJSR CORP·Filed 2019·Application pending·0 cites
- 2662US9261789B2Liquid immersion lithography upper-layer film-forming composition and photoresist pattern-forming methodHAYAMA TAKAHIRO·Filed 2011·Granted Feb 16, 2016·1 cites·13 claims
- 2762US2025383603A9Radiation-sensitive composition and method for forming resist patternJSR CORP·Filed 2022·Application pending·0 cites
- 2862US2025155802A1Radiation-Sensitive Composition and Method for Forming Resist PatternJSR CORP·Filed 2022·Application pending·0 cites
- 2962US2023273519A1Radiation-sensitive resin composition and pattern formation methodJSR CORP·Filed 2021·Application pending·0 cites
- 3060US2024369928A1Radiation-sensitive resin composition and method for forming patternJSR CORP·Filed 2022·Application pending·0 cites
- 3160US2022269172A1Radiation-sensitive resin composition, method of forming resist pattern, and polymerJSR CORP·Filed 2022·Application pending·0 cites
- 3259US12092957B2Radiation-sensitive resin composition, method for forming resist pattern and compoundJSR CORP·Filed 2021·Granted Sep 17, 2024·0 cites·19 claims
- 3359US9052600B2Method for forming resist pattern and composition for forming protective filmMARUYAMA KEN·Filed 2012·Granted Jun 9, 2015·1 cites·10 claims
- 3458US2022299875A1Radiation-sensitive resin composition, and method for forming patternJSR CORP·Filed 2022·Application pending·0 cites
- 3558US2024030030A1Method for manufacturing semiconductor substrate and compositionJSR CORP·Filed 2023·Application pending·0 cites
- 3658US2024021429A1Method for manufacturing semiconductor substrate and compositionJSR CORP·Filed 2023·Application pending·0 cites
- 3757US6969963B2PWM controlled motor driveMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2003·Granted Nov 29, 2005·10 cites·3 claims
- 3857US2024126167A1Radiation-sensitive composition and method of forming resist patternJSR CORP·Filed 2021·Application pending·0 cites
- 3957US2024152048A1Radiation-sensitive resin composition and pattern formation methodJSR CORP·Filed 2021·Application pending·0 cites
- 4057US2023203229A1Composition, underlayer film, and directed self-assembly lithography processJSR CORP·Filed 2023·Application pending·0 cites
- 4157US2023400768A1Radiation-sensitive composition and method of forming resist patternJSR CORP·Filed 2021·Application pending·0 cites
- 4257US2025258431A1Radiation-sensitive composition, method for forming resist pattern, polymer, and compoundJSR CORP·Filed 2025·Application pending·0 cites
- 4357US2023259032A1Composition, underlayer film, and directed self-assembly lithography processJSR CORP·Filed 2023·Application pending·0 cites
- 4456US11966161B2Radiation-sensitive resin composition, method of forming resist pattern, and compoundJSR CORP·Filed 2022·Granted Apr 23, 2024·0 cites·19 claims
- 4556US2024004288A1Radiation-sensitive resin composition and method for forming patternJSR CORP·Filed 2021·Application pending·0 cites
- 4656US2024385520A1Radiation-sensitive resin composition and method for forming patternJSR CORP·Filed 2021·Application pending·0 cites
- 4755US2023236506A2Radiation-sensitive resin composition and method of forming resist patternJSR CORP·Filed 2022·Application pending·0 cites
- 4855US2024411228A1Production method for semiconductor substratesJSR CORP·Filed 2022·Application pending·0 cites
- 4954US8809476B2PolymerJSR CORP·Filed 2012·Granted Aug 19, 2014·0 cites·5 claims
- 5053US11319388B2Radiation-sensitive resin composition, production method thereof, and resist pattern-forming methodJSR CORP·Filed 2020·Granted May 3, 2022·0 cites·14 claims
Showing the top 50 of 66 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →