Inventor · disambiguated record
Keiji Tanouchi
Also filed as: TANOUCHI KEIJI
13 granted patents·6 pending applications·39 citations·filing 2005–2022
88Inventor score
Top patents by PatentIndex Score
19 records- 0196US11367630B2Substrate cleaning method, substrate cleaning system, and memory mediumTOKYO ELECTRON LTD·Filed 2020·Granted Jun 21, 2022·3 cites·20 claims
- 0294US9953826B2Substrate cleaning method, substrate cleaning system, and memory mediumTOKYO ELECTRON LTD·Filed 2014·Granted Apr 24, 2018·15 cites·18 claims
- 0384US9881784B2Substrate processing method, substrate processing apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2015·Granted Jan 30, 2018·4 cites·12 claims
- 0483US7976896B2Method of processing a substrate and apparatus processing the sameTOKYO ELECTRON LTD·Filed 2006·Granted Jul 12, 2011·9 cites·13 claims
- 0582US10811283B2Substrate cleaning method, substrate cleaning system, and memory mediumTOKYO ELECTRON LTD·Filed 2018·Granted Oct 20, 2020·2 cites·18 claims
- 0681US10043652B2Substrate cleaning method, substrate cleaning system, and memory mediumTOKYO ELECTRON LTD·Filed 2014·Granted Aug 7, 2018·5 cites·15 claims
- 0774US2022277968A1Substrate cleaning method, substrate cleaning system, and memory mediumTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 0864US9618849B2Pattern forming method, pattern forming apparatus, and computer readable storage mediumTOKYO ELECTRON LTD·Filed 2013·Granted Apr 11, 2017·1 cites·11 claims
- 0955US9859118B2Pattern forming method and heating apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Jan 2, 2018·0 cites·7 claims
- 1053US10121659B2Pattern forming method and heating apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Nov 6, 2018·0 cites·9 claims
- 1151US12500091B2Etching method, method of removing etching residue, and storage mediumTOKYO ELECTRON LTD·Filed 2019·Granted Dec 16, 2025·0 cites·27 claims
- 1249US7781342B2Substrate treatment method for etching a base film using a resist patternTOKYO ELECTRON LTD·Filed 2005·Granted Aug 24, 2010·0 cites·13 claims
- 1346US2010307683A1Substrate treatment method and substrate treatment apparatusTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
- 1445US9530645B2Pattern forming method, pattern forming apparatus, and non-transitory computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2013·Granted Dec 27, 2016·0 cites·8 claims
- 1543US9748101B2Substrate treatment method, computer storage medium, and substrate treatment systemTOKYO ELECTRON LTD·Filed 2013·Granted Aug 29, 2017·0 cites·22 claims
- 1641US2019181056A1Silicon-containing film etching method, computer-readable storage medium, and silicon-containing film etching apparatusTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 1740US2006068337A1Substrate processing methodTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 1839US2015228512A1Substrate treatment method, computer-readable storage medium, and substrate treatment systemTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 1939US2012328273A1Heat treatment apparatus and heat treatment methodKAWANO HISASHI·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →