Inventor · disambiguated record
Khanh B. Nguyen
Also filed as: NGUYEN KHANH · NGUYEN KHANH B
35 granted patents·1 pending application·1,460 citations·filing 1998–2002
98Inventor score
Top patents by PatentIndex Score
36 records- 0196US6184128B1Method using a thin resist mask for dual damascene stop layer etchADVANCED MICRO DEVICES INC·Filed 2000·Granted Feb 6, 2001·139 cites·20 claims
- 0294US6098408ASystem for controlling reflection reticle temperature in microlithographyADVANCED MICRO DEVICES INC·Filed 1998·Granted Aug 8, 2000·111 cites·25 claims
- 0394US6013399AReworkable EUV mask materialsADVANCED MICRO DEVICES INC·Filed 1998·Granted Jan 11, 2000·125 cites·21 claims
- 0492US6440640B1Thin resist with transition metal hard mask for via etch applicationADVANCED MICRO DEVICES INC·Filed 2000·Granted Aug 27, 2002·53 cites·20 claims
- 0589US6492067B1Removable pellicle for lithographic mask protection and handlingEUV LLC·Filed 1999·Granted Dec 10, 2002·75 cites·21 claims
- 0688US6020269AUltra-thin resist and nitride/oxide hard mask for metal etchADVANCED MICRO DEVICES INC·Filed 1998·Granted Feb 1, 2000·92 cites·20 claims
- 0785US6048652ABackside polish EUV mask and method of manufactureADVANCED MICRO DEVICES INC·Filed 1998·Granted Apr 11, 2000·55 cites·23 claims
- 0884US6159643AExtreme ultraviolet lithography reflective maskADVANCED MICRO DEVICES INC·Filed 1999·Granted Dec 12, 2000·52 cites·27 claims
- 0980US6309926B1Thin resist with nitride hard mask for gate etch applicationADVANCED MICRO DEVICES INC·Filed 1998·Granted Oct 30, 2001·58 cites·28 claims
- 1079US6165695AThin resist with amorphous silicon hard mask for via etch applicationADVANCED MICRO DEVICES INC·Filed 1998·Granted Dec 26, 2000·57 cites·32 claims
- 1178US6127070AThin resist with nitride hard mask for via etch applicationADVANCED MICRO DEVICES INC·Filed 1998·Granted Oct 3, 2000·53 cites·2 claims
- 1277US6096661AMethod for depositing silicon dioxide using low temperaturesADVANCED MICRO DEVICES INC·Filed 1998·Granted Aug 1, 2000·58 cites·6 claims
- 1375US6255125B1Method and apparatus for compensating for critical dimension variations in the production of a semiconductor waferADVANCED MICRO DEVICES INC·Filed 1999·Granted Jul 3, 2001·47 cites·13 claims
- 1475US6200907B1Ultra-thin resist and barrier metal/oxide hard mask for metal etchADVANCED MICRO DEVICES INC·Filed 1998·Granted Mar 13, 2001·46 cites·20 claims
- 1575US6178221B1Lithography reflective maskADVANCED MICRO DEVICES INC·Filed 1998·Granted Jan 23, 2001·62 cites·21 claims
- 1674US6140023AMethod for transferring patterns created by lithographyADVANCED MICRO DEVICES INC·Filed 1998·Granted Oct 31, 2000·33 cites·30 claims
- 1771US6271602B1Method for reducing the susceptibility to chemical-mechanical polishing damage of an alignment mark formed in a semiconductor substrateADVANCED MICRO DEVICES INC·Filed 1999·Granted Aug 7, 2001·39 cites·23 claims
- 1871US6171763B1Ultra-thin resist and oxide/nitride hard mask for metal etchADVANCED MICRO DEVICES INC·Filed 1998·Granted Jan 9, 2001·38 cites·26 claims
- 1971US6140255AMethod for depositing silicon nitride using low temperaturesADVANCED MICRO DEVICES INC·Filed 1999·Granted Oct 31, 2000·43 cites·6 claims
- 2070US6057206AMark protection scheme with no maskingADVANCED MICRO DEVICES INC·Filed 1999·Granted May 2, 2000·36 cites·11 claims
- 2168US6306560B1Ultra-thin resist and SiON/oxide hard mask for metal etchADVANCED MICRO DEVICES INC·Filed 1998·Granted Oct 23, 2001·34 cites·28 claims
- 2266US6162587AThin resist with transition metal hard mask for via etch applicationADVANCED MICRO DEVICES INC·Filed 1998·Granted Dec 19, 2000·27 cites·14 claims
- 2363US6414326B1Technique to separate dose-induced vs. focus-induced CD or linewidth variationADVANCED MICRO DEVICES INC·Filed 1999·Granted Jul 2, 2002·21 cites·22 claims
- 2459US6544885B1Polished hard mask process for conductor layer patterningADVANCED MICRO DEVICES INC·Filed 2000·Granted Apr 8, 2003·6 cites·21 claims
- 2556US6156658AUltra-thin resist and silicon/oxide hard mask for metal etchADVANCED MICRO DEVICES INC·Filed 1998·Granted Dec 5, 2000·20 cites·20 claims
- 2654US6875668B2Notched gate structure fabricationADVANCED MICRO DEVICES INC·Filed 2002·Granted Apr 5, 2005·5 cites·10 claims
- 2754US6326319B1Method for coating ultra-thin resist filmsADVANCED MICRO DEVICES INC·Filed 2000·Granted Dec 4, 2001·4 cites·4 claims
- 2852US5985498AMethod of characterizing linewidth errors in a scanning lithography systemADVANCED MICRO DEVICES INC·Filed 1999·Granted Nov 16, 1999·13 cites·20 claims
- 2946US6370680B1Device to determine line edge roughness effect on device performanceADVANCED MICRO DEVICES INC·Filed 1999·Granted Apr 9, 2002·12 cites·17 claims
- 3045US6740566B2Ultra-thin resist shallow trench process using high selectivity nitride etchADVANCED MICRO DEVICES INC·Filed 1999·Granted May 25, 2004·12 cites·22 claims
- 3145US6316277B1Tuning substrate/resist contrast to maximize defect inspection sensitivity for ultra-thin resist in DUV lithographyADVANCED MICRO DEVICES INC·Filed 2000·Granted Nov 13, 2001·2 cites·6 claims
- 3245US6208747B1Determination of scanning error in scanner by reticle rotationADVANCED MICRO DEVICES INC·Filed 1998·Granted Mar 27, 2001·9 cites·9 claims
- 3345US6207966B1Mark protection with transparent filmADVANCED MICRO DEVICES INC·Filed 1998·Granted Mar 27, 2001·12 cites·29 claims
- 3442US5969807AMethod for measuring lens imaging uniformityADVANCED MICRO DEVICES INC·Filed 1998·Granted Oct 19, 1999·8 cites·35 claims
- 3534US6178256B1Removal of reticle effect on critical dimension by reticle rotationADVANCED MICRO DEVICES INC·Filed 1998·Granted Jan 23, 2001·3 cites·10 claims
- 3630US2001038972A1Ultra-thin resist shallow trench process using metal hard maskCHRISTOPHER F LYONS·Filed 1998·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →