Inventor · disambiguated record
Khokan Chandra Paul
Also filed as: PAUL KHOKAN C · PAUL KHOKAN CHANDRA
15 granted patents·14 pending applications·20 citations·filing 2016–2025
87Inventor score
Files withAPPLIED MATERIALS INC29
Top patents by PatentIndex Score
29 records- 0197US11574826B2High-density substrate processing systems and methodsAPPLIED MATERIALS INC·Filed 2020·Granted Feb 7, 2023·5 cites·14 claims
- 0287US11699571B2Semiconductor processing chambers for deposition and etchAPPLIED MATERIALS INC·Filed 2020·Granted Jul 11, 2023·2 cites·17 claims
- 0387US10388549B2On-board metrology (OBM) design and implication in process toolAPPLIED MATERIALS INC·Filed 2016·Granted Aug 20, 2019·8 cites·14 claims
- 0482US12142459B2Single chamber flowable film formation and treatmentsAPPLIED MATERIALS INC·Filed 2020·Granted Nov 12, 2024·1 cites·18 claims
- 0579US11887811B2Semiconductor processing chambers for deposition and etchAPPLIED MATERIALS INC·Filed 2020·Granted Jan 30, 2024·1 cites·20 claims
- 0679US10281261B2In-situ metrology method for thickness measurement during PECVD processesAPPLIED MATERIALS INC·Filed 2016·Granted May 7, 2019·2 cites·16 claims
- 0776US12492890B2In-situ reflectometry for real-time process controlAPPLIED MATERIALS INC·Filed 2023·Granted Dec 9, 2025·0 cites·19 claims
- 0872US12456602B2Semiconductor processing chambers and methods for deposition and etchAPPLIED MATERIALS INC·Filed 2023·Granted Oct 28, 2025·0 cites·18 claims
- 0971US12074042B2High-density substrate processing systems and methodsAPPLIED MATERIALS INC·Filed 2023·Granted Aug 27, 2024·0 cites·18 claims
- 1070US10373823B2Deployment of light energy within specific spectral bands in specific sequences for deposition, treatment and removal of materialsAPPLIED MATERIALS INC·Filed 2018·Granted Aug 6, 2019·1 cites·20 claims
- 1163US2025035551A1Signal-to-noise correction method for accurate films measurementAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1260US10527407B2In-situ metrology method for thickness measurement during PECVD processesAPPLIED MATERIALS INC·Filed 2019·Granted Jan 7, 2020·0 cites·20 claims
- 1360US2025003806A1Chamber kits, systems, and methods for calibrating temperature sensors for semiconductor manufacturingAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1458US12417890B2Methods, systems, and apparatus for monitoring radiation output of lampsAPPLIED MATERIALS INC·Filed 2023·Granted Sep 16, 2025·0 cites·16 claims
- 1558US2025251285A1Substrate processing systems, methods, and related apparatus and chambers, for detecting processing shiftsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1658US2025251280A1In-situ reflectometry for real-time selectivity monitoringAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1758US2024363448A1Measuring systems, processing systems, and related apparatus and methods, including band gap materialsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1857US2025316526A1Measurement regions and substrate support assemblies for property measurementsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1957US2024141487A1Epi overlapping disk and ringAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2054US2024145273A1Multi-wavelength pyrometer for chamber monitoringAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2153US2024355683A1Method of metrology on pattern wafer using reflectometryAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2252US2025308857A1Plasma generation and uv diode configurations for processing chambers, and related apparatus and methodsAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2352US2024141551A1Dichroic mirror and shortpass filter for in-situ reflectometryAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2451US12205845B2Semiconductor processing chamber to accommodate parasitic plasma formationAPPLIED MATERIALS INC·Filed 2020·Granted Jan 21, 2025·0 cites·14 claims
- 2549US12387956B2Systems and methods for controlling non-uniformityAPPLIED MATERIALS INC·Filed 2020·Granted Aug 12, 2025·0 cites·17 claims
- 2649US12131903B2Pulsed-plasma deposition of thin film layersAPPLIED MATERIALS INC·Filed 2020·Granted Oct 29, 2024·0 cites·20 claims
- 2749US2024258141A1Methods and apparatus for calibration of substrate processing chamber placement via imagingAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2847US2023033058A1Reactor with inductively coupled plasma sourceAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 2941US2022093368A1Wafer non-uniformity tweaking through localized ion enhanced plasma (iep)APPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →