Inventor · disambiguated record
Klaus Edinger
Also filed as: EDINGER KLAUS
31 granted patents·2 pending applications·306 citations·filing 2000–2022
97Inventor score
Top patents by PatentIndex Score
33 records- 0196US8110814B2Ion sources, systems and methodsWARD BILLY W·Filed 2009·Granted Feb 7, 2012·33 cites·20 claims
- 0294US7485873B2Ion sources, systems and methodsALIS CORP·Filed 2006·Granted Feb 3, 2009·36 cites·25 claims
- 0394US7238294B2Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surfaceUNIV MARYLAND·Filed 2003·Granted Jul 3, 2007·73 cites·42 claims
- 0489US9236225B2Ion sources, systems and methodsCARL ZEISS MICROSCOPY LLC·Filed 2015·Granted Jan 12, 2016·4 cites·23 claims
- 0588US7232997B2Apparatus and method for investigating or modifying a surface with a beam of charged particlesNAWOTEC GMBH·Filed 2005·Granted Jun 19, 2007·16 cites·36 claims
- 0687US7452477B2Procedure for etching of materials at the surface with focussed electron beam induced chemical reaction at said surfaceNAWOTEC GMBH·Filed 2003·Granted Nov 18, 2008·28 cites·24 claims
- 0786US8632687B2Method for electron beam induced etching of layers contaminated with galliumAUTH NICOLE·Filed 2009·Granted Jan 21, 2014·14 cites·24 claims
- 0885US8247782B2Apparatus and method for investigating and/or modifying a sampleEDINGER KLAUS·Filed 2010·Granted Aug 21, 2012·9 cites·20 claims
- 0982US7537708B2Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surfaceNAWOTEC GMBH·Filed 2007·Granted May 26, 2009·12 cites·19 claims
- 1081US8674329B2Method and apparatus for analyzing and/or repairing of an EUV mask defectBUDACH MICHAEL·Filed 2011·Granted Mar 18, 2014·4 cites·10 claims
- 1180US12292680B2Method and apparatuses for disposing of excess material of a photolithographic maskZEISS CARL SMT GMBH·Filed 2022·Granted May 6, 2025·0 cites·17 claims
- 1279US12164226B2Method and apparatuses for disposing of excess material of a photolithographic maskZEISS CARL SMT GMBH·Filed 2022·Granted Dec 10, 2024·0 cites·41 claims
- 1379US10060947B2Method and apparatus for analyzing and for removing a defect of an EUV photomaskZEISS CARL SMT GMBH·Filed 2013·Granted Aug 28, 2018·3 cites·25 claims
- 1479US8769709B2Apparatus and method for analyzing and modifying a specimen surfaceZEISS CARL SMS GMBH·Filed 2013·Granted Jul 1, 2014·4 cites·20 claims
- 1576US8748845B2Ion sources, systems and methodsWARD BILLY W·Filed 2012·Granted Jun 10, 2014·2 cites·28 claims
- 1675US10983075B2Device and method for analysing a defect of a photolithographic mask or of a waferZEISS CARL SMT GMBH·Filed 2017·Granted Apr 20, 2021·1 cites·11 claims
- 1774US9023666B2Method for electron beam induced etchingAUTH NICOLE·Filed 2009·Granted May 5, 2015·5 cites·26 claims
- 1873US11886126B2Apparatus and method for removing a single particulate from a substrateZEISS CARL SMT GMBH·Filed 2021·Granted Jan 30, 2024·1 cites·39 claims
- 1973US9910065B2Apparatus and method for examining a surface of a maskZEISS CARL SMT GMBH·Filed 2016·Granted Mar 6, 2018·2 cites·39 claims
- 2072US9186630B2Perforated membranesGÖLZHÄUSER Armin·Filed 2010·Granted Nov 17, 2015·3 cites·24 claims
- 2172US9115981B2Apparatus and method for investigating an objectZEISS CARL SMS GMBH·Filed 2013·Granted Aug 25, 2015·3 cites·25 claims
- 2271US9012867B2Ion sources, systems and methodsCARL ZEISS MICROSCOPY LLC·Filed 2014·Granted Apr 21, 2015·1 cites·20 claims
- 2370US11733186B2Device and method for analyzing a defect of a photolithographic mask or of a waferZEISS CARL SMT GMBH·Filed 2021·Granted Aug 22, 2023·0 cites·32 claims
- 2470US8623230B2Methods and systems for removing a material from a sampleAUTH NICOLE·Filed 2008·Granted Jan 7, 2014·3 cites·37 claims
- 2569US11874598B2Method and apparatuses for disposing of excess material of a photolithographic maskZEISS CARL SMT GMBH·Filed 2019·Granted Jan 16, 2024·0 cites·15 claims
- 2664US6633711B1Focused ion-beam fabrication of fiber probes for use in near field scanning optical microscopyUNIV MARYLAND·Filed 2000·Granted Oct 14, 2003·13 cites·16 claims
- 2763US7335942B2Field effect transistor sensorUNIV KASSEL·Filed 2002·Granted Feb 26, 2008·13 cites·9 claims
- 2859US6518872B1High resolution scanning thermal probe and method of manufacturing thereofUNIV MARYLAND·Filed 2001·Granted Feb 11, 2003·17 cites·10 claims
- 2955US2018106831A1Method and apparatus for analyzing and for removing a defect of an euv photomaskZEISS CARL SMT GMBH·Filed 2017·Application pending·0 cites
- 3053US7786403B2Method for high-resolution processing of thin layers using electron beamsNAWO TEC GMBH·Filed 2004·Granted Aug 31, 2010·6 cites·14 claims
- 3148US8318593B2Method for electron beam induced deposition of conductive materialAUTH NICOLE·Filed 2009·Granted Nov 27, 2012·0 cites·21 claims
- 3238US2010297362A1Method for processing an object with miniaturized structuresZEISS CARL SMS GMBH·Filed 2010·Application pending·0 cites
- 3337US10119990B2Scanning probe microscope and method for examining a surface with a high aspect ratioZEISS CARL SMT GMBH·Filed 2016·Granted Nov 6, 2018·0 cites·26 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →